GB1247985A - High frequency responsive semiconductive capacitor - Google Patents

High frequency responsive semiconductive capacitor

Info

Publication number
GB1247985A
GB1247985A GB2434369A GB2434369A GB1247985A GB 1247985 A GB1247985 A GB 1247985A GB 2434369 A GB2434369 A GB 2434369A GB 2434369 A GB2434369 A GB 2434369A GB 1247985 A GB1247985 A GB 1247985A
Authority
GB
United Kingdom
Prior art keywords
semi
conductor
conductive fingers
capacitor
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2434369A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RCA Corp
Original Assignee
RCA Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RCA Corp filed Critical RCA Corp
Publication of GB1247985A publication Critical patent/GB1247985A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/92Capacitors having potential barriers
    • H01L29/94Metal-insulator-semiconductors, e.g. MOS
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)

Abstract

1,247,985. Semi-conductor devices. R.C.A. CORPORATION. 13 May, 1969 [21 Aug., 1968], No. 24343/69. Heading H1K. A semi-conductor capacitor comprises a layer 12 of semi-conductor material on which is a layer 14 of insulating material having apertures to allow a plurality of interconnected conductive fingers 16 to contact the semi-conductor, and a further plurality of interconnected conductive fingers 18 arranged in interdigitated relationship with the first set being disposed on the surface of the insulating layer, the two sets of conductive fingers serving as electrodes of the capacitor. The semi-conductor material may be silicon or cadmium selenide, and may be formed by epitaxy on an insulating substrate of sapphire or ceramic, or in a further embodiment, Fig. 5, not shown, may be formed on a body of semi-conductor material of the opposite conductivity type. The insulating layer is formed from the oxide of the semi-conductive material and the conductive fingers may be of metal or very low resistivity semi-conductor material.
GB2434369A 1968-08-21 1969-05-13 High frequency responsive semiconductive capacitor Expired GB1247985A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US75432168A 1968-08-21 1968-08-21

Publications (1)

Publication Number Publication Date
GB1247985A true GB1247985A (en) 1971-09-29

Family

ID=25034287

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2434369A Expired GB1247985A (en) 1968-08-21 1969-05-13 High frequency responsive semiconductive capacitor

Country Status (3)

Country Link
DE (1) DE1940300A1 (en)
FR (1) FR2016025A1 (en)
GB (1) GB1247985A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6974744B1 (en) 2000-09-05 2005-12-13 Marvell International Ltd. Fringing capacitor structure
US6980414B1 (en) 2004-06-16 2005-12-27 Marvell International, Ltd. Capacitor structure in a semiconductor device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0171445A1 (en) * 1984-08-11 1986-02-19 Deutsche ITT Industries GmbH Integrated monolithic circuit with an integrated MIS-capacitor

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6974744B1 (en) 2000-09-05 2005-12-13 Marvell International Ltd. Fringing capacitor structure
US9017427B1 (en) 2001-01-18 2015-04-28 Marvell International Ltd. Method of creating capacitor structure in a semiconductor device
US6980414B1 (en) 2004-06-16 2005-12-27 Marvell International, Ltd. Capacitor structure in a semiconductor device
US7116544B1 (en) 2004-06-16 2006-10-03 Marvell International, Ltd. Capacitor structure in a semiconductor device
US7578858B1 (en) 2004-06-16 2009-08-25 Marvell International Ltd. Making capacitor structure in a semiconductor device
US7988744B1 (en) 2004-06-16 2011-08-02 Marvell International Ltd. Method of producing capacitor structure in a semiconductor device
US8537524B1 (en) 2004-06-16 2013-09-17 Marvell International Ltd. Capacitor structure in a semiconductor device

Also Published As

Publication number Publication date
DE1940300A1 (en) 1970-08-06
FR2016025A1 (en) 1970-04-30

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