GB1300293A - A solid-state image intensifier - Google Patents

A solid-state image intensifier

Info

Publication number
GB1300293A
GB1300293A GB4504670A GB4504670A GB1300293A GB 1300293 A GB1300293 A GB 1300293A GB 4504670 A GB4504670 A GB 4504670A GB 4504670 A GB4504670 A GB 4504670A GB 1300293 A GB1300293 A GB 1300293A
Authority
GB
United Kingdom
Prior art keywords
layer
resistive
resistance
layers
phosphor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4504670A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Publication of GB1300293A publication Critical patent/GB1300293A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/12Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof structurally associated with, e.g. formed in or on a common substrate with, one or more electric light sources, e.g. electroluminescent light sources, and electrically or optically coupled thereto
    • H01L31/14Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof structurally associated with, e.g. formed in or on a common substrate with, one or more electric light sources, e.g. electroluminescent light sources, and electrically or optically coupled thereto the light source or sources being controlled by the semiconductor device sensitive to radiation, e.g. image converters, image amplifiers or image storage devices

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Luminescent Compositions (AREA)
  • Electroluminescent Light Sources (AREA)
  • Photo Coupler, Interrupter, Optical-To-Optical Conversion Devices (AREA)

Abstract

1300293 Electroluminescence MATSUSHITA ELECTRIC INDUSTRIAL CO Ltd 22 Sept 1970 [22 Sept 1969] 45046/70 Heading C4S [Also in Division C1] A solid state image intensifier comprises a layer of photoconductive material 16 and a layer of electroluminescent material 13, the impedance of the former varying with applied radiant energy, first conductive layer 17 permeable to visible light, X-rays, infra red or U.V. rays for example, transparent conductive layer 12, and D.C. and A.C. voltage sources, the EL material consisting of 45 to 70% by volume of particulate EL phosphor having an inherent non-linear resistance, the remainder being binding material, the phosphor conferring a non-linear resistive impedance to the EL layer which keeps the D.C. value across the pc layer at a constant value so that when a unidirectional field provided by said D.C. voltage source is varied to shift the characteristic curve (Fig.3, not shown) to a low input energy range, there is no appreciable change in contrast ratio and gamma value. The pc layer may be formed from sulphides, selenides or tellurides of Cd, Pb or Zn (e.g. CdS, CdSe or cadmium sulphoselenide activated by Cu, Ag, Cl, Al or Ga); the EL layer from ZnS: Cu, Al, and the binding material a vitreous material such as borosilicate glass enamel or a plastic such as epoxy resin. The borosilicate glass enamel may be SiO 2 , 14À5 to 44À1%, B 2 O 3 23À7 to 28À7%, ZnO 2À2 to 23À5%, BaO up to 14À6%, Na 2 O 10À9 to 15À4%, K 2 O up to 4À2%, TiO 2 up to 9À0%, Al 2 O 3 up to 2À7% and CaO, MgO, Pe 2 O 3 and PbO up to 1À2% and having a softening point 45‹ to 515‹ C. and sol. thermal expansion coeff. of 260 Î 10<SP>-7</SP> to 340 Î 10<SP>-7</SP>‹C. in which case a heat resisting substrate is used such as soda glass which has a higher softening point and same vol. exp., e.g. 690‹ C. and 310 Î 10<SP>-7</SP> respectively. The EL mix is applied with an organic solvent such as alcohol at 500 to 670‹ C. Layers 14, 15 of a resistive, light reflective material and a resistive, light opaque material may be included layer 14 being particles of ferro-electric material such as high specific resistance BaTiO 3 , providing increased dielectric constant, mixed with a resistive plastic or with a resistive material such as TiO 2 and a plastic such as epoxy resin, and layer 15 being a powdered resistive material such as CdS : Cl. Layers 14, 15 are 10Á and 15Á thick and prevent EL layer 13 damage from breakdown. Layers 14, 15 may compensate layer 13 resistance and impedance matching of the D.C. circuit and layers 14, 15 may be nonlinear or linear resistances and preferably of smaller resistance than the pc layer dark resistance which may be 200 to 500Á thick. Conductors 12 and 17 may be of tin oxide and layer 17 may be evaporated Al. Alternatively, parallel wires or an apertured or grid electrode may be used. Fig. 5 (not shown) illustrates a nonlinear V-I characteristic for an EL layer containing 50% EL phosphor.
GB4504670A 1969-09-22 1970-09-22 A solid-state image intensifier Expired GB1300293A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7717569A JPS535512B1 (en) 1969-09-22 1969-09-22

Publications (1)

Publication Number Publication Date
GB1300293A true GB1300293A (en) 1972-12-20

Family

ID=13626446

Family Applications (1)

Application Number Title Priority Date Filing Date
GB4504670A Expired GB1300293A (en) 1969-09-22 1970-09-22 A solid-state image intensifier

Country Status (5)

Country Link
JP (1) JPS535512B1 (en)
DE (1) DE2046702C3 (en)
FR (1) FR2062505A5 (en)
GB (1) GB1300293A (en)
NL (1) NL7013986A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1604206A (en) * 1977-06-20 1981-12-02 Hughes Aircraft Co Ac driven liquid crystal light valve

Also Published As

Publication number Publication date
DE2046702C3 (en) 1975-02-20
JPS535512B1 (en) 1978-02-28
NL7013986A (en) 1971-03-24
DE2046702A1 (en) 1971-04-15
FR2062505A5 (en) 1971-06-25
DE2046702B2 (en) 1974-07-04

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Legal Events

Date Code Title Description
PS Patent sealed
746 Register noted 'licences of right' (sect. 46/1977)
PCNP Patent ceased through non-payment of renewal fee