GB1356655A - Coating glass - Google Patents

Coating glass

Info

Publication number
GB1356655A
GB1356655A GB1743671A GB1743671A GB1356655A GB 1356655 A GB1356655 A GB 1356655A GB 1743671 A GB1743671 A GB 1743671A GB 1743671 A GB1743671 A GB 1743671A GB 1356655 A GB1356655 A GB 1356655A
Authority
GB
United Kingdom
Prior art keywords
substrate
atmosphere
cathode
resistivity
heat source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1743671A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
PPG Industries Inc
Original Assignee
PPG Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by PPG Industries Inc filed Critical PPG Industries Inc
Publication of GB1356655A publication Critical patent/GB1356655A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3435—Applying energy to the substrate during sputtering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/229—Non-specific enumeration
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/23—Mixtures
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/23—Mixtures
    • C03C2217/231—In2O3/SnO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering
    • C03C2218/155—Deposition methods from the vapour phase by sputtering by reactive sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

1356655 Reactive sputtering oxide coatings PPG INDUSTRIES Inc 27 May 1971 [31 July 1970] 17436/71 Heading C7F Transparent coatings with a resistance <10 ohms square, a light transmittance at least 70%, of oxides of metals atomic number 48- 51 are formed on a ceramic substrate heated by a radiant heat source to between 400‹ F and its distortion temperature, by reactive sputtering the metal cathode in an atmosphere at 10<SP>-1</SP> torr maximum which contains an inert gas and a minimum 0À5% of oxygen. The preferred substrate is glass, the preferred cathode is 80 -99% In/1-20Sn to form a coating of 80-99% In 2 O 3 / 1 - 20% SnO 2 . The substrate is located between an upper reciprocating scanning cathode and a lower radiant heat source and the oxygen pressure in the atmosphere is reduced as the substrate temperature is raised but is still sufficent to maintain a clear coating. The coated substrate is cooled in the low pressure atmosphere to <300‹ F and the process may be controlled by monitoring the resistivity of the film and stopping deposition when the resistivity is <10 ohms per square. The heated substrate may also be surrounded by a frame to reduce edge effects.
GB1743671A 1970-07-31 1971-05-27 Coating glass Expired GB1356655A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US6000270A 1970-07-31 1970-07-31

Publications (1)

Publication Number Publication Date
GB1356655A true GB1356655A (en) 1974-06-12

Family

ID=22026707

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1743671A Expired GB1356655A (en) 1970-07-31 1971-05-27 Coating glass

Country Status (5)

Country Link
JP (1) JPS5338269B1 (en)
CA (1) CA934325A (en)
DE (1) DE2132796B2 (en)
FR (1) FR2099718B1 (en)
GB (1) GB1356655A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2150599A (en) * 1983-11-30 1985-07-03 Ppg Industries Inc Deposition of oxide films by reactive magnetron sputtering

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1446848A (en) * 1972-11-29 1976-08-18 Triplex Safety Glass Co Sputtered metal oxide coatings articles comprising transparent electrically-conductive coatings on non-conducting substrates
DE2441862B2 (en) * 1974-08-31 1979-06-28 Philips Patentverwaltung Gmbh, 2000 Hamburg Process for the production of a transparent, heat-reflecting layer made of doped indium oxide on flat glass
GB1598924A (en) * 1977-08-03 1981-09-23 Bfg Glassgroup Vehicle windows
US4113599A (en) * 1977-09-26 1978-09-12 Ppg Industries, Inc. Sputtering technique for the deposition of indium oxide
DE3900571A1 (en) * 1989-01-11 1990-07-19 Asea Brown Boveri METHOD FOR APPLYING A CATALYST LAYER CONSISTING OF PRECIOUS METALS AND / OR PRECIOUS METAL COMPOUNDS TO A CARRIER OF CERAMIC MATERIAL

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2769778A (en) * 1951-09-05 1956-11-06 Nat Res Dev Method of making transparent conducting films by cathode sputtering
CA957756A (en) * 1970-01-19 1974-11-12 Ppg Industries, Inc. Liquid crystal cells

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2150599A (en) * 1983-11-30 1985-07-03 Ppg Industries Inc Deposition of oxide films by reactive magnetron sputtering

Also Published As

Publication number Publication date
DE2132796B2 (en) 1978-03-02
JPS5338269B1 (en) 1978-10-14
FR2099718A1 (en) 1972-03-17
CA934325A (en) 1973-09-25
FR2099718B1 (en) 1976-09-03
DE2132796A1 (en) 1972-02-10

Similar Documents

Publication Publication Date Title
US3655545A (en) Post heating of sputtered metal oxide films
ES391377A1 (en) Metal oxide films
CA1269060C (en) Sputtered films of metal alloy oxides
US4399015A (en) Method for fabricating an indium tin oxide film for a transparent electrode
US4902580A (en) Neutral reflecting coated articles with sputtered multilayer films of metal oxides
US4834857A (en) Neutral sputtered films of metal alloy oxides
US4948677A (en) High transmittance, low emissivity article and method of preparation
US3506556A (en) Sputtering of metal oxide films in the presence of hydrogen and oxygen
KR920001387B1 (en) Low emissivity film for automotive heat load reduction
US4806220A (en) Method of making low emissivity film for high temperature processing
US4786563A (en) Protective coating for low emissivity coated articles
US4716086A (en) Protective overcoat for low emissivity coated article
KR890015969A (en) Low Radiation Film for High Temperature Treatment
KR880010154A (en) Method for producing a clear coating by reactive sputtering and articles coated by the method
JPS61111940A (en) High permeability and low radiation product and manufacture
US4857094A (en) Method for the manufacture of a toughened and/or bent pane with solar control coating containing platinum or the like
US4622120A (en) Sputtered indium oxide films
RU92004519A (en) ELECTRODE AND METHOD FOR ITS OBTAINING
KR910002490B1 (en) Sputtered films of bismuth/tin oxide and articles produced by said film
GB1356655A (en) Coating glass
CN1030101A (en) Low reflectance bronze coating
GB1446848A (en) Sputtered metal oxide coatings articles comprising transparent electrically-conductive coatings on non-conducting substrates
US4512864A (en) Low resistance indium oxide films
Nishikawa The influence of substrate temperature and sputtering gas atmosphere on the electrical properties of reactively sputtered indium tin oxide films
GB1224147A (en) Improvements in or relating to metal oxide films

Legal Events

Date Code Title Description
PS Patent sealed
PE20 Patent expired after termination of 20 years