GB1360217A - Photoresist compositions - Google Patents
Photoresist compositionsInfo
- Publication number
- GB1360217A GB1360217A GB3319971A GB3319971A GB1360217A GB 1360217 A GB1360217 A GB 1360217A GB 3319971 A GB3319971 A GB 3319971A GB 3319971 A GB3319971 A GB 3319971A GB 1360217 A GB1360217 A GB 1360217A
- Authority
- GB
- United Kingdom
- Prior art keywords
- compositions
- bromo
- xylene
- july
- radiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
1360217 Photoresist compositions EASTMAN KODAK CO 15 July 1971 [17 July 1970 (2) 29 Jan 1971] 33199/71 Heading C3P [Also in Divisions G2 and B6] Photosensitive compositions comprise a solution of a radiation-sensitive polymer and a polar N-halo cyclic imide. The imide improves adhesion of the composition to a substrate. The polymer may be inherently radiation-sensitive or may have a sensitizer added thereto. The compositions may also contain an organoalkoxysilane free of halogen, epoxy or amine groups. Exemplified compositions are formed from (1) cyclized polyisoprene, 2,6-di-(41-azidobenzol)-4- methyl cyclohexanone, xylene and either N- bromo- or N-chloro-succinimide or N-iodoglutarimide, and in one case additionally γ- methacryloxypropyltrimethoxysilane, and (2) polyvinyl cinnamate (prepared by esterifying polyvinyl aclohol), hydroquinone, 1,2-benzanthraquinone, benzoic acid, xylene, methylglycol acetate and N-bromo-phthalimide.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US5597370A | 1970-07-17 | 1970-07-17 | |
US5597470A | 1970-07-17 | 1970-07-17 | |
US11112171A | 1971-01-29 | 1971-01-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1360217A true GB1360217A (en) | 1974-07-17 |
Family
ID=27368944
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB3319971A Expired GB1360217A (en) | 1970-07-17 | 1971-07-15 | Photoresist compositions |
Country Status (4)
Country | Link |
---|---|
AU (1) | AU457241B2 (en) |
BE (1) | BE769898A (en) |
FR (1) | FR2101626A5 (en) |
GB (1) | GB1360217A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4950583A (en) * | 1986-09-17 | 1990-08-21 | Brewer Science Inc. | Adhesion promoting product and process for treating an integrated circuit substrate therewith |
-
1971
- 1971-07-12 BE BE769898A patent/BE769898A/en unknown
- 1971-07-13 FR FR7125594A patent/FR2101626A5/fr not_active Expired
- 1971-07-15 GB GB3319971A patent/GB1360217A/en not_active Expired
- 1971-07-16 AU AU31332/71A patent/AU457241B2/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
FR2101626A5 (en) | 1972-03-31 |
AU3133271A (en) | 1973-01-18 |
DE2135482A1 (en) | 1972-01-20 |
DE2135482B2 (en) | 1973-09-13 |
AU457241B2 (en) | 1975-01-23 |
BE769898A (en) | 1971-11-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PLNP | Patent lapsed through nonpayment of renewal fees |