GB1308030A - Photographic exposing apparatus - Google Patents

Photographic exposing apparatus

Info

Publication number
GB1308030A
GB1308030A GB3179770A GB3179770A GB1308030A GB 1308030 A GB1308030 A GB 1308030A GB 3179770 A GB3179770 A GB 3179770A GB 3179770 A GB3179770 A GB 3179770A GB 1308030 A GB1308030 A GB 1308030A
Authority
GB
United Kingdom
Prior art keywords
signal
deflector
light beam
photographic
july
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3179770A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1308030A publication Critical patent/GB1308030A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704Scanned exposure beam, e.g. raster-, rotary- and vector scanning
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05DSYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D3/00Control of position or direction
    • G05D3/12Control of position or direction using feedback
    • G05D3/20Control of position or direction using feedback using a digital comparing device

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

1308030 Photographic apparatus; programmed control INTERNATIONAL BUSINESS MACHINES CORP 1 July 1970 [2 July 1969] 31797/70 Headings G2A and G3N Photographic exposing apparatus includes means to move a work-table 12 transverse to the path of a light beam 2 is response to a first signal, from a computer 18, representing a desired position of the table; a comparator 19 responsive to the first signal and to a second signal, from interferometric measuring devices 15, 16, indicative of an actual position of the table to generate a third signal representing the difference between the two table positions; and a beam deflector 5 responsive to the third signal to deflect the light beam 2 thereby compensating for the difference in table position. The deflector 5 operates while the table is in motion, and the apparatus further includes means for controlling the intensity of the light beam in dependence on the speed of movement of the table 12 relative to the beam. The work-table 12, carrying a semi-conductor wafer 11, is stepped in X and/or Y co-ordinate directions by motors 13, 14 and spindles 23, 24 in response to a first signal from the computer 18. The deflector 5 comprises two series of electro-optical deflecting stages, each series being associated with a co-ordinate direction. It is arranged that a single step effected by the motors 13, 4 is equivalent to one step of deflection produced by the deflector 5. A condenser 3 is provided to give a collimated light beam.
GB3179770A 1969-07-02 1970-07-01 Photographic exposing apparatus Expired GB1308030A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19691933487 DE1933487A1 (en) 1969-07-02 1969-07-02 Light point recorder

Publications (1)

Publication Number Publication Date
GB1308030A true GB1308030A (en) 1973-02-21

Family

ID=5738610

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3179770A Expired GB1308030A (en) 1969-07-02 1970-07-01 Photographic exposing apparatus

Country Status (3)

Country Link
DE (1) DE1933487A1 (en)
FR (1) FR2056222A5 (en)
GB (1) GB1308030A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2133168A (en) * 1982-12-27 1984-07-18 Nicolet Instrument Corp Photoplotter
US9645502B2 (en) 2011-04-08 2017-05-09 Asml Netherlands B.V. Lithographic apparatus, programmable patterning device and lithographic method

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2135425B1 (en) * 1971-05-04 1973-08-10 Thomson Csf

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2133168A (en) * 1982-12-27 1984-07-18 Nicolet Instrument Corp Photoplotter
US4500182A (en) * 1982-12-27 1985-02-19 Nicolet Instrument Corporation Photoplotter
US9645502B2 (en) 2011-04-08 2017-05-09 Asml Netherlands B.V. Lithographic apparatus, programmable patterning device and lithographic method

Also Published As

Publication number Publication date
FR2056222A5 (en) 1971-05-14
DE1933487A1 (en) 1971-01-14

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee