GB1215353A - Improvements in or relating to the production of polymer resist images - Google Patents

Improvements in or relating to the production of polymer resist images

Info

Publication number
GB1215353A
GB1215353A GB4225/68A GB422568A GB1215353A GB 1215353 A GB1215353 A GB 1215353A GB 4225/68 A GB4225/68 A GB 4225/68A GB 422568 A GB422568 A GB 422568A GB 1215353 A GB1215353 A GB 1215353A
Authority
GB
United Kingdom
Prior art keywords
etched
resist
solvent
acid
methyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4225/68A
Other languages
English (en)
Inventor
Albert Simon Deutsch
William Groff Herrick
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GAF Corp
Original Assignee
GAF Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by GAF Corp filed Critical GAF Corp
Publication of GB1215353A publication Critical patent/GB1215353A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • ing And Chemical Polishing (AREA)
GB4225/68A 1967-02-07 1968-01-26 Improvements in or relating to the production of polymer resist images Expired GB1215353A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US61441267A 1967-02-07 1967-02-07

Publications (1)

Publication Number Publication Date
GB1215353A true GB1215353A (en) 1970-12-09

Family

ID=24461153

Family Applications (1)

Application Number Title Priority Date Filing Date
GB4225/68A Expired GB1215353A (en) 1967-02-07 1968-01-26 Improvements in or relating to the production of polymer resist images

Country Status (8)

Country Link
US (1) US3594243A (enExample)
JP (1) JPS4822568B1 (enExample)
CH (1) CH495569A (enExample)
DE (1) DE1622285A1 (enExample)
FR (1) FR1555957A (enExample)
GB (1) GB1215353A (enExample)
NL (1) NL6801727A (enExample)
SE (1) SE344246B (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3894163A (en) * 1971-03-08 1975-07-08 Western Electric Co Additives to negative photoresists which increase the sensitivity thereof
US3770433A (en) * 1972-03-22 1973-11-06 Bell Telephone Labor Inc High sensitivity negative electron resist
US3865597A (en) * 1973-03-26 1975-02-11 Western Electric Co Additives to negative photoresists which increase the sensitivity thereof
JPS51116893A (en) * 1975-04-08 1976-10-14 Ube Ind Ltd Photo-setting compositions
US4087569A (en) * 1976-12-20 1978-05-02 International Business Machines Corporation Prebaking treatment for resist mask composition and mask making process using same
DE3322011A1 (de) * 1983-06-18 1984-12-20 Continental Gummi-Werke Ag, 3000 Hannover Verfahren zur herstellung von hochdruckformen
WO1989003816A1 (en) * 1987-10-16 1989-05-05 Gaf Corporation Divinyl epoxy ethers
CN106624662A (zh) * 2017-01-25 2017-05-10 李振羽 复合底电磁锅的制作方法、专用装置和电磁锅

Also Published As

Publication number Publication date
FR1555957A (enExample) 1969-01-31
US3594243A (en) 1971-07-20
JPS4822568B1 (enExample) 1973-07-06
CH495569A (de) 1970-08-31
NL6801727A (enExample) 1968-08-08
SE344246B (enExample) 1972-04-04
DE1622285A1 (de) 1970-10-22

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