GB1176258A - Thin Film Silicon Layer and Microcircuit on an Insulating Substrate - Google Patents
Thin Film Silicon Layer and Microcircuit on an Insulating SubstrateInfo
- Publication number
- GB1176258A GB1176258A GB48291/67A GB4829167A GB1176258A GB 1176258 A GB1176258 A GB 1176258A GB 48291/67 A GB48291/67 A GB 48291/67A GB 4829167 A GB4829167 A GB 4829167A GB 1176258 A GB1176258 A GB 1176258A
- Authority
- GB
- United Kingdom
- Prior art keywords
- microcircuit
- thin film
- silicon layer
- insulating substrate
- film silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
- C01F7/00—Compounds of aluminium
- C01F7/02—Aluminium oxide; Aluminium hydroxide; Aluminates
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Abstract
1,176,258. Semi-conductor devices. RCA CORPORATION. 24 Oct., 1967 [9 Nov., 1966], No. 48291/67. Heading H1K. [Also in Divisions C1 and C7] An epitaxial layer of monocrystalline silicon is deposited from, e.g. a silane-hydrogen mixture on a spinel substrate having a MgO : A1 2 0 3 molar ratio of 1: 1 to 1 : 1À5. The silicon may be doped P- or N-type using diborane- or phosphine-hydrogen.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US59297866A | 1966-11-09 | 1966-11-09 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1176258A true GB1176258A (en) | 1970-01-01 |
Family
ID=24372851
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB48291/67A Expired GB1176258A (en) | 1966-11-09 | 1967-10-24 | Thin Film Silicon Layer and Microcircuit on an Insulating Substrate |
Country Status (4)
Country | Link |
---|---|
DE (1) | DE1646974B1 (en) |
ES (1) | ES346841A1 (en) |
FR (1) | FR1552021A (en) |
GB (1) | GB1176258A (en) |
-
1967
- 1967-10-24 GB GB48291/67A patent/GB1176258A/en not_active Expired
- 1967-10-30 FR FR1552021D patent/FR1552021A/fr not_active Expired
- 1967-11-02 DE DE19671646974 patent/DE1646974B1/en active Pending
- 1967-11-07 ES ES346841A patent/ES346841A1/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
DE1646974B1 (en) | 1971-05-27 |
FR1552021A (en) | 1969-01-03 |
ES346841A1 (en) | 1969-02-16 |
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