GB1360217A - Photoresist compositions - Google Patents

Photoresist compositions

Info

Publication number
GB1360217A
GB1360217A GB3319971A GB3319971A GB1360217A GB 1360217 A GB1360217 A GB 1360217A GB 3319971 A GB3319971 A GB 3319971A GB 3319971 A GB3319971 A GB 3319971A GB 1360217 A GB1360217 A GB 1360217A
Authority
GB
United Kingdom
Prior art keywords
compositions
bromo
xylene
july
radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3319971A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of GB1360217A publication Critical patent/GB1360217A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

1360217 Photoresist compositions EASTMAN KODAK CO 15 July 1971 [17 July 1970 (2) 29 Jan 1971] 33199/71 Heading C3P [Also in Divisions G2 and B6] Photosensitive compositions comprise a solution of a radiation-sensitive polymer and a polar N-halo cyclic imide. The imide improves adhesion of the composition to a substrate. The polymer may be inherently radiation-sensitive or may have a sensitizer added thereto. The compositions may also contain an organoalkoxysilane free of halogen, epoxy or amine groups. Exemplified compositions are formed from (1) cyclized polyisoprene, 2,6-di-(41-azidobenzol)-4- methyl cyclohexanone, xylene and either N- bromo- or N-chloro-succinimide or N-iodoglutarimide, and in one case additionally γ- methacryloxypropyltrimethoxysilane, and (2) polyvinyl cinnamate (prepared by esterifying polyvinyl aclohol), hydroquinone, 1,2-benzanthraquinone, benzoic acid, xylene, methylglycol acetate and N-bromo-phthalimide.
GB3319971A 1970-07-17 1971-07-15 Photoresist compositions Expired GB1360217A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US5597470A 1970-07-17 1970-07-17
US5597370A 1970-07-17 1970-07-17
US11112171A 1971-01-29 1971-01-29

Publications (1)

Publication Number Publication Date
GB1360217A true GB1360217A (en) 1974-07-17

Family

ID=27368944

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3319971A Expired GB1360217A (en) 1970-07-17 1971-07-15 Photoresist compositions

Country Status (4)

Country Link
AU (1) AU457241B2 (en)
BE (1) BE769898A (en)
FR (1) FR2101626A5 (en)
GB (1) GB1360217A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4950583A (en) * 1986-09-17 1990-08-21 Brewer Science Inc. Adhesion promoting product and process for treating an integrated circuit substrate therewith

Also Published As

Publication number Publication date
DE2135482B2 (en) 1973-09-13
AU457241B2 (en) 1975-01-23
BE769898A (en) 1971-11-16
DE2135482A1 (en) 1972-01-20
AU3133271A (en) 1973-01-18
FR2101626A5 (en) 1972-03-31

Similar Documents

Publication Publication Date Title
SE7607566L (en) PROCEDURE FOR THE PREPARATION OF 1,4-DIHYDROPYRIDINE DERIVATIVES
ES439487A1 (en) Unsymmetrical esters of N-substituted 1,4-dihydropyridine 3,5-dicarboxylic acid
JPS51147191A (en) Hall element and its method of manufacturing
GB1447315A (en) Photopolymerizable composition and light-sensitive elements containing this composition
GB1286467A (en) Proteinaceous colloid compositions and their adherence to glass supports
GB1360217A (en) Photoresist compositions
GB833586A (en) Coated plastic films
JPS55142475A (en) Decoder circuit
GB1525360A (en) Digital display system for a photographic exposure meter
JPS5212141A (en) Novel amino benzoic acid derivatives, their preparation, and pharmaceu tical compositions therefrom
JPS53136489A (en) Mos semiconductor element of high dielectric strenght
JPS5345338A (en) Adhesive composition
ES301365A1 (en) A method for the preparation of a diuretic compound (Machine-translation by Google Translate, not legally binding)
ES344025A1 (en) Procedure for the production of substitute sucinimids. (Machine-translation by Google Translate, not legally binding)
DK382A (en) ANTIALLERGIC IMIDODISULPHAMIDS.
JPS54974A (en) Manufacture for semiconductor device
GB1265170A (en)
JPS52156326A (en) Electronic governor
GB1280724A (en) Photosensitive silver compositions
JPS5268304A (en) Transistor circuit
JPS5255874A (en) Integrated circuit
JPS522235A (en) Push-pull circuit
ES409054A1 (en) A method for preventing polyimide type films from adhering to a substrate. (Machine-translation by Google Translate, not legally binding)
JPS53110370A (en) Semiconductor device
JPS5240721A (en) Transistor circuit for driving dc motor

Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees