GB1328976A - Electronic scanning devices - Google Patents

Electronic scanning devices

Info

Publication number
GB1328976A
GB1328976A GB1328976DA GB1328976A GB 1328976 A GB1328976 A GB 1328976A GB 1328976D A GB1328976D A GB 1328976DA GB 1328976 A GB1328976 A GB 1328976A
Authority
GB
United Kingdom
Prior art keywords
specimen
scanning
output
line
marks
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BAE Systems Electronics Ltd
Original Assignee
Marconi Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Marconi Co Ltd filed Critical Marconi Co Ltd
Publication of GB1328976A publication Critical patent/GB1328976A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045Object or beam position registration
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams

Abstract

1328976 Optical positioning MARCONI CO Ltd 22 Dec 1970 [15 May 1970] 23620/70 Heading H4D [Also in Division G4] A pattern of square marks, Fig. 2, is applied to a specimen to assist in aligning the specimen in the beam of a scanning electron microscope. The output from the microscope is applied to a display device via an amplifier 1 Fig. 3, and lead 2. An oscillator 7 controls the scanning circuitry 4 of the microscope to give line frequency and field frequency outputs 4L, 4F which are fed to the deflection coils via leads 3X, 3Y. The circuitry 4 also supplies an output to a gate 8 which is gated on when the beam is scanning the specimen to allow through the output from amplifier 1 to a matched filter 9 which passes signals at the frequency corresponding to scanning of a line or column of the marks on the specimen. For aligning the specimen in the x direction, Fig. 2, switches 5, 6, Fig. 3 are first set to their a positions which causes the scanning raster to scan in lines L 1 , L 2 , L 3 parallel to the y-axis. The output of filter 9 is fed to a detector 10 which, when a signal of sufficient strength is passed by filter 9 gates on a gate 11 which passes the signal from a line counter 12 to a comparator 13 where it is compared with a predetermined number set in register 14, and an output is given on one of the lines 131, 132, 133, depending on whether the line being scanned is to the right of, the same as, or to the left of the predetermined line with which it is desired to align the first column of marks. The alignment of the specimen is then coarsely adjusted manually or automatically. Fine adjustment of the specimen is achieved by first switching switches 5, 6 to position b, the scanning raster then scanning in lines H 1 , H 2 , H 3 parallel to the x-axis. The output from filter 9 is fed to a phase comparator 15 where the phase of the signal due to the first line of specimen marks is compared with the phase of a signal from oscillator 7 via a variable delay 16. The output is passed via a low pass filter 17 and manual or automatic adjustment is carried out to finely align the specimen e.g. with scanning line L 3 running down the left-hand vertical edge of the first column of marks. Two circuits such 'as that shown in Fig. 3, one for aligning parallel to the x-axis and the other for aligning parallel to the y-axis may be used or one circuit with additional switches may be used for both x and y-axis alignment.
GB1328976D 1970-12-22 1970-12-22 Electronic scanning devices Expired GB1328976A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB2362070 1970-12-22

Publications (1)

Publication Number Publication Date
GB1328976A true GB1328976A (en) 1973-09-05

Family

ID=10198607

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1328976D Expired GB1328976A (en) 1970-12-22 1970-12-22 Electronic scanning devices

Country Status (1)

Country Link
GB (1) GB1328976A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4365163A (en) * 1980-12-19 1982-12-21 International Business Machines Corporation Pattern inspection tool - method and apparatus
US4431923A (en) * 1980-05-13 1984-02-14 Hughes Aircraft Company Alignment process using serial detection of repetitively patterned alignment marks
US4564764A (en) * 1982-09-30 1986-01-14 Fujitsu Limited Wafer having chips for determining the position of the wafer by means of electron beams
GB2182769A (en) * 1982-12-08 1987-05-20 Eltro Gmbh Detecting small targets

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4431923A (en) * 1980-05-13 1984-02-14 Hughes Aircraft Company Alignment process using serial detection of repetitively patterned alignment marks
US4365163A (en) * 1980-12-19 1982-12-21 International Business Machines Corporation Pattern inspection tool - method and apparatus
US4564764A (en) * 1982-09-30 1986-01-14 Fujitsu Limited Wafer having chips for determining the position of the wafer by means of electron beams
GB2182769A (en) * 1982-12-08 1987-05-20 Eltro Gmbh Detecting small targets

Similar Documents

Publication Publication Date Title
DE2054973A1 (en) Distance measurement device
US4325077A (en) Automatic wafer alignment system
GB1064649A (en) Video tracker
GB1121740A (en) Improvements in or relating to electrical position resolver arrangements
GB1328976A (en) Electronic scanning devices
DE2644928C3 (en) Electromagnetic vehicle detector
DE830534C (en) Device for determining direction
GB668786A (en) Improvements in television signal control system
FR2404977A1 (en) TELEVISION SIGNAL PROCESSING CIRCUIT
DE4443709A1 (en) CRT bidirectional deflection control for VDU and television receiver
DE2702444A1 (en) CORPUSCULAR BEAM OPTICAL DEVICE FOR IMAGING A MASK ON A PREPARATION
US3643018A (en) Alignment system using an electronic scanner
DE705417C (en) Method and device for determining the direction of incidence of vibration processes by comparing their total transit times
US2661443A (en) Television keystone balance control circuit
DE1516751C3 (en) Device for tracking an antenna to an object emitting electromagnetic waves
US3699380A (en) Automatic boresighting circuit
DE3414736A1 (en) FREQUENCY DISCRIMINATOR
US3535557A (en) Storage time subtraction circuit
DE19738254A1 (en) Transceiver arrangement for phase array antenna
US2704325A (en) Scanning panoramic receiver system
DE1916756A1 (en) Radar system with panoramic display
DE2422749C2 (en) Photoelectric detector for determining the relative position of a body with respect to two axis directions
DE2362310C3 (en) High frequency radiometric metering device
JPS61212928A (en) Disturbing wave rejecting device
US2468116A (en) Direction finder

Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee