GB1227602A - - Google Patents

Info

Publication number
GB1227602A
GB1227602A GB1227602DA GB1227602A GB 1227602 A GB1227602 A GB 1227602A GB 1227602D A GB1227602D A GB 1227602DA GB 1227602 A GB1227602 A GB 1227602A
Authority
GB
United Kingdom
Prior art keywords
diazide
resin
esters
specified
hydroxyl groups
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of GB1227602A publication Critical patent/GB1227602A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
GB1227602D 1967-11-24 1967-11-24 Expired GB1227602A (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB5353467 1967-11-24

Publications (1)

Publication Number Publication Date
GB1227602A true GB1227602A (it) 1971-04-07

Family

ID=10468145

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1227602D Expired GB1227602A (it) 1967-11-24 1967-11-24

Country Status (1)

Country Link
GB (1) GB1227602A (it)

Cited By (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4139384A (en) * 1974-02-21 1979-02-13 Fuji Photo Film Co., Ltd. Photosensitive polymeric o-quinone diazide containing lithographic printing plate and process of using the plate
DE3009873A1 (de) * 1979-03-16 1980-09-25 Daicel Chem Photoempfindliche masse
EP0021716A1 (en) * 1979-06-16 1981-01-07 Konica Corporation Condensation product and lithographic printing plates containing said product
US4358522A (en) * 1978-10-26 1982-11-09 Toray Industries Incorporated Dry planographic printing plate
US4377631A (en) * 1981-06-22 1983-03-22 Philip A. Hunt Chemical Corporation Positive novolak photoresist compositions
US4529682A (en) * 1981-06-22 1985-07-16 Philip A. Hunt Chemical Corporation Positive photoresist composition with cresol-formaldehyde novolak resins
US4587196A (en) * 1981-06-22 1986-05-06 Philip A. Hunt Chemical Corporation Positive photoresist with cresol-formaldehyde novolak resin and photosensitive naphthoquinone diazide
US4632891A (en) * 1984-10-04 1986-12-30 Ciba-Geigy Corporation Process for the production of images
US4632900A (en) * 1984-03-07 1986-12-30 Ciba-Geigy Corporation Process for the production of images after electrodeposition of positive photoresist on electrically conductive surface
US4681923A (en) * 1985-03-02 1987-07-21 Ciba-Geigy Corporation Modified quinone-diazide group-containing phenolic novolak resins
JPS63236030A (ja) * 1987-03-25 1988-09-30 Japan Synthetic Rubber Co Ltd 感放射線性樹脂組成物
US4839253A (en) * 1984-12-01 1989-06-13 Ciba-Geigy Corporation Photosensitive and electrodepositable phenolic resin with quinone diazide sulfonyloxy group
US4863829A (en) * 1983-03-04 1989-09-05 Sumitomo Chemical Company, Limited Positive type high gamma-value photoresist composition with novolak resin possessing
EP0451850A1 (en) * 1990-04-13 1991-10-16 Mitsubishi Chemical Corporation Positive photoresist composition
EP0565006A2 (en) 1992-04-06 1993-10-13 Fuji Photo Film Co., Ltd. Method for preparing PS plate
US5422221A (en) * 1993-02-17 1995-06-06 Shin-Etsu Chemical Co., Ltd. Resist compositions
EP0713143A2 (en) 1994-11-18 1996-05-22 Fuji Photo Film Co., Ltd. Photosensitive planographic printing plate
US5529880A (en) * 1995-03-29 1996-06-25 Shipley Company, L.L.C. Photoresist with a mixture of a photosensitive esterified resin and an o-naphthoquinone diazide compound
EP0780730A2 (en) 1995-12-22 1997-06-25 Fuji Photo Film Co., Ltd. Positive-type light-sensitive lithographic printing plate
US5723254A (en) * 1995-04-10 1998-03-03 Shipley Company, L.L.C. Photoresist with photoactive compound mixtures
US6790582B1 (en) 2003-04-01 2004-09-14 Clariant Finance Bvi Limited Photoresist compositions
US6905809B2 (en) 2003-04-01 2005-06-14 Clariant Finance (Bvi) Limited Photoresist compositions
EP1640173A1 (en) 2004-09-27 2006-03-29 Fuji Photo Film Co., Ltd. Planographic printing plate precursor
EP1690685A2 (en) 2005-02-09 2006-08-16 Fuji Photo Film Co., Ltd. Planographic printing plate precursor
EP1705004A1 (en) 2005-03-22 2006-09-27 Fuji Photo Film Co., Ltd. Planographic printing plate precursor
EP1925447A1 (en) 2002-09-17 2008-05-28 FUJIFILM Corporation Image forming material
EP2036721A1 (en) 2000-11-30 2009-03-18 FUJIFILM Corporation Planographic printing plate precursor
EP2042310A2 (en) 2007-09-27 2009-04-01 FUJIFILM Corporation Planographic printing plate precursor
EP2042340A2 (en) 2007-09-27 2009-04-01 Fujifilm Corporation Lithographic printing plate surface protective agent and platemaking method for lithographic printing plate
EP2042305A2 (en) 2007-09-28 2009-04-01 FUJIFILM Corporation Planographic printing plate precursor
EP2042306A2 (en) 2007-09-28 2009-04-01 FUJIFILM Corporation Planographic printing plate precursor and method of producing a copolymer used therein
EP2042308A2 (en) 2007-09-27 2009-04-01 FUJIFILM Corporation Planographic printing plate precursor
WO2009063824A1 (ja) 2007-11-14 2009-05-22 Fujifilm Corporation 塗布膜の乾燥方法及び平版印刷版原版の製造方法
EP2105690A2 (en) 2008-03-26 2009-09-30 Fujifilm Corporation Method and apparatus for drying
EP2106907A2 (en) 2008-04-02 2009-10-07 FUJIFILM Corporation Planographic printing plate precursor
EP2161129A2 (en) 2008-09-09 2010-03-10 Fujifilm Corporation Photosensitive lithographic printing plate precursor for infrared laser
EP2236293A2 (en) 2009-03-31 2010-10-06 FUJIFILM Corporation Lithographic printing plate precursor
WO2011037005A1 (ja) 2009-09-24 2011-03-31 富士フイルム株式会社 平版印刷版原版
EP2381312A2 (en) 2000-08-25 2011-10-26 Fujifilm Corporation Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate
EP2641738A2 (en) 2012-03-23 2013-09-25 Fujifilm Corporation Method of producing planographic printing plate and planographic printing plate
EP2644379A1 (en) 2012-03-30 2013-10-02 FUJIFILM Corporation Method of producing a planographic printing plate

Cited By (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4139384A (en) * 1974-02-21 1979-02-13 Fuji Photo Film Co., Ltd. Photosensitive polymeric o-quinone diazide containing lithographic printing plate and process of using the plate
US4358522A (en) * 1978-10-26 1982-11-09 Toray Industries Incorporated Dry planographic printing plate
DE3009873A1 (de) * 1979-03-16 1980-09-25 Daicel Chem Photoempfindliche masse
US4308368A (en) * 1979-03-16 1981-12-29 Daicel Chemical Industries Ltd. Photosensitive compositions with reaction product of novolak co-condensate with o-quinone diazide
EP0021716A1 (en) * 1979-06-16 1981-01-07 Konica Corporation Condensation product and lithographic printing plates containing said product
US4377631A (en) * 1981-06-22 1983-03-22 Philip A. Hunt Chemical Corporation Positive novolak photoresist compositions
US4529682A (en) * 1981-06-22 1985-07-16 Philip A. Hunt Chemical Corporation Positive photoresist composition with cresol-formaldehyde novolak resins
US4587196A (en) * 1981-06-22 1986-05-06 Philip A. Hunt Chemical Corporation Positive photoresist with cresol-formaldehyde novolak resin and photosensitive naphthoquinone diazide
US4863829A (en) * 1983-03-04 1989-09-05 Sumitomo Chemical Company, Limited Positive type high gamma-value photoresist composition with novolak resin possessing
US4632900A (en) * 1984-03-07 1986-12-30 Ciba-Geigy Corporation Process for the production of images after electrodeposition of positive photoresist on electrically conductive surface
US4632891A (en) * 1984-10-04 1986-12-30 Ciba-Geigy Corporation Process for the production of images
US4839253A (en) * 1984-12-01 1989-06-13 Ciba-Geigy Corporation Photosensitive and electrodepositable phenolic resin with quinone diazide sulfonyloxy group
US4681923A (en) * 1985-03-02 1987-07-21 Ciba-Geigy Corporation Modified quinone-diazide group-containing phenolic novolak resins
JPS63236030A (ja) * 1987-03-25 1988-09-30 Japan Synthetic Rubber Co Ltd 感放射線性樹脂組成物
EP0451850A1 (en) * 1990-04-13 1991-10-16 Mitsubishi Chemical Corporation Positive photoresist composition
US5225311A (en) * 1990-04-13 1993-07-06 Mitsubishi Petrochemical Co., Ltd. Positive photoresist composition
EP0565006A2 (en) 1992-04-06 1993-10-13 Fuji Photo Film Co., Ltd. Method for preparing PS plate
US5422221A (en) * 1993-02-17 1995-06-06 Shin-Etsu Chemical Co., Ltd. Resist compositions
EP0713143A2 (en) 1994-11-18 1996-05-22 Fuji Photo Film Co., Ltd. Photosensitive planographic printing plate
US5529880A (en) * 1995-03-29 1996-06-25 Shipley Company, L.L.C. Photoresist with a mixture of a photosensitive esterified resin and an o-naphthoquinone diazide compound
US5723254A (en) * 1995-04-10 1998-03-03 Shipley Company, L.L.C. Photoresist with photoactive compound mixtures
EP0780730A2 (en) 1995-12-22 1997-06-25 Fuji Photo Film Co., Ltd. Positive-type light-sensitive lithographic printing plate
EP2381312A2 (en) 2000-08-25 2011-10-26 Fujifilm Corporation Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate
EP2036721A1 (en) 2000-11-30 2009-03-18 FUJIFILM Corporation Planographic printing plate precursor
EP1925447A1 (en) 2002-09-17 2008-05-28 FUJIFILM Corporation Image forming material
US6905809B2 (en) 2003-04-01 2005-06-14 Clariant Finance (Bvi) Limited Photoresist compositions
US6790582B1 (en) 2003-04-01 2004-09-14 Clariant Finance Bvi Limited Photoresist compositions
EP1640173A1 (en) 2004-09-27 2006-03-29 Fuji Photo Film Co., Ltd. Planographic printing plate precursor
EP1690685A2 (en) 2005-02-09 2006-08-16 Fuji Photo Film Co., Ltd. Planographic printing plate precursor
EP1705004A1 (en) 2005-03-22 2006-09-27 Fuji Photo Film Co., Ltd. Planographic printing plate precursor
EP2042308A2 (en) 2007-09-27 2009-04-01 FUJIFILM Corporation Planographic printing plate precursor
EP2042310A2 (en) 2007-09-27 2009-04-01 FUJIFILM Corporation Planographic printing plate precursor
EP2042340A2 (en) 2007-09-27 2009-04-01 Fujifilm Corporation Lithographic printing plate surface protective agent and platemaking method for lithographic printing plate
EP2042306A2 (en) 2007-09-28 2009-04-01 FUJIFILM Corporation Planographic printing plate precursor and method of producing a copolymer used therein
EP2042305A2 (en) 2007-09-28 2009-04-01 FUJIFILM Corporation Planographic printing plate precursor
WO2009063824A1 (ja) 2007-11-14 2009-05-22 Fujifilm Corporation 塗布膜の乾燥方法及び平版印刷版原版の製造方法
EP2105690A2 (en) 2008-03-26 2009-09-30 Fujifilm Corporation Method and apparatus for drying
EP2106907A2 (en) 2008-04-02 2009-10-07 FUJIFILM Corporation Planographic printing plate precursor
EP2161129A2 (en) 2008-09-09 2010-03-10 Fujifilm Corporation Photosensitive lithographic printing plate precursor for infrared laser
EP2236293A2 (en) 2009-03-31 2010-10-06 FUJIFILM Corporation Lithographic printing plate precursor
WO2011037005A1 (ja) 2009-09-24 2011-03-31 富士フイルム株式会社 平版印刷版原版
EP2641738A2 (en) 2012-03-23 2013-09-25 Fujifilm Corporation Method of producing planographic printing plate and planographic printing plate
EP2644379A1 (en) 2012-03-30 2013-10-02 FUJIFILM Corporation Method of producing a planographic printing plate

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee