GB1036574A - New epoxide-containing metal chelates process for their preparation and their use - Google Patents
New epoxide-containing metal chelates process for their preparation and their useInfo
- Publication number
- GB1036574A GB1036574A GB2264763A GB2264763A GB1036574A GB 1036574 A GB1036574 A GB 1036574A GB 2264763 A GB2264763 A GB 2264763A GB 2264763 A GB2264763 A GB 2264763A GB 1036574 A GB1036574 A GB 1036574A
- Authority
- GB
- United Kingdom
- Prior art keywords
- radical
- compounds
- copper
- bis
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 150000002118 epoxides Chemical class 0.000 title abstract 7
- 229910052751 metal Inorganic materials 0.000 title abstract 6
- 239000002184 metal Substances 0.000 title abstract 6
- 238000002360 preparation method Methods 0.000 title abstract 2
- 229910052782 aluminium Inorganic materials 0.000 abstract 6
- 150000001875 compounds Chemical class 0.000 abstract 6
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 abstract 5
- 239000004411 aluminium Substances 0.000 abstract 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 5
- 150000002736 metal compounds Chemical class 0.000 abstract 5
- 229920000647 polyepoxide Polymers 0.000 abstract 5
- 229910052804 chromium Inorganic materials 0.000 abstract 4
- 239000011651 chromium Substances 0.000 abstract 4
- 229910052802 copper Inorganic materials 0.000 abstract 4
- 239000010949 copper Substances 0.000 abstract 4
- 239000003822 epoxy resin Substances 0.000 abstract 4
- 125000005287 vanadyl group Chemical group 0.000 abstract 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 abstract 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 abstract 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 3
- YHWCPXVTRSHPNY-UHFFFAOYSA-N butan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] YHWCPXVTRSHPNY-UHFFFAOYSA-N 0.000 abstract 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 abstract 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 abstract 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 abstract 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 abstract 3
- LMHHRCOWPQNFTF-UHFFFAOYSA-N s-propan-2-yl azepane-1-carbothioate Chemical compound CC(C)SC(=O)N1CCCCCC1 LMHHRCOWPQNFTF-UHFFFAOYSA-N 0.000 abstract 3
- CUGZWHZWSVUSBE-UHFFFAOYSA-N 2-(oxiran-2-ylmethoxy)ethanol Chemical compound OCCOCC1CO1 CUGZWHZWSVUSBE-UHFFFAOYSA-N 0.000 abstract 2
- KXWPFJPFMNXRBE-UHFFFAOYSA-N 4-(7-oxabicyclo[4.1.0]heptan-3-yl)but-3-ene-1,2,3-triol Chemical compound O1C2CC(C=C(O)C(O)CO)CCC21 KXWPFJPFMNXRBE-UHFFFAOYSA-N 0.000 abstract 2
- BMTAFVWTTFSTOG-UHFFFAOYSA-N Butylate Chemical compound CCSC(=O)N(CC(C)C)CC(C)C BMTAFVWTTFSTOG-UHFFFAOYSA-N 0.000 abstract 2
- 239000004593 Epoxy Substances 0.000 abstract 2
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L Magnesium chloride Chemical compound [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 abstract 2
- 229910052776 Thorium Inorganic materials 0.000 abstract 2
- 229910052770 Uranium Inorganic materials 0.000 abstract 2
- 150000001242 acetic acid derivatives Chemical class 0.000 abstract 2
- 125000001931 aliphatic group Chemical group 0.000 abstract 2
- 239000010426 asphalt Substances 0.000 abstract 2
- 229910052788 barium Inorganic materials 0.000 abstract 2
- 229910052790 beryllium Inorganic materials 0.000 abstract 2
- 229910052797 bismuth Inorganic materials 0.000 abstract 2
- 229910052791 calcium Inorganic materials 0.000 abstract 2
- 239000011575 calcium Substances 0.000 abstract 2
- 125000004432 carbon atom Chemical group C* 0.000 abstract 2
- 239000013522 chelant Substances 0.000 abstract 2
- 239000007795 chemical reaction product Substances 0.000 abstract 2
- 239000003795 chemical substances by application Substances 0.000 abstract 2
- FGBOCGXHXHNHEH-UHFFFAOYSA-N chromium;ethyl 3-oxobutanoate Chemical compound [Cr].CCOC(=O)CC(C)=O FGBOCGXHXHNHEH-UHFFFAOYSA-N 0.000 abstract 2
- QUQFTIVBFKLPCL-UHFFFAOYSA-L copper;2-amino-3-[(2-amino-2-carboxylatoethyl)disulfanyl]propanoate Chemical compound [Cu+2].[O-]C(=O)C(N)CSSCC(N)C([O-])=O QUQFTIVBFKLPCL-UHFFFAOYSA-L 0.000 abstract 2
- WFIPUECTLSDQKU-UHFFFAOYSA-N copper;ethyl 3-oxobutanoate Chemical compound [Cu].CCOC(=O)CC(C)=O WFIPUECTLSDQKU-UHFFFAOYSA-N 0.000 abstract 2
- 150000002148 esters Chemical class 0.000 abstract 2
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 abstract 2
- 229910052733 gallium Inorganic materials 0.000 abstract 2
- 229910052735 hafnium Inorganic materials 0.000 abstract 2
- 150000004820 halides Chemical class 0.000 abstract 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 abstract 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 2
- 229910052738 indium Inorganic materials 0.000 abstract 2
- 229910052742 iron Inorganic materials 0.000 abstract 2
- 229910052749 magnesium Inorganic materials 0.000 abstract 2
- 239000011777 magnesium Substances 0.000 abstract 2
- HZVOZRGWRWCICA-UHFFFAOYSA-N methanediyl Chemical compound [CH2] HZVOZRGWRWCICA-UHFFFAOYSA-N 0.000 abstract 2
- 239000000203 mixture Substances 0.000 abstract 2
- 229910052759 nickel Inorganic materials 0.000 abstract 2
- 229910052758 niobium Inorganic materials 0.000 abstract 2
- 239000010955 niobium Substances 0.000 abstract 2
- 150000002823 nitrates Chemical class 0.000 abstract 2
- 229910052762 osmium Inorganic materials 0.000 abstract 2
- 229910052763 palladium Inorganic materials 0.000 abstract 2
- 229910052697 platinum Inorganic materials 0.000 abstract 2
- 229920001223 polyethylene glycol Polymers 0.000 abstract 2
- 229920005989 resin Polymers 0.000 abstract 2
- 239000011347 resin Substances 0.000 abstract 2
- 229910052702 rhenium Inorganic materials 0.000 abstract 2
- 229910052703 rhodium Inorganic materials 0.000 abstract 2
- 239000010948 rhodium Substances 0.000 abstract 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 229910052712 strontium Inorganic materials 0.000 abstract 2
- 150000003467 sulfuric acid derivatives Chemical class 0.000 abstract 2
- 229910052715 tantalum Inorganic materials 0.000 abstract 2
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 abstract 2
- 229910052718 tin Inorganic materials 0.000 abstract 2
- 229910052721 tungsten Inorganic materials 0.000 abstract 2
- 125000005289 uranyl group Chemical group 0.000 abstract 2
- 229910052720 vanadium Inorganic materials 0.000 abstract 2
- 229910052727 yttrium Inorganic materials 0.000 abstract 2
- 229910052725 zinc Inorganic materials 0.000 abstract 2
- 239000011701 zinc Substances 0.000 abstract 2
- 229910052726 zirconium Inorganic materials 0.000 abstract 2
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 abstract 1
- 239000005995 Aluminium silicate Substances 0.000 abstract 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 abstract 1
- 229910052684 Cerium Inorganic materials 0.000 abstract 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 abstract 1
- CTKINSOISVBQLD-UHFFFAOYSA-N Glycidol Chemical compound OCC1CO1 CTKINSOISVBQLD-UHFFFAOYSA-N 0.000 abstract 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 abstract 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 abstract 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 abstract 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 abstract 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 abstract 1
- RMLVXHJWQKPONM-UHFFFAOYSA-N [Sc].[Ti] Chemical compound [Sc].[Ti] RMLVXHJWQKPONM-UHFFFAOYSA-N 0.000 abstract 1
- 239000000853 adhesive Substances 0.000 abstract 1
- 230000001070 adhesive effect Effects 0.000 abstract 1
- 235000012211 aluminium silicate Nutrition 0.000 abstract 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 abstract 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 abstract 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 abstract 1
- -1 cabalt Chemical compound 0.000 abstract 1
- 238000005266 casting Methods 0.000 abstract 1
- 239000001913 cellulose Substances 0.000 abstract 1
- 229920002678 cellulose Polymers 0.000 abstract 1
- 235000010980 cellulose Nutrition 0.000 abstract 1
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 abstract 1
- 239000008119 colloidal silica Substances 0.000 abstract 1
- 238000007598 dipping method Methods 0.000 abstract 1
- 239000010459 dolomite Substances 0.000 abstract 1
- 229910000514 dolomite Inorganic materials 0.000 abstract 1
- CCGKOQOJPYTBIH-UHFFFAOYSA-N ethenone Chemical compound C=C=O CCGKOQOJPYTBIH-UHFFFAOYSA-N 0.000 abstract 1
- 239000000945 filler Substances 0.000 abstract 1
- 238000009408 flooring Methods 0.000 abstract 1
- 239000003365 glass fiber Substances 0.000 abstract 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 abstract 1
- 230000007062 hydrolysis Effects 0.000 abstract 1
- 238000006460 hydrolysis reaction Methods 0.000 abstract 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 abstract 1
- 239000011810 insulating material Substances 0.000 abstract 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 abstract 1
- 150000002561 ketenes Chemical class 0.000 abstract 1
- 239000004922 lacquer Substances 0.000 abstract 1
- 238000010030 laminating Methods 0.000 abstract 1
- 229910052745 lead Inorganic materials 0.000 abstract 1
- 229910001629 magnesium chloride Inorganic materials 0.000 abstract 1
- DHRRIBDTHFBPNG-UHFFFAOYSA-L magnesium dichloride hexahydrate Chemical compound O.O.O.O.O.O.[Mg+2].[Cl-].[Cl-] DHRRIBDTHFBPNG-UHFFFAOYSA-L 0.000 abstract 1
- 229910052748 manganese Inorganic materials 0.000 abstract 1
- 239000011572 manganese Substances 0.000 abstract 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 abstract 1
- 235000012054 meals Nutrition 0.000 abstract 1
- 229910052753 mercury Inorganic materials 0.000 abstract 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 abstract 1
- 239000010445 mica Substances 0.000 abstract 1
- 229910052618 mica group Inorganic materials 0.000 abstract 1
- 229910052750 molybdenum Inorganic materials 0.000 abstract 1
- 239000011733 molybdenum Substances 0.000 abstract 1
- 238000000465 moulding Methods 0.000 abstract 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 abstract 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 abstract 1
- 239000003973 paint Substances 0.000 abstract 1
- 239000011148 porous material Substances 0.000 abstract 1
- 238000004382 potting Methods 0.000 abstract 1
- 239000000843 powder Substances 0.000 abstract 1
- 239000010453 quartz Substances 0.000 abstract 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 abstract 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 abstract 1
- 229910052701 rubidium Inorganic materials 0.000 abstract 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 abstract 1
- 229910052706 scandium Inorganic materials 0.000 abstract 1
- 239000002904 solvent Substances 0.000 abstract 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 abstract 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 abstract 1
- 229910052719 titanium Inorganic materials 0.000 abstract 1
- 239000010936 titanium Substances 0.000 abstract 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 abstract 1
- 239000010937 tungsten Substances 0.000 abstract 1
- DNYWZCXLKNTFFI-UHFFFAOYSA-N uranium Chemical compound [U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U] DNYWZCXLKNTFFI-UHFFFAOYSA-N 0.000 abstract 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 abstract 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D407/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group C07D405/00
- C07D407/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group C07D405/00 containing two hetero rings
- C07D407/10—Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group C07D405/00 containing two hetero rings linked by a carbon chain containing aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
- C07D303/02—Compounds containing oxirane rings
- C07D303/12—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms
- C07D303/16—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms by esterified hydroxyl radicals
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
- C07D303/02—Compounds containing oxirane rings
- C07D303/12—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms
- C07D303/18—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms by etherified hydroxyl radicals
- C07D303/20—Ethers with hydroxy compounds containing no oxirane rings
- C07D303/24—Ethers with hydroxy compounds containing no oxirane rings with polyhydroxy compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D407/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group C07D405/00
- C07D407/14—Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group C07D405/00 containing three or more hetero rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/14—Polycondensates modified by chemical after-treatment
- C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
- C08G59/30—Di-epoxy compounds containing atoms other than carbon, hydrogen, oxygen and nitrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
- C08G59/70—Chelates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G79/00—Macromolecular compounds obtained by reactions forming a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon with or without the latter elements in the main chain of the macromolecule
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- General Chemical & Material Sciences (AREA)
- Epoxy Resins (AREA)
Abstract
Metal chelates containing epoxide groups are prepared by reacting an acetoacetic ester of the formula <F\1> where R1 and R2 each represents a hydrogen atom or alkyl radical with 1 to 4 carbon atoms, Z is an aliphatic, cyclo-aliphatic or araliphatic radical containing at least one 1,2-epoxide group or a radical differing from such a radical as aforesaid by containing in place or a methylene radical, a divalent functional radical and n is an integer, with a metal compound capable of forming stable chelate compounds with b -dicarbonyl compounds. Metal compounds specified are the halides, sulphates, nitrates and acetates, which may be hydrated, of Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Zn, Cu, Al, Be, Ga, Mg, Ca, Sr, Ba, Y, Zr, Nb, Mo, Rb, Re, Pd, Hf, Ta, W, Rh, Os, In, Pt, Ce, Hg, Pb, Th, Sn, Bi and U; vanadyl, uranyl, copper-, nickel- and cobaltammines; aluminium ethylate, isopropylate and butylate; tetrabutyl titanate; tetraethylene glycol ortho-titanate; bis-(tributoxytitanoxy) ethane; chromium trisacetylacetonate; copper bisacetylacetonate; vanadyl bisacetylacetonate, copper ethyl acetoacetate and chromium ethyl acetoacetate. The acetoacetic esters containing epoxide groups are the reaction products of hydroxyepoxy compounds and diketeness. In the examples, the adducts of ketene with the indicated epoxides are reacted with the indicated metal compounds; (6) glycidol, tetrabutyl titanate; (7) ethylene glycol monoglycidyl ether, aluminium ethylate; (8) 3,4epoxyhexahydrobenzal glycerol, 1,2-bis-(tributoxytitanoxy) ethane; (9) 3,4 - epoxyhexahydrobenzal glycerol, MgCl2.6H2O; (10) 3,4epoxytetrahydrodicyclopentadienol - 8, 1,2-bis(tributyoxytitanoxy) ethane; (11) and (12) 3,4epoxytetrahydrodicyclopentadienol - 8, MgCl2. 6H2O; and (16) 3,4-epoxytetrahydicyclopentdienol-8, aluminium isopropylate. The preparation of the above mentioned ketene adducts, of ethylene glycol monoglycidyl ether, and of 1,2-bis-(tributoxytitanoxy) ethane are also described.ALSO:Metal chelates containing epoxide groups are prepared by reacting an acetoacetic ester of the formula <FORM:1036574/C3/1> where R1 and R2 each represents a hydrogen atom or an alkyl radical with 1 to 4 carbon atoms, Z stands for an aliphatic, cycloaliphatic or araliphatic radical containing at least one 1,2-epoxide group or a radical differing from such a radical as aforesaid by containing, in place of a methylene radical, a divalent functional radical and n is an integer, with a metal compound capable of forming stable chelate compounds with b -dicarbonyl compounds. Metal compounds specified are the halides, sulphates, nitrates and acetates which may be hydrated, of scandium titanium, vanadium, chromium, manganese, iron, cabalt, nickel, zinc, copper, aluminium, beryllium, gallium, magnesium, calcium, strontium, barium, yttrium, zirconium, niobium, molybdenum, rubidium, rhenium, palladium, hafnium, tantalum, tungsten, rhodium, osmium, indium, platinum, cerium, mercury, lead, thorium, tin, bismuth and uranium; vanadyl, uranyl, copper-, nickel- and cobalt-amines; aluminium ethylate, isopropylate and butylate; tetrabutyl titanate; tetraethylene glycol ortho-titanate; bis(tributoxy titanoxy)ethane; chromium trisacetylacetonate; copper bisacetylacetonate; vanadyl bis-acetylacetonate; copper ethyl acetoacetate and chromium ethyl acetoacetate. The acetoacetic esters containing epoxide groups are the reaction products of hydroxy-epoxy compounds and diketenes. The hydroxy-epoxy compounds may be polyepoxides or epoxy resins containing one or more hydroxyl groups which may have been introduced by the hydrolysis of epoxide groups; many such compounds are specified. The metal chelates formed may be cross-linked or cured by the conventional epoxy resin curing agents, many of which are specified, or they may be used as accelerators for the conventional epoxy resin curing agents in the curing of epoxy resins, many of which are specified. Curable mixtures containing the metal chelates may also contain asphalt, bitumen, glass fibres, mica, quartz meal, cellulose, kaolin, ground dolomite, colloidal silica, metal powder and solvents. They may be used as laminating resins, paints, lacquers, dipping and casting resins, moulding compositions, pore fillers, putties, floorings, potting and insulating materials for electrical components and as adhesives.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH688962 | 1962-06-07 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1036574A true GB1036574A (en) | 1966-07-20 |
Family
ID=4316652
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB2264763A Expired GB1036574A (en) | 1962-06-07 | 1963-06-06 | New epoxide-containing metal chelates process for their preparation and their use |
Country Status (6)
| Country | Link |
|---|---|
| AT (1) | AT242709B (en) |
| BE (1) | BE633330A (en) |
| DE (1) | DE1224743B (en) |
| ES (1) | ES288799A1 (en) |
| GB (1) | GB1036574A (en) |
| NL (1) | NL293719A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3874903A (en) * | 1972-01-31 | 1975-04-01 | Reichhold Albert Chemie Ag | Epoxy resins |
| US4016141A (en) * | 1971-07-30 | 1977-04-05 | Hoechst Aktiengesellschaft | Epoxy resin containing acetoacetic groups |
| EP0974610A3 (en) * | 1998-07-21 | 2000-02-23 | HILTI Aktiengesellschaft | Curable epoxy compound and its use |
-
0
- NL NL293719D patent/NL293719A/xx unknown
- BE BE633330D patent/BE633330A/xx unknown
-
1963
- 1963-06-06 ES ES288799A patent/ES288799A1/en not_active Expired
- 1963-06-06 AT AT456263A patent/AT242709B/en active
- 1963-06-06 GB GB2264763A patent/GB1036574A/en not_active Expired
- 1963-06-06 DE DEC30121A patent/DE1224743B/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4016141A (en) * | 1971-07-30 | 1977-04-05 | Hoechst Aktiengesellschaft | Epoxy resin containing acetoacetic groups |
| US3874903A (en) * | 1972-01-31 | 1975-04-01 | Reichhold Albert Chemie Ag | Epoxy resins |
| EP0974610A3 (en) * | 1998-07-21 | 2000-02-23 | HILTI Aktiengesellschaft | Curable epoxy compound and its use |
| US6214159B1 (en) | 1998-07-21 | 2001-04-10 | Hilti Aktiengesellschaft | Curable epoxide composition and its use |
| AU764179B2 (en) * | 1998-07-21 | 2003-08-14 | Hilti Aktiengesellschaft | Curable epoxide composition and its use |
Also Published As
| Publication number | Publication date |
|---|---|
| AT242709B (en) | 1965-10-11 |
| ES288799A1 (en) | 1963-11-16 |
| DE1224743B (en) | 1966-09-15 |
| NL293719A (en) | |
| BE633330A (en) |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| GB1509379A (en) | Coating powders | |
| US3547885A (en) | Process for curing polyepoxides with anhydrides and phosphonium halide catalysts therefor | |
| DE3586597T2 (en) | POLYETHER COMPOUNDS AND METHOD FOR THEIR PRODUCTION. | |
| DE4328466C1 (en) | Cast resin system containing siloxane | |
| EP0091883B1 (en) | Preextension catalysts for epoxy resins | |
| EP0459913B1 (en) | Composition comprising a novel alicyclic compound, a process for the preparation thereof, a curable composition, and a photo-polymerizable composition | |
| DE2505234A1 (en) | RESIN FOR THE INSULATION OF ELECTRICAL PARTS | |
| DE2247617A1 (en) | DIMENSIONS BASED ON EPOXY RESIN | |
| GB1516829A (en) | Polyester compositions | |
| DE3889998T2 (en) | Polyether compounds, epoxy resins and processes for their preparation. | |
| GB1346879A (en) | Polyepoxide-polysiloxane compounds processes for their manufacture and their use | |
| DE2619957C2 (en) | Epoxy resin | |
| DE2247512A1 (en) | MOLDING COMPOUNDS BASED ON EPOXY RESIN | |
| US2848426A (en) | Polyerpoxy polyethers, their preparation and polymers | |
| GB1036574A (en) | New epoxide-containing metal chelates process for their preparation and their use | |
| DE69104420T2 (en) | Lactone modified alicyclic composition and an epoxidized composition thereof. | |
| DE2811096B2 (en) | Epoxy resin compound | |
| US3562213A (en) | Latent cure acceleration of epoxy resins using imidazole salts of hydroxy polycarboxylic acids | |
| JPH0410471B2 (en) | ||
| US3138618A (en) | Glycidyl ethers of 3-cyclohexene-1, 1-dimethanols | |
| CA1182948A (en) | Curable epoxy resins | |
| ES248114A1 (en) | Hardenable compositions comprising epoxide compounds and tetrahydrofurane | |
| JPH0751617B2 (en) | Curable mixture | |
| JP3644761B2 (en) | Process for producing aliphatic polyglycidyl ether | |
| DE1131019B (en) | Process for the preparation of substantially linear 1,2-epoxy resins |