GB1234117A - - Google Patents

Info

Publication number
GB1234117A
GB1234117A GB1234117DA GB1234117A GB 1234117 A GB1234117 A GB 1234117A GB 1234117D A GB1234117D A GB 1234117DA GB 1234117 A GB1234117 A GB 1234117A
Authority
GB
United Kingdom
Prior art keywords
mask
wafer
patterns
lens
mirror
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of GB1234117A publication Critical patent/GB1234117A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

1,234,117. Aligning Masks. FUJITSU Ltd. June 25, 1969 [July 5, 1968] , No.32047/69. Heading G2J. In a photographic mask apparatus it is possible to align a mask on one surface of a wafer with patterns provided on the opposite surface of the wafer, even if the wafer is opaque. The wafer 1 is mounted on a glass 9 and the mask 2 is illuminated, via a partial reflector 10, by a light source 7 whilst the patterns are illuminated, via mirror 12, by a light source 11. An image of the mask is formed by an objective lens 3A and projected to a semi-reflecting surface 5, via a mirror 13, a lens 14 and a mirror 15, whilst an image of the patterns is formed by an objective lens 3B and projected to the semi-reflector 5, via the mirrors 12, 16 and lens 17, and the two images are arranged to have been magnified to the same size when observed together in the eye-piece 6. The desired setting of the mask relative to the patterns can then be obtained with the adjusting device 8 and the wafer and mask are then fixed together. In a modification, Fig. 4 (not shown), observations are taken simultaneously of two distinct regions of the mask and the corresponding regions of the patterns by using a similar optical system with two pairs of objectives, one for each region, and two such combined images are seen in either a monocular or a binocular eye-piece, each combined image only filling half the field of view of each eye lens.
GB1234117D 1968-07-05 1969-06-25 Expired GB1234117A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4692868 1968-07-05

Publications (1)

Publication Number Publication Date
GB1234117A true GB1234117A (en) 1971-06-03

Family

ID=12760979

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1234117D Expired GB1234117A (en) 1968-07-05 1969-06-25

Country Status (3)

Country Link
DE (1) DE1934083A1 (en)
GB (1) GB1234117A (en)
NL (1) NL6910276A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2170651A (en) * 1985-01-17 1986-08-06 Rca Corp Method and apparatus for aligning a filter onto a color charge-coupled device imager

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5117297B1 (en) * 1971-03-11 1976-06-01

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2170651A (en) * 1985-01-17 1986-08-06 Rca Corp Method and apparatus for aligning a filter onto a color charge-coupled device imager

Also Published As

Publication number Publication date
NL6910276A (en) 1970-01-07
DE1934083B2 (en) 1970-12-23
DE1934083A1 (en) 1970-01-29

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Legal Events

Date Code Title Description
PS Patent sealed
PE20 Patent expired after termination of 20 years