GB1230469A - - Google Patents

Info

Publication number
GB1230469A
GB1230469A GB1230469DA GB1230469A GB 1230469 A GB1230469 A GB 1230469A GB 1230469D A GB1230469D A GB 1230469DA GB 1230469 A GB1230469 A GB 1230469A
Authority
GB
United Kingdom
Prior art keywords
carrier plate
scanning
spot
plate
photo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of GB1230469A publication Critical patent/GB1230469A/en
Expired legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/143—Electron beam

Abstract

1,230,469. Etching. SIEMENS A.G. 22 Oct., 1968 [23 Oct., 1967], No. 49981/68. Heading B6J. [Also in Division H1] In a method of manufacturing a "photovarnish mask" on a carrier plate, e.g. semiconductor body, a photo-varnish layer on the plate is selectively exposed to a scanning electron beam while the plate is moved in a direction perpendicular to the direction of scanning. The scanning movement of the beam and the exposure time is controlled in accordance with a pattern to be produced on the photo-varnish layer. After the exposure the photo-varnish layer is developed and the plate etched through the apertures in the layer. Finally the remaining portion of the layer is removed, e.g. by means of acetone. The beam may be scanned along a slot and the beam spot may be circular or rectangular. The width of the beam may be limited by the boundaries of the slot or the beam may be "spot-wobbled" in a direction perpendicular to the scanning direction in order to obtain a wider writing line. The carrier plate may be within the vacuum chamber or in a region of higher pressure or entirely outside the housing, the beam emerging through a Lenard window. The beam may be reduced in intensity or cut-off during return sweeps and the carrier plate may be moved continuously or in step-wise fashion. The carrier plate, e.g. of silicon or germanium, may be circular or preferably, in strip form. A slot need not be provided and the deflection of the beam is then synchronized with the movement of the carrier plate. The intensity of the beam may be gated on and off under control of signals derived from a digital data store. Also the length of each scan may be programme-controlled. The displacement of the carrier plate may be controlled with the aid of a laser-beam interference method or by utilizing X-rays or secondary electrons produced by the beam. The beam may be focused to a spot 0À2 Á in diameter and moved along a scanning line by a deflection of Œ1 to 2 mm. A transverse "spot wobble" of Œ 0À5 Á may be used. A plurality of electron beams may be used.
GB1230469D 1967-10-23 1968-10-22 Expired GB1230469A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DES0112516 1967-10-23

Publications (1)

Publication Number Publication Date
GB1230469A true GB1230469A (en) 1971-05-05

Family

ID=7531832

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1230469D Expired GB1230469A (en) 1967-10-23 1968-10-22

Country Status (8)

Country Link
US (1) US3607382A (en)
AT (1) AT301620B (en)
CH (1) CH485327A (en)
DE (1) DE1614635A1 (en)
FR (1) FR1589571A (en)
GB (1) GB1230469A (en)
NL (1) NL6813891A (en)
SE (1) SE331315B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2516390A1 (en) * 1974-04-18 1975-11-06 Western Electric Co METHOD AND DEVICE FOR MANUFACTURING MICROMINIATURIZED COMPONENTS
DE2556151A1 (en) * 1974-12-13 1976-06-16 Thomson Csf AUTOMATIC DEVICE FOR THE PROGRAMMED PRODUCTION OF DRAWINGS USING PARTICLE Bombardment

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1328803A (en) * 1969-12-17 1973-09-05 Mullard Ltd Methods of manufacturing semiconductor devices
US3779806A (en) * 1972-03-24 1973-12-18 Ibm Electron beam sensitive polymer t-butyl methacrylate resist
US3840749A (en) * 1973-06-19 1974-10-08 Westinghouse Electric Corp Method and apparatus for electron beam alignment with a semiconductor member
US4035522A (en) * 1974-07-19 1977-07-12 International Business Machines Corporation X-ray lithography mask
GB2066487B (en) * 1979-12-18 1983-11-23 Philips Electronic Associated Alignment of exposure masks
US4576884A (en) * 1984-06-14 1986-03-18 Microelectronics Center Of North Carolina Method and apparatus for exposing photoresist by using an electron beam and controlling its voltage and charge
AT391224B (en) * 1988-01-26 1990-09-10 Thallner Erich EXPOSURE DEVICE FOR LIGHT-SENSITIVE SUBSTRATES

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3330696A (en) * 1967-07-11 Method of fabricating thin film capacitors
US2705764A (en) * 1950-02-25 1955-04-05 Rca Corp Dual-area target electrodes and methods of making the same
US2968723A (en) * 1957-04-11 1961-01-17 Zeiss Carl Means for controlling crystal structure of materials
US3113896A (en) * 1961-01-31 1963-12-10 Space Technology Lab Inc Electron beam masking for etching electrical circuits
NL297262A (en) * 1962-09-04
NL294370A (en) * 1963-06-20
US3364087A (en) * 1964-04-27 1968-01-16 Varian Associates Method of using laser to coat or etch substrate
US3388000A (en) * 1964-09-18 1968-06-11 Texas Instruments Inc Method of forming a metal contact on a semiconductor device
US3326176A (en) * 1964-10-27 1967-06-20 Nat Res Corp Work-registration device including ionic beam probe

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2516390A1 (en) * 1974-04-18 1975-11-06 Western Electric Co METHOD AND DEVICE FOR MANUFACTURING MICROMINIATURIZED COMPONENTS
DE2556151A1 (en) * 1974-12-13 1976-06-16 Thomson Csf AUTOMATIC DEVICE FOR THE PROGRAMMED PRODUCTION OF DRAWINGS USING PARTICLE Bombardment

Also Published As

Publication number Publication date
CH485327A (en) 1970-01-31
DE1614635A1 (en) 1970-03-26
US3607382A (en) 1971-09-21
SE331315B (en) 1970-12-21
AT301620B (en) 1972-08-15
FR1589571A (en) 1970-03-31
NL6813891A (en) 1969-04-25

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PLNP Patent lapsed through nonpayment of renewal fees