IT1011064B - Processo per fotopolimerizzare composti organici etilenicamente insaturi e relativa composizione - Google Patents
Processo per fotopolimerizzare composti organici etilenicamente insaturi e relativa composizioneInfo
- Publication number
- IT1011064B IT1011064B IT49201/74A IT4920174A IT1011064B IT 1011064 B IT1011064 B IT 1011064B IT 49201/74 A IT49201/74 A IT 49201/74A IT 4920174 A IT4920174 A IT 4920174A IT 1011064 B IT1011064 B IT 1011064B
- Authority
- IT
- Italy
- Prior art keywords
- ethylenically unsaturated
- organic compounds
- unsaturated organic
- related composition
- photopolymerizing
- Prior art date
Links
- 150000002894 organic compounds Chemical class 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- G03F7/0295—Photolytic halogen compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
- C08F283/01—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to unsaturated polyesters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/122—Sulfur compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/124—Carbonyl compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/126—Halogen compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/134—Brightener containing
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Polymerisation Methods In General (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US341854A US3860429A (en) | 1973-03-16 | 1973-03-16 | Photopolymerization of ethylenically unsaturated organic compounds |
Publications (1)
Publication Number | Publication Date |
---|---|
IT1011064B true IT1011064B (it) | 1977-01-20 |
Family
ID=23339291
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT49201/74A IT1011064B (it) | 1973-03-16 | 1974-03-08 | Processo per fotopolimerizzare composti organici etilenicamente insaturi e relativa composizione |
Country Status (7)
Country | Link |
---|---|
US (1) | US3860429A (it) |
JP (1) | JPS49128086A (it) |
CA (1) | CA1012397A (it) |
DE (1) | DE2410219A1 (it) |
FR (1) | FR2221466B1 (it) |
GB (1) | GB1420888A (it) |
IT (1) | IT1011064B (it) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1603908A (en) * | 1978-05-31 | 1981-12-02 | Kodak Ltd | Radiationsensitive materials |
JPS6426672A (en) * | 1987-04-01 | 1989-01-27 | Yokohama Rubber Co Ltd | Ultraviolet-curing type resin composition |
RU2168707C2 (ru) * | 1997-09-19 | 2001-06-10 | Инофирма Корнинг Инкорпорейтед | Объемная фазовая голограмма и способ ее получения |
US8007982B2 (en) * | 2006-12-20 | 2011-08-30 | Sony Corporation | Optical information recording medium |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3090664A (en) * | 1958-03-31 | 1963-05-21 | Du Pont | Graft polymerizing an unsaturated organic acid or salt thereof onto a nitrogen containing polymer substrate |
BE606744A (it) * | 1960-08-10 | |||
US3511687A (en) * | 1964-04-16 | 1970-05-12 | Sherwin Williams Co | High energy curing of photopolymerizable nonair inhibited polyester resin coatings |
US3388995A (en) * | 1964-08-10 | 1968-06-18 | Gen Aniline & Film Corp | Photopolymer offset printing plates |
GB1137392A (en) * | 1965-02-10 | 1968-12-18 | Ici Ltd | Addition polymerisation on a substrate |
GB1123103A (en) * | 1966-08-22 | 1968-08-14 | Agfa Gevaert Nv | Process for the photopolymerisation of ethylenically unsaturated monomers |
US3374160A (en) * | 1966-10-26 | 1968-03-19 | Gen Motors Corp | Photopolymerization with o-bromoacetophenone as a photoinitiator |
FR2071069A5 (it) * | 1969-12-17 | 1971-09-17 | Progil | |
JPS5034964B1 (it) * | 1970-03-30 | 1975-11-12 | ||
US3715211A (en) * | 1971-02-01 | 1973-02-06 | Horizons Inc | Process and product of cold sealing an anodized aluminum article by a photo-polymerization process |
US3711287A (en) * | 1971-05-19 | 1973-01-16 | Eastman Kodak Co | Photoresist compositions |
US3715293A (en) * | 1971-12-17 | 1973-02-06 | Union Carbide Corp | Acetophenone-type photosensitizers for radiation curable coatings |
-
1973
- 1973-03-16 US US341854A patent/US3860429A/en not_active Expired - Lifetime
- 1973-12-07 CA CA187,696A patent/CA1012397A/en not_active Expired
-
1974
- 1974-02-18 GB GB724174A patent/GB1420888A/en not_active Expired
- 1974-03-04 DE DE2410219A patent/DE2410219A1/de active Pending
- 1974-03-08 IT IT49201/74A patent/IT1011064B/it active
- 1974-03-12 FR FR7408379A patent/FR2221466B1/fr not_active Expired
- 1974-03-15 JP JP49029904A patent/JPS49128086A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
JPS49128086A (it) | 1974-12-07 |
GB1420888A (en) | 1976-01-14 |
US3860429A (en) | 1975-01-14 |
FR2221466A1 (it) | 1974-10-11 |
CA1012397A (en) | 1977-06-21 |
FR2221466B1 (it) | 1978-01-06 |
DE2410219A1 (de) | 1974-09-19 |
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