GB1231789A - - Google Patents
Info
- Publication number
- GB1231789A GB1231789A GB1231789DA GB1231789A GB 1231789 A GB1231789 A GB 1231789A GB 1231789D A GB1231789D A GB 1231789DA GB 1231789 A GB1231789 A GB 1231789A
- Authority
- GB
- United Kingdom
- Prior art keywords
- diazomethanes
- phenyl
- reacting
- appropriate
- diazomethane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- YXHKONLOYHBTNS-UHFFFAOYSA-N Diazomethane Chemical class C=[N+]=[N-] YXHKONLOYHBTNS-UHFFFAOYSA-N 0.000 abstract 7
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 abstract 2
- -1 disulphomethylene compound Chemical class 0.000 abstract 2
- 125000001624 naphthyl group Chemical group 0.000 abstract 2
- 125000006501 nitrophenyl group Chemical group 0.000 abstract 2
- NDLIRBZKZSDGSO-UHFFFAOYSA-N tosyl azide Chemical compound CC1=CC=C(S(=O)(=O)[N-][N+]#N)C=C1 NDLIRBZKZSDGSO-UHFFFAOYSA-N 0.000 abstract 2
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 abstract 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 abstract 1
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical compound SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 abstract 1
- 125000001931 aliphatic group Chemical group 0.000 abstract 1
- 125000005036 alkoxyphenyl group Chemical group 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- JXLHNMVSKXFWAO-UHFFFAOYSA-N azane;7-fluoro-2,1,3-benzoxadiazole-4-sulfonic acid Chemical compound N.OS(=O)(=O)C1=CC=C(F)C2=NON=C12 JXLHNMVSKXFWAO-UHFFFAOYSA-N 0.000 abstract 1
- 125000004618 benzofuryl group Chemical group O1C(=CC2=C1C=CC=C2)* 0.000 abstract 1
- 125000000068 chlorophenyl group Chemical group 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 abstract 1
- FJBFPHVGVWTDIP-UHFFFAOYSA-N dibromomethane Chemical compound BrCBr FJBFPHVGVWTDIP-UHFFFAOYSA-N 0.000 abstract 1
- 125000005059 halophenyl group Chemical group 0.000 abstract 1
- 125000000623 heterocyclic group Chemical group 0.000 abstract 1
- 230000001590 oxidative effect Effects 0.000 abstract 1
- 229910052708 sodium Inorganic materials 0.000 abstract 1
- 239000011734 sodium Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/0163—Non ionic diazonium compounds, e.g. diazosulphonates; Precursors thereof, e.g. triazenes
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C317/00—Sulfones; Sulfoxides
- C07C317/26—Sulfones; Sulfoxides having sulfone or sulfoxide groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
- C07C317/28—Sulfones; Sulfoxides having sulfone or sulfoxide groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton with sulfone or sulfoxide groups bound to acyclic carbon atoms of the carbon skeleton
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB4057467 | 1967-09-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1231789A true GB1231789A (en, 2012) | 1971-05-12 |
Family
ID=10415578
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1231789D Expired GB1231789A (en, 2012) | 1967-09-05 | 1967-09-05 |
Country Status (3)
| Country | Link |
|---|---|
| BE (1) | BE720276A (en, 2012) |
| GB (1) | GB1231789A (en, 2012) |
| NL (1) | NL6812645A (en, 2012) |
Cited By (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0440375A1 (en) * | 1990-01-30 | 1991-08-07 | Wako Pure Chemical Industries Ltd | Diazodisulfones |
| EP0417556A3 (en) * | 1989-09-09 | 1991-10-16 | Hoechst Aktiengesellschaft | Positive-working radiation-sensitive mixture and recording material prepared therefrom |
| EP0417557A3 (en) * | 1989-09-09 | 1991-10-16 | Hoechst Aktiengesellschaft | Positive-working radiation-sensitive mixture and recording material prepared therefrom |
| EP0440374A3 (en) * | 1990-01-30 | 1992-04-29 | Wako Pure Chemical Industries Ltd | Chemical amplified resist material |
| JPH04210960A (ja) * | 1990-01-30 | 1992-08-03 | Wako Pure Chem Ind Ltd | 新規なジアゾジスルホン化合物 |
| US5216135A (en) * | 1990-01-30 | 1993-06-01 | Wako Pure Chemical Industries, Ltd. | Diazodisulfones |
| US5424166A (en) * | 1990-02-28 | 1995-06-13 | Hoechst Aktiengesellschaft | Negative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfrom |
| US5468589A (en) * | 1991-06-18 | 1995-11-21 | Wako Pure Chemical Industries, Ltd. | Resist material and pattern formation process |
| US5627006A (en) * | 1991-12-16 | 1997-05-06 | Wako Pure Chemical Industries, Ltd. | Resist material |
| US6060217A (en) | 1997-09-02 | 2000-05-09 | Kodak Polychrome Graphics Llc | Thermal lithographic printing plates |
| US6063544A (en) | 1997-03-21 | 2000-05-16 | Kodak Polychrome Graphics Llc | Positive-working printing plate and method of providing a positive image therefrom using laser imaging |
| US6090532A (en) | 1997-03-21 | 2000-07-18 | Kodak Polychrome Graphics Llc | Positive-working infrared radiation sensitive composition and printing plate and imaging method |
| US6117610A (en) | 1997-08-08 | 2000-09-12 | Kodak Polychrome Graphics Llc | Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use |
| US6153733A (en) * | 1998-05-18 | 2000-11-28 | Tokyo Ohka Kogyo Co., Ltd. | (Disulfonyl diazomethane compounds) |
| US6218083B1 (en) | 1997-07-05 | 2001-04-17 | Kodak Plychrome Graphics, Llc | Pattern-forming methods |
| US6280899B1 (en) * | 1996-04-23 | 2001-08-28 | Kodak Polychrome Graphics, Llc | Relation to lithographic printing forms |
| US6482577B1 (en) | 1996-09-30 | 2002-11-19 | Kodak Polychrome Graphics, Llc | Method of forming a positive image through infrared exposure utilizing diazonaphthoquinone imaging composition |
| JP4991074B2 (ja) * | 2000-02-27 | 2012-08-01 | ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． | 光反応性酸発生剤およびそれを含有してなるフォトレジスト |
-
1967
- 1967-09-05 GB GB1231789D patent/GB1231789A/en not_active Expired
-
1968
- 1968-09-02 BE BE720276D patent/BE720276A/xx unknown
- 1968-09-05 NL NL6812645A patent/NL6812645A/xx unknown
Cited By (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0417556A3 (en) * | 1989-09-09 | 1991-10-16 | Hoechst Aktiengesellschaft | Positive-working radiation-sensitive mixture and recording material prepared therefrom |
| EP0417557A3 (en) * | 1989-09-09 | 1991-10-16 | Hoechst Aktiengesellschaft | Positive-working radiation-sensitive mixture and recording material prepared therefrom |
| US5338641A (en) * | 1989-09-09 | 1994-08-16 | Hoechst Aktiengesellschaft | Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an α,α-bis(sulfonyl) diazo methane as an acid forming compound |
| US5340682A (en) * | 1989-09-09 | 1994-08-23 | Hoechst Aktiengesellschaft | Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an α-carbonyl-α-sulfonyl diazomethane, a water-insoluble binder and an acid cleavable compound |
| USRE40211E1 (en) * | 1990-01-30 | 2008-04-01 | Wako Pure Chemical Industries, Ltd. | Diazodisulfones |
| EP0440374A3 (en) * | 1990-01-30 | 1992-04-29 | Wako Pure Chemical Industries Ltd | Chemical amplified resist material |
| JPH04210960A (ja) * | 1990-01-30 | 1992-08-03 | Wako Pure Chem Ind Ltd | 新規なジアゾジスルホン化合物 |
| US5216135A (en) * | 1990-01-30 | 1993-06-01 | Wako Pure Chemical Industries, Ltd. | Diazodisulfones |
| EP0440375A1 (en) * | 1990-01-30 | 1991-08-07 | Wako Pure Chemical Industries Ltd | Diazodisulfones |
| US5424166A (en) * | 1990-02-28 | 1995-06-13 | Hoechst Aktiengesellschaft | Negative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfrom |
| US5468589A (en) * | 1991-06-18 | 1995-11-21 | Wako Pure Chemical Industries, Ltd. | Resist material and pattern formation process |
| US5670299A (en) * | 1991-06-18 | 1997-09-23 | Wako Pure Chemical Industries, Ltd. | Pattern formation process |
| US5627006A (en) * | 1991-12-16 | 1997-05-06 | Wako Pure Chemical Industries, Ltd. | Resist material |
| US6280899B1 (en) * | 1996-04-23 | 2001-08-28 | Kodak Polychrome Graphics, Llc | Relation to lithographic printing forms |
| US6485890B2 (en) | 1996-04-23 | 2002-11-26 | Kodak Polychrome Graphics, Llc | Lithographic printing forms |
| US6482577B1 (en) | 1996-09-30 | 2002-11-19 | Kodak Polychrome Graphics, Llc | Method of forming a positive image through infrared exposure utilizing diazonaphthoquinone imaging composition |
| US6063544A (en) | 1997-03-21 | 2000-05-16 | Kodak Polychrome Graphics Llc | Positive-working printing plate and method of providing a positive image therefrom using laser imaging |
| US6090532A (en) | 1997-03-21 | 2000-07-18 | Kodak Polychrome Graphics Llc | Positive-working infrared radiation sensitive composition and printing plate and imaging method |
| US6218083B1 (en) | 1997-07-05 | 2001-04-17 | Kodak Plychrome Graphics, Llc | Pattern-forming methods |
| US6117610A (en) | 1997-08-08 | 2000-09-12 | Kodak Polychrome Graphics Llc | Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use |
| US6060217A (en) | 1997-09-02 | 2000-05-09 | Kodak Polychrome Graphics Llc | Thermal lithographic printing plates |
| US6153733A (en) * | 1998-05-18 | 2000-11-28 | Tokyo Ohka Kogyo Co., Ltd. | (Disulfonyl diazomethane compounds) |
| JP4991074B2 (ja) * | 2000-02-27 | 2012-08-01 | ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． | 光反応性酸発生剤およびそれを含有してなるフォトレジスト |
Also Published As
| Publication number | Publication date |
|---|---|
| NL6812645A (en, 2012) | 1969-02-25 |
| BE720276A (en, 2012) | 1969-03-03 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PLNP | Patent lapsed through nonpayment of renewal fees |