GB1331286A - Diazonaphthalene compounds - Google Patents
Diazonaphthalene compoundsInfo
- Publication number
- GB1331286A GB1331286A GB4910670A GB1331286DA GB1331286A GB 1331286 A GB1331286 A GB 1331286A GB 4910670 A GB4910670 A GB 4910670A GB 1331286D A GB1331286D A GB 1331286DA GB 1331286 A GB1331286 A GB 1331286A
- Authority
- GB
- United Kingdom
- Prior art keywords
- compounds
- represent
- diazonaphthalene
- oct
- different
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- MBENGEYDAUUYCZ-UHFFFAOYSA-N 1-diazo-2h-naphthalene Chemical class C1=CC=C2C(=[N+]=[N-])CC=CC2=C1 MBENGEYDAUUYCZ-UHFFFAOYSA-N 0.000 title abstract 2
- -1 aralkyl radical Chemical class 0.000 abstract 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 2
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 abstract 1
- URQUNWYOBNUYJQ-UHFFFAOYSA-N diazonaphthoquinone Chemical class C1=CC=C2C(=O)C(=[N]=[N])C=CC2=C1 URQUNWYOBNUYJQ-UHFFFAOYSA-N 0.000 abstract 1
- 125000005843 halogen group Chemical group 0.000 abstract 1
- 125000004430 oxygen atom Chemical group O* 0.000 abstract 1
- 239000003504 photosensitizing agent Substances 0.000 abstract 1
- 125000000547 substituted alkyl group Chemical group 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB4910670 | 1970-10-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1331286A true GB1331286A (en) | 1973-09-26 |
Family
ID=10451166
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB4910670A Expired GB1331286A (en) | 1970-10-15 | 1970-10-15 | Diazonaphthalene compounds |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | UST900030I4 (enExample) |
| FR (1) | FR2111292A5 (enExample) |
| GB (1) | GB1331286A (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0468531A1 (en) * | 1990-07-27 | 1992-01-29 | Fuji Photo Film Co., Ltd. | 2-Diazo-1,2-quinone compounds and image forming materials prepared using the compounds |
| US8715543B2 (en) | 2011-03-31 | 2014-05-06 | Ocv Intellectual Capital, Llc | Microencapsulated curing agent |
| US9315655B2 (en) | 2011-12-08 | 2016-04-19 | Ocv Intellectual Capital, Llc | Fiber reinforced resin molding compound and manufacturing method for fiber reinforced resin molded article therefrom |
-
1970
- 1970-10-15 GB GB4910670A patent/GB1331286A/en not_active Expired
-
1971
- 1971-07-06 US US900030D patent/UST900030I4/en active Pending
- 1971-10-13 FR FR7136708A patent/FR2111292A5/fr not_active Expired
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0468531A1 (en) * | 1990-07-27 | 1992-01-29 | Fuji Photo Film Co., Ltd. | 2-Diazo-1,2-quinone compounds and image forming materials prepared using the compounds |
| US5312905A (en) * | 1990-07-27 | 1994-05-17 | Fuji Photo Film Co., Ltd. | 2-diazo-1,2-naphthoquinone compounds |
| US5384227A (en) * | 1990-07-27 | 1995-01-24 | Fuji Photo Film Co., Ltd. | Image forming materials prepared using 2-diazo-1,2-naphthoquinone compounds having fluorine atom containing substituent groups |
| US5514518A (en) * | 1990-07-27 | 1996-05-07 | Fuji Photo Film Co., Ltd. | Method of improving delamination in an image forming material utilizing 2-diazo-1,2-quinone compounds having fluorine containing substituent groups |
| US8715543B2 (en) | 2011-03-31 | 2014-05-06 | Ocv Intellectual Capital, Llc | Microencapsulated curing agent |
| US9725575B2 (en) | 2011-03-31 | 2017-08-08 | Ocv Intellectual Capital, Llc | Microencapsulated curing agent |
| US9315655B2 (en) | 2011-12-08 | 2016-04-19 | Ocv Intellectual Capital, Llc | Fiber reinforced resin molding compound and manufacturing method for fiber reinforced resin molded article therefrom |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2111292A5 (enExample) | 1972-06-02 |
| UST900030I4 (en) | 1972-07-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| PLNP | Patent lapsed through nonpayment of renewal fees |