GB1339963A - Manufacture of high-melting point oxide monocrystals - Google Patents

Manufacture of high-melting point oxide monocrystals

Info

Publication number
GB1339963A
GB1339963A GB2521671A GB2521671A GB1339963A GB 1339963 A GB1339963 A GB 1339963A GB 2521671 A GB2521671 A GB 2521671A GB 2521671 A GB2521671 A GB 2521671A GB 1339963 A GB1339963 A GB 1339963A
Authority
GB
United Kingdom
Prior art keywords
crystal
temperature gradient
axial temperature
melting point
growing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2521671A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19702014203 external-priority patent/DE2014203C3/en
Priority claimed from DE19702057782 external-priority patent/DE2057782A1/en
Application filed by Siemens AG filed Critical Siemens AG
Publication of GB1339963A publication Critical patent/GB1339963A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/04Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt
    • C30B11/08Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt every component of the crystal composition being added during the crystallisation
    • C30B11/10Solid or liquid components, e.g. Verneuil method

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

1339963 Verneuil monocrystal process SIEMENS AG 19 April 1971 [24 March 1970 24 Nov 1970] 25216/71 Heading BIS Substrates of monocrystalline oxides or mixed oxides, which may be used for the epitaxial growth of Si, are prepared by operating the Verneuil process with a steep axial temperature gradient, in the region of the growing front, thus eliminating dislocations and leaving the crystal with a low residual stress, without annealing. As shown, a burning mixture of O 2 and H 2 are deflected immediately downstream of the growing tip 9, so that the flame does not envelope the crystal. If the growth furnace is not blocked off by ring 30, sleeve 14 of Al 2 O 3 is arranged to be a very close fit about crystal 10 (Figs. 1-6, not shown). A retractable bar 6 of sintered Al 2 O 3 supports the crystal 10 and a frame 23, which may be formed as a cooling coil to increase the axial temperature gradient, supports the gas deflector 112. The axial temperature gradient may be further increased by using parts of low thermal conductivity above the growing tip and parts of high thermal conductivity below it. The method is suitable for producing spinels, sapphires, rubies (for lasers), garnets and ferrites. It is stated that, by using a plasma burner, it is possible to produce monocrystals of high melting point metals, such as Nb.
GB2521671A 1970-03-24 1971-04-19 Manufacture of high-melting point oxide monocrystals Expired GB1339963A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19702014203 DE2014203C3 (en) 1970-03-24 1970-03-24 Apparatus for the production of single crystals according to Verneuil
DE19702057782 DE2057782A1 (en) 1970-11-24 1970-11-24 High melting oxide single crystals mfe freef -

Publications (1)

Publication Number Publication Date
GB1339963A true GB1339963A (en) 1973-12-05

Family

ID=25758879

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2521671A Expired GB1339963A (en) 1970-03-24 1971-04-19 Manufacture of high-melting point oxide monocrystals

Country Status (7)

Country Link
AT (1) AT333241B (en)
CA (1) CA942638A (en)
CH (1) CH571361A5 (en)
FR (1) FR2084999A5 (en)
GB (1) GB1339963A (en)
NL (1) NL7103970A (en)
SE (1) SE378070B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007016489A1 (en) * 2005-08-02 2007-02-08 Radion Mogilevsky Method for purifying and producing dense blocks

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007016489A1 (en) * 2005-08-02 2007-02-08 Radion Mogilevsky Method for purifying and producing dense blocks

Also Published As

Publication number Publication date
SE378070B (en) 1975-08-18
CA942638A (en) 1974-02-26
ATA249671A (en) 1976-03-15
FR2084999A5 (en) 1971-12-17
CH571361A5 (en) 1976-01-15
AT333241B (en) 1976-11-10
NL7103970A (en) 1971-09-28

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee