GB1401408A - Method for the production of highly dispersed silicon dioxide - Google Patents
Method for the production of highly dispersed silicon dioxideInfo
- Publication number
- GB1401408A GB1401408A GB3574073A GB3574073A GB1401408A GB 1401408 A GB1401408 A GB 1401408A GB 3574073 A GB3574073 A GB 3574073A GB 3574073 A GB3574073 A GB 3574073A GB 1401408 A GB1401408 A GB 1401408A
- Authority
- GB
- United Kingdom
- Prior art keywords
- silicon dioxide
- highly dispersed
- silicon
- silicon monoxide
- production
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J12/00—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor
- B01J12/002—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor carried out in the plasma state
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
- C01B33/182—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by reduction of a siliceous material, e.g. with a carbonaceous reducing agent and subsequent oxidation of the silicon monoxide formed
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
- C01P2002/82—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by IR- or Raman-data
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/22—Rheological behaviour as dispersion, e.g. viscosity, sedimentation stability
Abstract
1401408 Highly dispersed silicon dioxide LONZA Ltd 26 July 1973 [15 Sept 1972] 35740/73 Heading C1A A process for the production of highly dispersed silicon dioxide comprises vaporizing in a plasma burner located in a vaporizing zone coarse particled silicon dioxide or a material containing silicon dioxide whereby silicon monoxide is formed, withdrawing the silicon monoxide from the vaporizing zone, cooling the silicon monoxide to a temperature of from 1300-1900‹ K. and thereafter simultaneously re-oxidizing the silicon monoxide to silicon dioxide and quenching using a mixture of water vapour and a nitrogen compound of the formula N(R 1 )(R 2 )(R 3 ) in which R 1 , R 2 and R 3 are hydrogen atoms or organic groups which together contain not more than 6 carbon atoms. It is preferred to use quartz sand of 150-200 mesh as the starting material which is fed in the vicinity of the anode of a plasma burner using a carrier gas, the temperature being held above 2300‹ C. The gas stream containing SiO is cooled, by means of a non-oxidizing gas stream (e.g. H 2 , N 2 , Ar or CO), to 1500-1900‹ K. and then reoxidized and quenched with three times the stiochiometric quantity of water vapour containing ammonia on a simple aliphatic amine (3-5% by wt. on the water used). The product has a specific surface area of 120- 380 m.<SP>2</SP>/g.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH1352672A CH569670A5 (en) | 1972-09-15 | 1972-09-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1401408A true GB1401408A (en) | 1975-07-16 |
Family
ID=4393185
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB3574073A Expired GB1401408A (en) | 1972-09-15 | 1973-07-26 | Method for the production of highly dispersed silicon dioxide |
Country Status (10)
| Country | Link |
|---|---|
| JP (1) | JPS4969582A (en) |
| BE (1) | BE804765A (en) |
| CA (1) | CA999721A (en) |
| CH (1) | CH569670A5 (en) |
| DE (1) | DE2337495A1 (en) |
| FR (1) | FR2200197A1 (en) |
| GB (1) | GB1401408A (en) |
| IT (1) | IT999560B (en) |
| NL (1) | NL7312575A (en) |
| SE (1) | SE388189B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2904199A1 (en) * | 1979-02-05 | 1980-08-07 | Degussa | METHOD FOR THE GUIDED PRODUCTION OF SILICON BY MEANS OF FLAME HYDROLYSIS |
-
1972
- 1972-09-15 CH CH1352672A patent/CH569670A5/xx not_active IP Right Cessation
-
1973
- 1973-07-24 DE DE19732337495 patent/DE2337495A1/en active Pending
- 1973-07-26 GB GB3574073A patent/GB1401408A/en not_active Expired
- 1973-08-17 CA CA180,680A patent/CA999721A/en not_active Expired
- 1973-08-30 SE SE7311788A patent/SE388189B/en unknown
- 1973-09-12 BE BE135577A patent/BE804765A/en unknown
- 1973-09-12 NL NL7312575A patent/NL7312575A/xx unknown
- 1973-09-14 FR FR7333093A patent/FR2200197A1/fr not_active Withdrawn
- 1973-09-14 JP JP10335473A patent/JPS4969582A/ja active Pending
- 1973-09-14 IT IT6972673A patent/IT999560B/en active
Also Published As
| Publication number | Publication date |
|---|---|
| DE2337495A1 (en) | 1974-03-28 |
| SE388189B (en) | 1976-09-27 |
| JPS4969582A (en) | 1974-07-05 |
| IT999560B (en) | 1976-03-10 |
| FR2200197A1 (en) | 1974-04-19 |
| CA999721A (en) | 1976-11-16 |
| CH569670A5 (en) | 1975-11-28 |
| NL7312575A (en) | 1974-03-19 |
| BE804765A (en) | 1974-01-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PLNP | Patent lapsed through nonpayment of renewal fees |