GB1172109A - Improvements relating to Semiconductor Devices - Google Patents

Improvements relating to Semiconductor Devices

Info

Publication number
GB1172109A
GB1172109A GB3241767A GB3241767A GB1172109A GB 1172109 A GB1172109 A GB 1172109A GB 3241767 A GB3241767 A GB 3241767A GB 3241767 A GB3241767 A GB 3241767A GB 1172109 A GB1172109 A GB 1172109A
Authority
GB
United Kingdom
Prior art keywords
semi
diffused
layer
conductor
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3241767A
Inventor
Phillip John Tizzard
Maurice James Turner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ferranti International PLC
Original Assignee
Ferranti PLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ferranti PLC filed Critical Ferranti PLC
Priority to GB3241767A priority Critical patent/GB1172109A/en
Priority to NL6809475A priority patent/NL6809475A/xx
Publication of GB1172109A publication Critical patent/GB1172109A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/72Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/73Bipolar junction transistors

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Bipolar Transistors (AREA)

Abstract

1,172,109. Semi-conductor devices. FERRANTI Ltd. 2 July, 1968 [14 July, 1967], No. 32417/67. Heading H1K. In a semi-conductor device comprising a substrate on which is a layer of semi-conductor material containing two diffused regions of opposite conductivity types and a low resistivity layer situated between the substrate and the diffused regions, the low resistivity layer is provided with an aperture opposite one of the regions. The aperture is said to reduce leakage current without significantly increasing the series resistance. As shown, Fig. 2, an NPN transistor is produced by diffusing arsenic into an annular area of a P-type silicon substrate 1 doped with boron and epitaxially depositing an N-type layer 3 doped with arsenic, the diffused arsenic partially diffusing out into the epitaxial layer and forming an N + type region 15<SP>1</SP>. The surface of the epitaxial layer is masked and boron is diffused-in to form the P-type base region 5, and phosphorus is diffused-in to form emitter region 9 and two collector contact regions 7. Aluminium is deposited to form emitter, base and collector contacts 14, 12, 10 which are alloyed to the semi-conductor. A varactor diode, Fig. 3 (not shown), is similarly produced. The substrate may be of glass or ceramic instead of semi-conductor material.
GB3241767A 1967-07-14 1967-07-14 Improvements relating to Semiconductor Devices Expired GB1172109A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
GB3241767A GB1172109A (en) 1967-07-14 1967-07-14 Improvements relating to Semiconductor Devices
NL6809475A NL6809475A (en) 1967-07-14 1968-07-04

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB3241767A GB1172109A (en) 1967-07-14 1967-07-14 Improvements relating to Semiconductor Devices

Publications (1)

Publication Number Publication Date
GB1172109A true GB1172109A (en) 1969-11-26

Family

ID=10338279

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3241767A Expired GB1172109A (en) 1967-07-14 1967-07-14 Improvements relating to Semiconductor Devices

Country Status (2)

Country Link
GB (1) GB1172109A (en)
NL (1) NL6809475A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2088077A1 (en) * 1970-05-14 1972-01-07 Radiotechnique Compelec
US4958209A (en) * 1988-05-10 1990-09-18 Stc Plc Varicap diode structure

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2088077A1 (en) * 1970-05-14 1972-01-07 Radiotechnique Compelec
US4958209A (en) * 1988-05-10 1990-09-18 Stc Plc Varicap diode structure

Also Published As

Publication number Publication date
NL6809475A (en) 1969-01-16

Similar Documents

Publication Publication Date Title
GB1314355A (en) Semiconductor device
GB1300174A (en) Improvements in transistors
GB1301345A (en)
GB883906A (en) Improvements in semi-conductive arrangements
ES360557A1 (en) Low bulk leakage current avalanche photodiode
GB923513A (en) Improvements in semiconductor devices
GB1263127A (en) Integrated circuits
GB1291383A (en) Improvements in and relating to semiconductor devices
GB1176599A (en) Improvements relating to semiconductor devices.
GB1073551A (en) Integrated circuit comprising a diode and method of making the same
GB1234985A (en) Improvements in and relating to methods of manufacturing semiconductor devices
GB1220023A (en) Integrated semiconductor circuit arrangement
GB949646A (en) Improvements in or relating to semiconductor devices
GB1303235A (en)
GB1154049A (en) Improvements in or relating to Avalanche Diodes.
GB1369357A (en) Semiconductive devices
GB1455260A (en) Semiconductor devices
GB1194752A (en) Transistor
GB1334745A (en) Semiconductor devices
GB1172109A (en) Improvements relating to Semiconductor Devices
GB1270498A (en) Semiconductor devices
GB1063258A (en) Improvements relating to transistors and their manufacture
GB1393536A (en) Electroluminescent semiconductor devices
GB1048424A (en) Improvements in or relating to semiconductor devices
GB1007936A (en) Improvements in or relating to semiconductive devices

Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees