GB1247095A - Film resistor element - Google Patents

Film resistor element

Info

Publication number
GB1247095A
GB1247095A GB5547469A GB5547469A GB1247095A GB 1247095 A GB1247095 A GB 1247095A GB 5547469 A GB5547469 A GB 5547469A GB 5547469 A GB5547469 A GB 5547469A GB 1247095 A GB1247095 A GB 1247095A
Authority
GB
United Kingdom
Prior art keywords
conductive particles
particles
preh
resistors
conductive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB5547469A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Preh GmbH
Original Assignee
Preh GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19681809363 external-priority patent/DE1809363C3/en
Application filed by Preh GmbH filed Critical Preh GmbH
Publication of GB1247095A publication Critical patent/GB1247095A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0047Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C17/00Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/065Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thick film techniques, e.g. serigraphy
    • H01C17/06506Precursor compositions therefor, e.g. pastes, inks, glass frits
    • H01C17/06573Precursor compositions therefor, e.g. pastes, inks, glass frits characterised by the permanent binder
    • H01C17/06586Precursor compositions therefor, e.g. pastes, inks, glass frits characterised by the permanent binder composed of organic material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C17/00Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/07Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by resistor foil bonding, e.g. cladding

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Conductive Materials (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Thermistors And Varistors (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

1,247,095. Resistors. W. PREH, [trading as PREH ELEKTROFEINMECHANISCHE WERKE JAKOB PREH NACHFOLGER]. 12 Nov., 1969 [16 Nov., 1968], No. 55474/69. Heading H1S. In a film resistor comprising conductive particles in a non-conductive material, the non- conductive material is a synthetic polymer capable of being cross-linked by irradiation, so that the film may be hardened quickly without the action of heat. The radiation may be X-rays, y-rays, electrons, neutrons, protons or α- particles, with a dose in the range 1 to 30 megarad. The polymer used may be acryl monomer-polymer mixtures, acryl polyester resins, acrylically modified epoxy resins or unsaturated polyester resins. The conductive particles, added in a volume concentration of 15-85%, may be finely divided metals, e.g. Fe, Cu, Cr, Al, Ag, Au, or their alloys, with particle sizes 10-100 Á; or they may be finely-divided graphite, or acetylene carbon black with a specific surface 80-150 m.<SP>2</SP>/g. For high resistance resistors semi-conductive particles (metal oxides, e.g. SnO 2 or Sb 2 O 3 , or sulphides, e.g. CdS and PbS) may be added together with the conductive particles, in such proportions that the total filler volume concentration is 25-50%. For resistors to be used as slide rheostats &c., substances having a dihexagonal-bipyramidal crystal structure may be added in volume concentration 1-10% to improve sliding properties and reduce wear. Of such substances, graphite will serve simultaneously as conductive material and molybdenum disulphide as semiconductive material. Details are given in the Specification of the production of the conductive particles, the mixing of the particles and the other material, the polymerization process, and the acceleration, deflection &c. of the electron beam.
GB5547469A 1968-11-16 1969-11-12 Film resistor element Expired GB1247095A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19681809363 DE1809363C3 (en) 1968-11-16 Process for the production of sheet resistance elements

Publications (1)

Publication Number Publication Date
GB1247095A true GB1247095A (en) 1971-09-22

Family

ID=5713546

Family Applications (1)

Application Number Title Priority Date Filing Date
GB5547469A Expired GB1247095A (en) 1968-11-16 1969-11-12 Film resistor element

Country Status (5)

Country Link
AT (1) AT296433B (en)
DK (1) DK137102B (en)
FR (1) FR2023452A1 (en)
GB (1) GB1247095A (en)
NL (1) NL6916337A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2222409A1 (en) * 1973-03-20 1974-10-18 Raychem Ltd

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6041312A (en) * 1983-08-16 1985-03-05 Tdk Corp Circuit element
US4758815A (en) * 1986-07-10 1988-07-19 Tapeswitch Corporation Of America Tap element and methods, for heating, pressure measurement and circuit fabrication
US5180900A (en) * 1991-04-15 1993-01-19 Tapeswitch Corporation Of America Electrical resistance element with heat-sensitive disconnect capability

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2222409A1 (en) * 1973-03-20 1974-10-18 Raychem Ltd

Also Published As

Publication number Publication date
NL6916337A (en) 1970-05-20
AT296433B (en) 1972-02-10
DK137102B (en) 1978-01-16
FR2023452A1 (en) 1970-08-21
DK137102C (en) 1978-06-19
DE1809363A1 (en) 1970-06-11
DE1809363B2 (en) 1976-06-16

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