GB1241824A - Radiation-curable compositions - Google Patents

Radiation-curable compositions

Info

Publication number
GB1241824A
GB1241824A GB6077/71A GB607771A GB1241824A GB 1241824 A GB1241824 A GB 1241824A GB 6077/71 A GB6077/71 A GB 6077/71A GB 607771 A GB607771 A GB 607771A GB 1241824 A GB1241824 A GB 1241824A
Authority
GB
United Kingdom
Prior art keywords
compositions
compounds
radiation
prepolymer
bromo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB6077/71A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sun Chemical Corp
Original Assignee
Sun Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sun Chemical Corp filed Critical Sun Chemical Corp
Priority claimed from GB32966/68A external-priority patent/GB1241823A/en
Publication of GB1241824A publication Critical patent/GB1241824A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10Esters
    • C08F20/20Esters of polyhydric alcohols or polyhydric phenols, e.g. 2-hydroxyethyl (meth)acrylate or glycerol mono-(meth)acrylate
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/20Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen
    • C08L61/22Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with acyclic or carbocyclic compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/10Printing inks based on artificial resins
    • C09D11/101Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J4/00Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295Photolytic halogen compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Inorganic Chemistry (AREA)
  • Adhesives Or Adhesive Processes (AREA)

Abstract

1,241,824. Radiation-curable adhesives. SUN CHEMICAL CORP. 10 July, 1968 [10 July, 1967 (2); 11 Oct., 1967; 24 Nov., 1967 (5)], No. 6077/71. Heading B5N. [Also in Divisions B2, C3 and G2] Compositions which are curable (i.e. polymerizable) by exposure to actinic or highenergy ionizing radiation, and which serve as laminating adhesives, comprise (1) a radiationcurable component which includes (a) a monomeric polyethylenically unsaturated (i.e. having two or more terminal ethylenic groups) ester of an alkylene or polyalkylene glycol or of a trihydric alcohol (e.g. trimethylolethane or trimethylolpropane) and/or (b) a prepolymer of the monomeric polyethylenically unsaturated ester; and (2) a photoinitiator selected from (c) acyloins and derivatives thereof, (d) halogenated aromatic compounds, other than quinones, having at least one halogen atom bonded directly to the aromatic nucleus thereof, (e) halogenated aliphatic hydrocarbons containing more than two carbon atoms in the molecule and (f) halogenated alicyclic compounds having at least one halogen atom bonded to the alicyclic nucleus thereof, provided that when component (1) does not include a prepolymer (b) a photoinitiator is selected from one of groups (d), (e) and (f). The polyethylenically unsaturated ester in (1) may be a di- or tri-acrylate, methacrylate or itaconate; the prepolymer may be a dimer, trimer or higher oligomer. Suitable photoinitiators include benzoin (m) ethyl ether, desyl bromide or chloride, desyl amine, polychlorinated polyphenyl compounds, chlorinated aliphatic waxes, perchloropentacyclodecane, chlorinated paraffins, mono- and poly-chloro (or bromo) benzenes, mono- and poly-chloro (or bromo) xylenes, 1-bromo-3-(m-phenoxyphenoxy)-benzene and chlorendic anhydride. The compositions may be cured by exposure to such sources as ultraviolet lamps, beams from electron accelerators and gamma-ray emitters, e.g. cobalt-60; mixed combinations of such sources may also be used, simultaneously or consecutively. Other optional components in the curable compositions include film-forming compounds, e.g. p-toluenesulphonamide-formaldehyde resins, diallyl phthalate prepolymers and chain transfer agents. Typical laminations for which the adhesive compositions may be used include polymercoated regenerated cellulose to itself or to polypropylene ; polyethylene terephthalate to metal, e.g. copper; oriented polypropylene to aluminium ; and treated polyethylene to itself. At least one of the materials used must be capable of transmitting the radiation required for curing the adhesive.
GB6077/71A 1967-07-10 1968-07-10 Radiation-curable compositions Expired GB1241824A (en)

Applications Claiming Priority (11)

Application Number Priority Date Filing Date Title
US65197567A 1967-07-10 1967-07-10
US65197667A 1967-07-10 1967-07-10
US67464767A 1967-10-11 1967-10-11
US68525967A 1967-11-24 1967-11-24
US68533167A 1967-11-24 1967-11-24
US68530567A 1967-11-24 1967-11-24
US68526467A 1967-11-24 1967-11-24
US68525367A 1967-11-24 1967-11-24
US68524967A 1967-11-24 1967-11-24
US68526867A 1967-11-24 1967-11-24
GB32966/68A GB1241823A (en) 1967-10-11 1968-07-10 Radiation-curable compositions

Publications (1)

Publication Number Publication Date
GB1241824A true GB1241824A (en) 1971-08-04

Family

ID=27581646

Family Applications (1)

Application Number Title Priority Date Filing Date
GB6077/71A Expired GB1241824A (en) 1967-07-10 1968-07-10 Radiation-curable compositions

Country Status (1)

Country Link
GB (1) GB1241824A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0051385A1 (en) * 1980-11-03 1982-05-12 Minnesota Mining And Manufacturing Company Anaerobically-curing compositions
US4447588A (en) * 1980-11-03 1984-05-08 Minnesota Mining & Manufacturing Company Anaerobically-curing compositions
GB2159825A (en) * 1984-04-23 1985-12-11 Gore & Ass Crosslinkable material and composite semipermeable membrane
WO2009076572A3 (en) * 2007-12-12 2009-08-13 3M Innovative Properties Co Methods of making an article and articles

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0051385A1 (en) * 1980-11-03 1982-05-12 Minnesota Mining And Manufacturing Company Anaerobically-curing compositions
US4447588A (en) * 1980-11-03 1984-05-08 Minnesota Mining & Manufacturing Company Anaerobically-curing compositions
GB2159825A (en) * 1984-04-23 1985-12-11 Gore & Ass Crosslinkable material and composite semipermeable membrane
WO2009076572A3 (en) * 2007-12-12 2009-08-13 3M Innovative Properties Co Methods of making an article and articles

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