GB1115790A - Printing plate compositions - Google Patents

Printing plate compositions

Info

Publication number
GB1115790A
GB1115790A GB5895667A GB5895667A GB1115790A GB 1115790 A GB1115790 A GB 1115790A GB 5895667 A GB5895667 A GB 5895667A GB 5895667 A GB5895667 A GB 5895667A GB 1115790 A GB1115790 A GB 1115790A
Authority
GB
United Kingdom
Prior art keywords
aromatic
compound
resorcinol
methyl
phenolic resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB5895667A
Inventor
Julius Leonard Silver
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Union Carbide Corp
Original Assignee
Union Carbide Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US357265A external-priority patent/US3231382A/en
Priority claimed from US406925A external-priority patent/US3350202A/en
Application filed by Union Carbide Corp filed Critical Union Carbide Corp
Publication of GB1115790A publication Critical patent/GB1115790A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G13/00Electrographic processes using a charge pattern
    • G03G13/26Electrographic processes using a charge pattern for the production of printing plates for non-xerographic printing processes
    • G03G13/28Planographic printing plates
    • G03G13/283Planographic printing plates obtained by a process including the transfer of a tonered image, i.e. indirect process
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/04Condensation polymers of aldehydes or ketones with phenols only
    • C08L61/06Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0381Macromolecular compounds which are rendered insoluble or differentially wettable using a combination of a phenolic resin and a polyoxyethylene resin
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/039Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G9/00Developers
    • G03G9/08Developers with toner particles
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G9/00Developers
    • G03G9/08Developers with toner particles
    • G03G9/09Colouring agents for toner particles
    • G03G9/0926Colouring agents for toner particles characterised by physical or chemical properties

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

Light-hardenable compositions comprise (a) a heat-fusible resole phenolic resin soluble in water, alkali or an organic solvent; (b) a homopolymer of ethylene oxide, or a copolymer thereof with other epoxides (e.g. propylene, butylene or styrene oxides); (c) a base; (d) a compound which yields free radicals on exposure to light; and, optionally (e) an aromatic compound containing 2-4 aromatic hydroxyl groups, 6-12 carbon atoms and at least 2 aromatic hydrogen atoms. The phenolic resin may be derived from a phenol, e.g. cresol, xylenol, ethylphenol, butylphenol, isopropylmethoxypheno, chlorophenol, resorcinol, hydroquinone naphthol and 2,2 - bis - (p - hydroxyphenyl) propane, and an aldehyde or aldehydeliberating compound, e.g. formaldehyde, acetaldehyde, acrolein, crotonaldehyde and furfural, a ketone or hexamethylene-tetramine. Specified free radical precursors (c) are halogenated paraffins or hydrogen halides, dichromates and diazo-compounds (e.g. o-quinone diazide, 4,41 - diazidostilbene - 2,21 - disulphonic acid disodium salt, rosin derivatives of diazonaphthol, azido-styryl ketones, 2-methyl-benzene diazonium fluoroborate, and 1,5-naphthalene tetrazonium fluoroborate). Specified aromatic compounds (d) are 1,2- and 1,4-dihydroxy benzenes and naphthalenes, and resorcinol and its 5-chloro, -methyl and -hydroxy derivatives. Reference has been directed by the Comptroller to Specification 983,366.
GB5895667A 1964-04-03 1965-04-16 Printing plate compositions Expired GB1115790A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US357265A US3231382A (en) 1964-04-03 1964-04-03 Printing plate compositions
US406925A US3350202A (en) 1964-10-27 1964-10-27 Method of xerographically photosensitizing planographic printing plates

Publications (1)

Publication Number Publication Date
GB1115790A true GB1115790A (en) 1968-05-29

Family

ID=26999584

Family Applications (1)

Application Number Title Priority Date Filing Date
GB5895667A Expired GB1115790A (en) 1964-04-03 1965-04-16 Printing plate compositions

Country Status (2)

Country Link
BE (1) BE671290A (en)
GB (1) GB1115790A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2094322A (en) * 1981-03-06 1982-09-15 Chloe Chemie Manufacture of rigid polyurethane foams from polyether- polyols and polyhydroxypolyphenylalkanes

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2094322A (en) * 1981-03-06 1982-09-15 Chloe Chemie Manufacture of rigid polyurethane foams from polyether- polyols and polyhydroxypolyphenylalkanes

Also Published As

Publication number Publication date
BE671290A (en) 1966-02-14

Similar Documents

Publication Publication Date Title
GB1115027A (en) Printing plate compositions
KR940005999A (en) Positive resist composition
GB1115790A (en) Printing plate compositions
DK155089A (en) ALDEHYD-NOVOLAK RESIN AND ITS USE, ISSA IN PHOTO RESISTANCE MATERIALS
TWI447782B (en) Pattern forming method and composition for the same
GB983366A (en) Photosensitive compositions and their use in photomechanical printing
GB758249A (en) Oxyalkylation of phenol aldehyde resins
AHN et al. Three Cases of Uterine Arteriovenous Malformation
KR20010099639A (en) Photosensitive resin composition and method for improving dry etching resistance of photosensitive resin composition
KANG et al. T-cell lymphoma of the prostate: remission with doxorubicin-based combination chemotherapy
GB703333A (en) Process for hardening phenol-aldehyde condensates
Jennings Isolation of adenovirus in Jamaica
GB584985A (en) Improvements in or relating to synthetic linear polyamide filaments
KR100568407B1 (en) Developer agent for positive-type photosensitive compound
HAH et al. Intravesical Instillation of Formalin Solution for Vesical Bleeding
JPS52112696A (en) Preparation of fibers of films of phenolic resins
YOON et al. Immediate Breast Reconstruction Following Mastectomy for the Treatment of Advanced Breast Cancer Patients
JPS52112695A (en) Preparation of fibers of films of phenolic resins
GB1096618A (en) Photosensitised printing plate compositions
KIM et al. A Case Report of Primary Ureteral Tumor combined with Giant Hydronephrosis
MOON et al. Effectiveness of Magnesium Oxide and Sodium Thiosulfate in Calcium Oxalate Crystallization
KIM et al. A Case of the Paragonimiasis involving Epididymis
GB520828A (en) Improvements in and relating to the production of aqueous compositions comprising thermo-setting resins and to the applications thereof
GB1079909A (en) Compositions containing crotonaldehyde resins
Levene The secondary cuboid in Jamaican feet