AU3133271A - Photoresist compositions - Google Patents

Photoresist compositions

Info

Publication number
AU3133271A
AU3133271A AU31332/71A AU3133271A AU3133271A AU 3133271 A AU3133271 A AU 3133271A AU 31332/71 A AU31332/71 A AU 31332/71A AU 3133271 A AU3133271 A AU 3133271A AU 3133271 A AU3133271 A AU 3133271A
Authority
AU
Australia
Prior art keywords
photoresist compositions
photoresist
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
AU31332/71A
Other versions
AU457241B2 (en
Inventor
MARSHALL ERNST YOST and RICHARD ARTHUR NEWCOMB KENNETH ROYAL DUNHAM
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of AU3133271A publication Critical patent/AU3133271A/en
Application granted granted Critical
Publication of AU457241B2 publication Critical patent/AU457241B2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
AU31332/71A 1970-07-17 1971-07-16 Photoresist compositions Expired AU457241B2 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US5597370A 1970-07-17 1970-07-17
US5597470A 1970-07-17 1970-07-17
USUS55974,5 1970-07-17
US11112171A 1971-01-29 1971-01-29
USUS111,121 1971-01-29

Publications (2)

Publication Number Publication Date
AU3133271A true AU3133271A (en) 1973-01-18
AU457241B2 AU457241B2 (en) 1975-01-23

Family

ID=27368944

Family Applications (1)

Application Number Title Priority Date Filing Date
AU31332/71A Expired AU457241B2 (en) 1970-07-17 1971-07-16 Photoresist compositions

Country Status (4)

Country Link
AU (1) AU457241B2 (en)
BE (1) BE769898A (en)
FR (1) FR2101626A5 (en)
GB (1) GB1360217A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4950583A (en) * 1986-09-17 1990-08-21 Brewer Science Inc. Adhesion promoting product and process for treating an integrated circuit substrate therewith

Also Published As

Publication number Publication date
DE2135482B2 (en) 1973-09-13
AU457241B2 (en) 1975-01-23
GB1360217A (en) 1974-07-17
BE769898A (en) 1971-11-16
FR2101626A5 (en) 1972-03-31
DE2135482A1 (en) 1972-01-20

Similar Documents

Publication Publication Date Title
CA970909A (en) Fabric-softener compositions
CA982397A (en) Photopolymerizable copying composition
CA973421A (en) Photopolymerizable copying composition
CA959699A (en) Photopolymerizable copying composition
CA976021A (en) Compositions for making blixes
CA977202A (en) Photosensitive compositions
CA982542A (en) Compositions lubrifiantes
CA988353A (en) Photoresist compositions
CA949450A (en) Miticidal compositions
CA983761A (en) Developer composition
CA972142A (en) Photoconductive compositions
AU461560B2 (en) Vulcanizable compositions
CA986503A (en) Solid fire-extinguihing compositions
AU451135B2 (en) Photopolymerizable copying composition
AU457241B2 (en) Photoresist compositions
AU2428071A (en) Compositions
CA981968A (en) Photopolymerizable copying composition
CA968616A (en) Photoresist compositions
CA831496A (en) Wood-treatment compositions
CA959186A (en) Rubber-polyester compositions
CA847421A (en) Water-setable compositions
CA991904A (en) Photographic compositions
CA838122A (en) Photoresist composition
CA843881A (en) Photoresist composition
CA855161A (en) Photosensitive compositions