GB1293574A - Improvements in or relating to methods of depositing metal layers by electroplating - Google Patents

Improvements in or relating to methods of depositing metal layers by electroplating

Info

Publication number
GB1293574A
GB1293574A GB5852669A GB5852669A GB1293574A GB 1293574 A GB1293574 A GB 1293574A GB 5852669 A GB5852669 A GB 5852669A GB 5852669 A GB5852669 A GB 5852669A GB 1293574 A GB1293574 A GB 1293574A
Authority
GB
United Kingdom
Prior art keywords
layer
aluminium
gold
electroplating
devices
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB5852669A
Inventor
William Frederick Stacey
Gerald Herbert Swallow
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Associated Electrical Industries Ltd
Original Assignee
Associated Electrical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Associated Electrical Industries Ltd filed Critical Associated Electrical Industries Ltd
Priority to GB5852669A priority Critical patent/GB1293574A/en
Publication of GB1293574A publication Critical patent/GB1293574A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02Electroplating of selected surface areas

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrodes Of Semiconductors (AREA)

Abstract

1293574 Semi-conductor devices ASSOCIATED ELECTRICAL INDUSTRIES Ltd 1 Dec 1970 [1 Dec 1969] 58526/69 Heading H1K [Also in Division C7] A semi-conductor microwave diode of planar form comprises a wafer 2 of N-type germanium, a coating 1 of silicon dioxide containing an aperture overlaying which are successively deposited layers of aluminium 4, titanium 5 (e.g. by evaporation) and gold 7 (by electroplating). The configuration of the gold layer may be such as to provide an electrode or a beam lead. The structure may be treated to cause diffusion of aluminium from the layer 4 into the germanium to form a P-type region. In alternative embodiments the aluminium layer may be omitted, or a metal other than gold may be used for the layer 7, and the titanium layer be deleted, the completed device being of the metal-to-semiconductor junction type. A plurality of devices may be produced on a single wafer which is subsequently cut up to form single devices.
GB5852669A 1969-12-01 1969-12-01 Improvements in or relating to methods of depositing metal layers by electroplating Expired GB1293574A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB5852669A GB1293574A (en) 1969-12-01 1969-12-01 Improvements in or relating to methods of depositing metal layers by electroplating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB5852669A GB1293574A (en) 1969-12-01 1969-12-01 Improvements in or relating to methods of depositing metal layers by electroplating

Publications (1)

Publication Number Publication Date
GB1293574A true GB1293574A (en) 1972-10-18

Family

ID=10481824

Family Applications (1)

Application Number Title Priority Date Filing Date
GB5852669A Expired GB1293574A (en) 1969-12-01 1969-12-01 Improvements in or relating to methods of depositing metal layers by electroplating

Country Status (1)

Country Link
GB (1) GB1293574A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4175010A (en) * 1977-04-18 1979-11-20 U.S. Philips Corporation Method of reinforcing a conductive base pattern by electroplating and device obtained by means of the method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4175010A (en) * 1977-04-18 1979-11-20 U.S. Philips Corporation Method of reinforcing a conductive base pattern by electroplating and device obtained by means of the method

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Legal Events

Date Code Title Description
PS Patent sealed
PE20 Patent expired after termination of 20 years