GB1415883A - Radiation curable compounds obtainable by reaction of a resin or polybenzophenone carboxylic acid or ester forming derivative thereof and compositions containing the same - Google Patents

Radiation curable compounds obtainable by reaction of a resin or polybenzophenone carboxylic acid or ester forming derivative thereof and compositions containing the same

Info

Publication number
GB1415883A
GB1415883A GB5330172A GB5330172A GB1415883A GB 1415883 A GB1415883 A GB 1415883A GB 5330172 A GB5330172 A GB 5330172A GB 5330172 A GB5330172 A GB 5330172A GB 1415883 A GB1415883 A GB 1415883A
Authority
GB
United Kingdom
Prior art keywords
ethylenically unsaturated
reaction
forming derivative
polybenzophenone
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB5330172A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sun Chemical Corp
Original Assignee
Sun Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sun Chemical Corp filed Critical Sun Chemical Corp
Publication of GB1415883A publication Critical patent/GB1415883A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/01—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to unsaturated polyesters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
    • C08G59/4223—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof aromatic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/91—Polymers modified by chemical after-treatment
    • C08G63/914—Polymers modified by chemical after-treatment derived from polycarboxylic acids and polyhydroxy compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/28—Treatment by wave energy or particle radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Paints Or Removers (AREA)
GB5330172A 1971-11-18 1972-11-17 Radiation curable compounds obtainable by reaction of a resin or polybenzophenone carboxylic acid or ester forming derivative thereof and compositions containing the same Expired GB1415883A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US20017471A 1971-11-18 1971-11-18

Publications (1)

Publication Number Publication Date
GB1415883A true GB1415883A (en) 1975-12-03

Family

ID=22740643

Family Applications (1)

Application Number Title Priority Date Filing Date
GB5330172A Expired GB1415883A (en) 1971-11-18 1972-11-17 Radiation curable compounds obtainable by reaction of a resin or polybenzophenone carboxylic acid or ester forming derivative thereof and compositions containing the same

Country Status (4)

Country Link
JP (1) JPS5649925B2 (enrdf_load_stackoverflow)
CA (1) CA1008083A (enrdf_load_stackoverflow)
DE (1) DE2256611A1 (enrdf_load_stackoverflow)
GB (1) GB1415883A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4200762A (en) * 1976-10-29 1980-04-29 Thiokol Corporation Actinic radiation curable polymers
EP1403708A3 (en) * 2002-09-30 2005-03-30 Shipley Co. L.L.C. Photoresist
CN117965143A (zh) * 2024-04-02 2024-05-03 中国石油大学(华东) 一种抗压复合型树脂堵漏剂及其制备方法与应用

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5622884B2 (enrdf_load_stackoverflow) * 1973-12-20 1981-05-28
JPS5224296A (en) * 1975-08-20 1977-02-23 Dainichi Seika Kogyo Kk Ultraviolet-curing and coloring compositions
DE2800356A1 (de) * 1978-01-05 1979-07-12 Bayer Ag Photopolymerisierbare bindemittel
JPS54117572A (en) * 1978-03-06 1979-09-12 Teijin Ltd Molded article of crosslinked polyester and its production
JPS54134799A (en) * 1978-04-12 1979-10-19 Teijin Ltd Crosslinked polyester film
JPS5638223A (en) * 1979-09-07 1981-04-13 Teijin Ltd Preparation of polyester laminate film
JPS55113563A (en) * 1979-02-23 1980-09-02 Teijin Ltd Polyester laminated film
JPS58174726U (ja) * 1982-05-18 1983-11-22 有限会社河島農具製作所 チエンジ機構
DE3641053A1 (de) * 1986-12-19 1988-06-16 Wolfen Filmfab Veb Fotopolymerisierbares material
EP2508575A1 (en) * 2011-04-05 2012-10-10 Cytec Surface Specialties, S.A. Radiation curable compositions
EP2508574A1 (en) * 2011-04-05 2012-10-10 Cytec Surface Specialties, S.A. Radiation curable compositions
JP7016199B2 (ja) * 2019-12-13 2022-02-04 Ｋｊケミカルズ株式会社 光重合開始剤

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4200762A (en) * 1976-10-29 1980-04-29 Thiokol Corporation Actinic radiation curable polymers
EP1403708A3 (en) * 2002-09-30 2005-03-30 Shipley Co. L.L.C. Photoresist
CN117965143A (zh) * 2024-04-02 2024-05-03 中国石油大学(华东) 一种抗压复合型树脂堵漏剂及其制备方法与应用
CN117965143B (zh) * 2024-04-02 2024-06-07 中国石油大学(华东) 一种抗压复合型树脂堵漏剂及其制备方法与应用

Also Published As

Publication number Publication date
JPS4861460A (enrdf_load_stackoverflow) 1973-08-28
CA1008083A (en) 1977-04-05
JPS5649925B2 (enrdf_load_stackoverflow) 1981-11-26
DE2256611A1 (de) 1973-05-24

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee