GB1225227A - - Google Patents
Info
- Publication number
- GB1225227A GB1225227A GB1225227DA GB1225227A GB 1225227 A GB1225227 A GB 1225227A GB 1225227D A GB1225227D A GB 1225227DA GB 1225227 A GB1225227 A GB 1225227A
- Authority
- GB
- United Kingdom
- Prior art keywords
- layer
- metal
- aperture
- portions
- lithographic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000002184 metal Substances 0.000 abstract 7
- 238000005530 etching Methods 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- 229910052581 Si3N4 Inorganic materials 0.000 abstract 1
- 229910004298 SiO 2 Inorganic materials 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 230000005669 field effect Effects 0.000 abstract 1
- 230000004048 modification Effects 0.000 abstract 1
- 238000012986 modification Methods 0.000 abstract 1
- 230000001590 oxidative effect Effects 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1519169 | 1969-03-24 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1225227A true GB1225227A (ja) | 1971-03-17 |
Family
ID=10054634
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1225227D Expired GB1225227A (ja) | 1969-03-24 | 1969-03-24 |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB1225227A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3346831A1 (de) * | 1983-01-10 | 1984-07-12 | Tokyo Shibaura Denki K.K., Kawasaki | Halbleiterspeicherelement |
-
1969
- 1969-03-24 GB GB1225227D patent/GB1225227A/en not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3346831A1 (de) * | 1983-01-10 | 1984-07-12 | Tokyo Shibaura Denki K.K., Kawasaki | Halbleiterspeicherelement |
US4665418A (en) * | 1983-01-10 | 1987-05-12 | Tokyo Shibaura Denki Kabushiki Kaisha | Semiconductor memory device |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ES354734A1 (es) | Un metodo de fabricacion de un dispositivo semiconductor. | |
GB1242896A (en) | Semiconductor device and method of fabrication | |
GB1428713A (en) | Method of manufactruing a semiconductor device | |
GB1332931A (en) | Methods of manufacturing a semiconductor device | |
GB1440643A (en) | Method of producint a mis structure | |
GB1520718A (en) | Field effect trasistors | |
GB1453270A (en) | Field effect devices | |
GB1494708A (en) | Manufacture of semiconductor devices | |
ES336908A1 (es) | Un dispositivo transistor de efecto de campo. | |
GB1225227A (ja) | ||
GB1308764A (en) | Production of semiconductor components | |
GB1260544A (en) | Method for manufacturing semiconductor device | |
GB1315573A (en) | Formation of openings in insulating layers in mos semiconductor devices | |
JPS5575238A (en) | Method of fabricating semiconductor device | |
GB1353185A (en) | Method of making a semiconductor device | |
JPS5568651A (en) | Manufacturing method of semiconductor device | |
JPS54143076A (en) | Semiconductor device and its manufacture | |
JPS6428962A (en) | Semiconductor device and manufacture thereof | |
EP0002107A3 (en) | Method of making a planar semiconductor device | |
EP0067738A3 (en) | Method of reducing encroachment in a semiconductor device | |
KR940010568B1 (ko) | 전계효과 트랜지스터 및 그 제조방법 | |
JPS5522878A (en) | Insulation gate type field effect semiconductor device | |
JPS5753958A (ja) | Handotaisochi | |
GB1363581A (en) | Complementary silicon-insulator-semiconductor field effect transis tor integrated circuit and a method for its manufacture | |
GB1328434A (en) | Method of producing a transistor with an insulated gate electrode |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PLNP | Patent lapsed through nonpayment of renewal fees |