GB1335095A - Polycondensation copolymers - Google Patents
Polycondensation copolymersInfo
- Publication number
- GB1335095A GB1335095A GB1335095DA GB1335095A GB 1335095 A GB1335095 A GB 1335095A GB 1335095D A GB1335095D A GB 1335095DA GB 1335095 A GB1335095 A GB 1335095A
- Authority
- GB
- United Kingdom
- Prior art keywords
- acid
- diamine
- copolymers
- jan
- photo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229920001577 copolymer Polymers 0.000 title abstract 4
- 238000006068 polycondensation reaction Methods 0.000 title 1
- 239000002253 acid Substances 0.000 abstract 2
- 150000004985 diamines Chemical class 0.000 abstract 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 abstract 2
- XFNJVJPLKCPIBV-UHFFFAOYSA-N trimethylenediamine Chemical compound NCCCN XFNJVJPLKCPIBV-UHFFFAOYSA-N 0.000 abstract 2
- ILUAAIDVFMVTAU-OLQVQODUSA-N (1s,2r)-cyclohex-4-ene-1,2-dicarboxylic acid Chemical compound OC(=O)[C@H]1CC=CC[C@H]1C(O)=O ILUAAIDVFMVTAU-OLQVQODUSA-N 0.000 abstract 1
- OXIKYYJDTWKERT-UHFFFAOYSA-N [4-(aminomethyl)cyclohexyl]methanamine Chemical compound NCC1CCC(CN)CC1 OXIKYYJDTWKERT-UHFFFAOYSA-N 0.000 abstract 1
- -1 alicyclic diamine Chemical class 0.000 abstract 1
- 125000005263 alkylenediamine group Chemical group 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- WRUAHXANJKHFIL-UHFFFAOYSA-N benzene-1,3-disulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC(S(O)(=O)=O)=C1 WRUAHXANJKHFIL-UHFFFAOYSA-N 0.000 abstract 1
- 150000001735 carboxylic acids Chemical class 0.000 abstract 1
- 150000001805 chlorine compounds Chemical class 0.000 abstract 1
- 150000001991 dicarboxylic acids Chemical class 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-N sulfonic acid Chemical compound OS(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
- C08G75/30—Polysulfonamides; Polysulfonimides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0387—Polyamides or polyimides
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polyamides (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB183471 | 1971-01-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1335095A true GB1335095A (en) | 1973-10-24 |
Family
ID=9728821
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1335095D Expired GB1335095A (en) | 1971-01-14 | 1971-01-14 | Polycondensation copolymers |
Country Status (2)
| Country | Link |
|---|---|
| FR (1) | FR2122169A5 (enExample) |
| GB (1) | GB1335095A (enExample) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4107155A (en) | 1977-06-29 | 1978-08-15 | Eastman Kodak Company | Polysulfonamides |
| US4865950A (en) * | 1988-01-21 | 1989-09-12 | Eastman Kodak Co. | Laminate for the formation of beam leads for IC chip bonding featuring improved positive-working resist |
| US6045967A (en) * | 1997-01-10 | 2000-04-04 | Hyundai Electronics Industries Co., Ltd. | Method and device using ArF photoresist |
| US6291131B1 (en) | 1998-08-26 | 2001-09-18 | Hyundai Electronics Industries Co., Ltd. | Monomers for photoresist, polymers thereof, and photoresist compositions using the same |
| US6369181B1 (en) | 1997-12-29 | 2002-04-09 | Hyundai Electronics Industries Co., Ltd. | Copolymer resin, preparation thereof, and photoresist using the same |
| US6410670B1 (en) | 1998-08-26 | 2002-06-25 | Hyundai Electronics Industries Co., Ltd. | Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same |
| US6569971B2 (en) | 1998-08-27 | 2003-05-27 | Hyundai Electronics Industries Co., Ltd. | Polymers for photoresist and photoresist compositions using the same |
| EP2428842A1 (en) * | 2010-09-14 | 2012-03-14 | Rohm and Haas Electronic Materials LLC | Photoresists comprising multi-amide component |
| JP2019518981A (ja) * | 2016-05-12 | 2019-07-04 | ノーロッキー, ダニエル, ジェイ.NAWROCKI, Daniel, J. | ポリスルホンアミド再分布組成物及びその使用方法 |
-
1971
- 1971-01-14 GB GB1335095D patent/GB1335095A/en not_active Expired
-
1972
- 1972-01-11 FR FR7200716A patent/FR2122169A5/fr not_active Expired
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4107155A (en) | 1977-06-29 | 1978-08-15 | Eastman Kodak Company | Polysulfonamides |
| US4865950A (en) * | 1988-01-21 | 1989-09-12 | Eastman Kodak Co. | Laminate for the formation of beam leads for IC chip bonding featuring improved positive-working resist |
| US6045967A (en) * | 1997-01-10 | 2000-04-04 | Hyundai Electronics Industries Co., Ltd. | Method and device using ArF photoresist |
| US6608158B2 (en) | 1997-12-29 | 2003-08-19 | Hyundai Electronics Industries Co., Ltd. | Copolymer resin, preparation thereof, and photoresist using the same |
| US6369181B1 (en) | 1997-12-29 | 2002-04-09 | Hyundai Electronics Industries Co., Ltd. | Copolymer resin, preparation thereof, and photoresist using the same |
| US6291131B1 (en) | 1998-08-26 | 2001-09-18 | Hyundai Electronics Industries Co., Ltd. | Monomers for photoresist, polymers thereof, and photoresist compositions using the same |
| US6410670B1 (en) | 1998-08-26 | 2002-06-25 | Hyundai Electronics Industries Co., Ltd. | Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same |
| US6569971B2 (en) | 1998-08-27 | 2003-05-27 | Hyundai Electronics Industries Co., Ltd. | Polymers for photoresist and photoresist compositions using the same |
| US6987155B2 (en) | 1998-08-27 | 2006-01-17 | Hyundai Electronics Industries Co., Ltd. | Polymers for photoresist and photoresist compositions using the same |
| EP2428842A1 (en) * | 2010-09-14 | 2012-03-14 | Rohm and Haas Electronic Materials LLC | Photoresists comprising multi-amide component |
| CN102591145A (zh) * | 2010-09-14 | 2012-07-18 | 罗门哈斯电子材料有限公司 | 包含多酰胺组分的光刻胶 |
| CN102591145B (zh) * | 2010-09-14 | 2013-12-04 | 罗门哈斯电子材料有限公司 | 包含多酰胺组分的光刻胶 |
| JP2019518981A (ja) * | 2016-05-12 | 2019-07-04 | ノーロッキー, ダニエル, ジェイ.NAWROCKI, Daniel, J. | ポリスルホンアミド再分布組成物及びその使用方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2122169A5 (enExample) | 1972-08-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PLNP | Patent lapsed through nonpayment of renewal fees |