GB1227151A - - Google Patents

Info

Publication number
GB1227151A
GB1227151A GB1227151DA GB1227151A GB 1227151 A GB1227151 A GB 1227151A GB 1227151D A GB1227151D A GB 1227151DA GB 1227151 A GB1227151 A GB 1227151A
Authority
GB
United Kingdom
Prior art keywords
hologram
image
light
forming
array
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of GB1227151A publication Critical patent/GB1227151A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/32—Holograms used as optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00—Arrangements for image or video recognition or understanding
    • G06V10/88—Image or video recognition using optical means, e.g. reference filters, holographic masks, frequency domain filters or spatial domain filters
    • G06V10/89—Image or video recognition using optical means, e.g. reference filters, holographic masks, frequency domain filters or spatial domain filters using frequency domain filters, e.g. Fourier masks implemented on spatial light modulators
    • G06V10/893—Image or video recognition using optical means, e.g. reference filters, holographic masks, frequency domain filters or spatial domain filters using frequency domain filters, e.g. Fourier masks implemented on spatial light modulators characterised by the kind of filter
    • G06V10/895—Image or video recognition using optical means, e.g. reference filters, holographic masks, frequency domain filters or spatial domain filters using frequency domain filters, e.g. Fourier masks implemented on spatial light modulators characterised by the kind of filter the filter being related to phase processing, e.g. phase-only filters
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • H01L21/0275—Photolithographic processes using lasers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Multimedia (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Holo Graphy (AREA)
GB1227151D 1967-08-05 1968-08-02 Expired GB1227151A (US20100056889A1-20100304-C00004.png)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DEP0042772 1967-08-05
DE19671572805 DE1572805B1 (de) 1967-08-05 1967-08-05 Verfahren zur Bildvervielfachung

Publications (1)

Publication Number Publication Date
GB1227151A true GB1227151A (US20100056889A1-20100304-C00004.png) 1971-04-07

Family

ID=25753128

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1227151D Expired GB1227151A (US20100056889A1-20100304-C00004.png) 1967-08-05 1968-08-02

Country Status (7)

Country Link
AT (1) AT293058B (US20100056889A1-20100304-C00004.png)
BE (1) BE719091A (US20100056889A1-20100304-C00004.png)
CH (1) CH509609A (US20100056889A1-20100304-C00004.png)
DE (1) DE1572805B1 (US20100056889A1-20100304-C00004.png)
FR (1) FR1579159A (US20100056889A1-20100304-C00004.png)
GB (1) GB1227151A (US20100056889A1-20100304-C00004.png)
NL (1) NL6810976A (US20100056889A1-20100304-C00004.png)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5574492A (en) * 1992-03-27 1996-11-12 Canon Kabushiki Kaisha Imaging method and semiconductor device manufacturing method using the same
US5587834A (en) * 1992-01-31 1996-12-24 Canon Kabushiki Kaisha Semiconductor device manufacturing method and projection exposure apparatus using the same
US5608575A (en) * 1991-08-02 1997-03-04 Canon Kabushiki Kaisha Image projection method and semiconductor device manufacturing method using the same

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0266120A3 (en) * 1986-10-31 1990-07-11 AT&T Corp. Generating an array of light spots having uniform intensity

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5608575A (en) * 1991-08-02 1997-03-04 Canon Kabushiki Kaisha Image projection method and semiconductor device manufacturing method using the same
US5631773A (en) * 1991-08-02 1997-05-20 Canon Kabushiki Kaisha Image projection method and semiconductor device manufacturing method using the same
US5587834A (en) * 1992-01-31 1996-12-24 Canon Kabushiki Kaisha Semiconductor device manufacturing method and projection exposure apparatus using the same
US5574492A (en) * 1992-03-27 1996-11-12 Canon Kabushiki Kaisha Imaging method and semiconductor device manufacturing method using the same

Also Published As

Publication number Publication date
CH509609A (de) 1971-06-30
NL6810976A (US20100056889A1-20100304-C00004.png) 1969-02-03
FR1579159A (US20100056889A1-20100304-C00004.png) 1969-08-22
BE719091A (US20100056889A1-20100304-C00004.png) 1969-02-05
DE1572805B1 (de) 1970-08-27
AT293058B (de) 1971-09-27

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee