GB1013985A - Semiconductor devices and methods of making them - Google Patents

Semiconductor devices and methods of making them

Info

Publication number
GB1013985A
GB1013985A GB48391/62A GB4839162A GB1013985A GB 1013985 A GB1013985 A GB 1013985A GB 48391/62 A GB48391/62 A GB 48391/62A GB 4839162 A GB4839162 A GB 4839162A GB 1013985 A GB1013985 A GB 1013985A
Authority
GB
United Kingdom
Prior art keywords
layer
wafer
doped
semi
conductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB48391/62A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RCA Corp
Original Assignee
RCA Corp
Radio Corporation of America
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US167341A external-priority patent/US3200019A/en
Application filed by RCA Corp, Radio Corporation of America filed Critical RCA Corp
Publication of GB1013985A publication Critical patent/GB1013985A/en
Expired legal-status Critical Current

Links

Classifications

    • H10P95/00—
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00—Subject matter not provided for in other groups of this subclass
    • H10P14/6334—
    • H10P14/6686—
    • H10P14/69215—
    • H10P14/6923—
    • H10P32/14—
    • H10P32/141—
    • H10P32/171—
    • H10P32/174—

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Formation Of Insulating Films (AREA)
  • Weting (AREA)
GB48391/62A 1962-01-19 1962-12-21 Semiconductor devices and methods of making them Expired GB1013985A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US167341A US3200019A (en) 1962-01-19 1962-01-19 Method for making a semiconductor device
US420523A US3340445A (en) 1962-01-19 1964-12-23 Semiconductor devices having modifier-containing surface oxide layer

Publications (1)

Publication Number Publication Date
GB1013985A true GB1013985A (en) 1965-12-22

Family

ID=26863069

Family Applications (1)

Application Number Title Priority Date Filing Date
GB48391/62A Expired GB1013985A (en) 1962-01-19 1962-12-21 Semiconductor devices and methods of making them

Country Status (5)

Country Link
US (1) US3340445A (cg-RX-API-DMAC10.html)
BE (1) BE627302A (cg-RX-API-DMAC10.html)
DE (1) DE1444520B2 (cg-RX-API-DMAC10.html)
GB (1) GB1013985A (cg-RX-API-DMAC10.html)
NL (2) NL141709B (cg-RX-API-DMAC10.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010115730A1 (de) * 2009-03-27 2010-10-14 Bosch Solar Energy Ag Verfahren zur herstellung von solarzellen mit selektivem emitter

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1014830A (en) * 1972-11-15 1977-08-02 Klaus C. Wiemer Method of forming doped dielectric layers utilizing reactive plasma deposition
EP0030798B1 (en) * 1979-12-17 1983-12-28 Hughes Aircraft Company Low temperature process for depositing oxide layers by photochemical vapor deposition
DE102008019402A1 (de) 2008-04-14 2009-10-15 Gebr. Schmid Gmbh & Co. Verfahren zur selektiven Dotierung von Silizium sowie damit behandeltes Silizium-Substrat

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE534505A (cg-RX-API-DMAC10.html) * 1953-12-30
US3145328A (en) * 1957-04-29 1964-08-18 Raytheon Co Methods of preventing channel formation on semiconductive bodies
US2989424A (en) * 1958-03-31 1961-06-20 Westinghouse Electric Corp Method of providing an oxide protective coating for semiconductors
US2899344A (en) * 1958-04-30 1959-08-11 Rinse in
US3001896A (en) * 1958-12-24 1961-09-26 Ibm Diffusion control in germanium
US3040218A (en) * 1959-03-10 1962-06-19 Hoffman Electronics Corp Constant current devices
US3070466A (en) * 1959-04-30 1962-12-25 Ibm Diffusion in semiconductor material
US2981877A (en) * 1959-07-30 1961-04-25 Fairchild Semiconductor Semiconductor device-and-lead structure
US3085033A (en) * 1960-03-08 1963-04-09 Bell Telephone Labor Inc Fabrication of semiconductor devices

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010115730A1 (de) * 2009-03-27 2010-10-14 Bosch Solar Energy Ag Verfahren zur herstellung von solarzellen mit selektivem emitter

Also Published As

Publication number Publication date
DE1444520B2 (de) 1971-06-16
US3340445A (en) 1967-09-05
NL141709B (nl) 1974-03-15
DE1444520A1 (de) 1968-11-07
NL287925A (cg-RX-API-DMAC10.html)
BE627302A (cg-RX-API-DMAC10.html)

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