GB1290727A - - Google Patents
Info
- Publication number
- GB1290727A GB1290727A GB1290727DA GB1290727A GB 1290727 A GB1290727 A GB 1290727A GB 1290727D A GB1290727D A GB 1290727DA GB 1290727 A GB1290727 A GB 1290727A
- Authority
- GB
- United Kingdom
- Prior art keywords
- dispersion
- photopolymerizable
- composition
- macromolecular organic
- phenanthraquinone
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000203 mixture Substances 0.000 abstract 3
- 239000000178 monomer Substances 0.000 abstract 3
- YYVYAPXYZVYDHN-UHFFFAOYSA-N 9,10-phenanthroquinone Chemical compound C1=CC=C2C(=O)C(=O)C3=CC=CC=C3C2=C1 YYVYAPXYZVYDHN-UHFFFAOYSA-N 0.000 abstract 2
- 239000001828 Gelatine Substances 0.000 abstract 2
- 239000011230 binding agent Substances 0.000 abstract 2
- 239000006185 dispersion Substances 0.000 abstract 2
- 229920000159 gelatin Polymers 0.000 abstract 2
- 235000019322 gelatine Nutrition 0.000 abstract 2
- 239000003999 initiator Substances 0.000 abstract 2
- 239000002609 medium Substances 0.000 abstract 2
- 229920000620 organic polymer Polymers 0.000 abstract 2
- -1 polyethylene terephthalate Polymers 0.000 abstract 2
- 230000005855 radiation Effects 0.000 abstract 2
- 239000004372 Polyvinyl alcohol Substances 0.000 abstract 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 abstract 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 abstract 1
- 239000007864 aqueous solution Substances 0.000 abstract 1
- 238000009835 boiling Methods 0.000 abstract 1
- 239000000298 carbocyanine Substances 0.000 abstract 1
- 239000000539 dimer Substances 0.000 abstract 1
- 239000004815 dispersion polymer Substances 0.000 abstract 1
- 229920001477 hydrophilic polymer Polymers 0.000 abstract 1
- 230000000977 initiatory effect Effects 0.000 abstract 1
- 239000003960 organic solvent Substances 0.000 abstract 1
- QWYZFXLSWMXLDM-UHFFFAOYSA-M pinacyanol iodide Chemical compound [I-].C1=CC2=CC=CC=C2N(CC)C1=CC=CC1=CC=C(C=CC=C2)C2=[N+]1CC QWYZFXLSWMXLDM-UHFFFAOYSA-M 0.000 abstract 1
- 229920000139 polyethylene terephthalate Polymers 0.000 abstract 1
- 239000005020 polyethylene terephthalate Substances 0.000 abstract 1
- 229920002451 polyvinyl alcohol Polymers 0.000 abstract 1
- 150000003254 radicals Chemical class 0.000 abstract 1
- 239000007787 solid Substances 0.000 abstract 1
- 239000000243 solution Substances 0.000 abstract 1
- 238000003756 stirring Methods 0.000 abstract 1
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 abstract 1
- 229940096522 trimethylolpropane triacrylate Drugs 0.000 abstract 1
- 229920003176 water-insoluble polymer Polymers 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/061—Etching masks
- H05K3/064—Photoresists
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
- C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/02—Details related to mechanical or acoustic processing, e.g. drilling, punching, cutting, using ultrasound
- H05K2203/0264—Peeling insulating layer, e.g. foil, or separating mask
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0502—Patterning and lithography
- H05K2203/0537—Transfer of pre-fabricated insulating pattern
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Polymerisation Methods In General (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US76632968A | 1968-10-09 | 1968-10-09 | |
| US84929769A | 1969-08-07 | 1969-08-07 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1290727A true GB1290727A (enrdf_load_stackoverflow) | 1972-09-27 |
Family
ID=27117724
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1290727D Expired GB1290727A (enrdf_load_stackoverflow) | 1968-10-09 | 1969-10-08 |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS498281B1 (enrdf_load_stackoverflow) |
| BE (1) | BE739978A (enrdf_load_stackoverflow) |
| DE (1) | DE1950120A1 (enrdf_load_stackoverflow) |
| FR (1) | FR2020258A1 (enrdf_load_stackoverflow) |
| GB (1) | GB1290727A (enrdf_load_stackoverflow) |
| NL (1) | NL6915320A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5045429A (en) * | 1985-08-07 | 1991-09-03 | Hoechst Aktiengesellschaft | Light-sensitive photopolymerizable and diazonium resin containing composition and recording material including reaction product of anhydride with carboxylic acid and vinyl alcohol |
| US5554487A (en) * | 1991-03-15 | 1996-09-10 | Coates Brothers Plc | Resist formation made by applying, drying and reflowing a suspension of photocurable material |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2204244C3 (de) * | 1971-02-02 | 1981-02-19 | E.I. Du Pont De Nemours And Co., Wilmington, Del. (V.St.A.) | Fotopolymerisierbares Aufzeichnungsmaterial |
| CA1116919A (en) * | 1976-10-27 | 1982-01-26 | Joseph E. Gervay | Flame retardant radiation sensitive element of photopolymerizable composition containing halogen and an acrylonitrile containing polymeric binder |
| US4282309A (en) * | 1979-01-24 | 1981-08-04 | Agfa-Gevaert, N.V. | Photosensitive composition containing an ethylenically unsaturated compound, initiator and sensitizer |
-
1969
- 1969-10-04 DE DE19691950120 patent/DE1950120A1/de active Pending
- 1969-10-08 GB GB1290727D patent/GB1290727A/en not_active Expired
- 1969-10-08 JP JP7999669A patent/JPS498281B1/ja active Pending
- 1969-10-08 BE BE739978D patent/BE739978A/xx not_active IP Right Cessation
- 1969-10-09 FR FR6934578A patent/FR2020258A1/fr active Pending
- 1969-10-09 NL NL6915320A patent/NL6915320A/xx unknown
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5045429A (en) * | 1985-08-07 | 1991-09-03 | Hoechst Aktiengesellschaft | Light-sensitive photopolymerizable and diazonium resin containing composition and recording material including reaction product of anhydride with carboxylic acid and vinyl alcohol |
| US5554487A (en) * | 1991-03-15 | 1996-09-10 | Coates Brothers Plc | Resist formation made by applying, drying and reflowing a suspension of photocurable material |
Also Published As
| Publication number | Publication date |
|---|---|
| NL6915320A (enrdf_load_stackoverflow) | 1970-04-13 |
| BE739978A (enrdf_load_stackoverflow) | 1970-04-08 |
| FR2020258A1 (enrdf_load_stackoverflow) | 1970-07-10 |
| DE1950120A1 (de) | 1970-04-30 |
| JPS498281B1 (enrdf_load_stackoverflow) | 1974-02-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PE20 | Patent expired after termination of 20 years |