GB1011504A - Fabrication of semiconductor devices - Google Patents
Fabrication of semiconductor devicesInfo
- Publication number
- GB1011504A GB1011504A GB3499364A GB3499364A GB1011504A GB 1011504 A GB1011504 A GB 1011504A GB 3499364 A GB3499364 A GB 3499364A GB 3499364 A GB3499364 A GB 3499364A GB 1011504 A GB1011504 A GB 1011504A
- Authority
- GB
- United Kingdom
- Prior art keywords
- layer
- conductivity type
- region
- semi
- parts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 title abstract 4
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 239000012535 impurity Substances 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 2
- 238000006243 chemical reaction Methods 0.000 abstract 1
- 238000009792 diffusion process Methods 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/482—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body
- H01L23/485—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body consisting of layered constructions comprising conductive layers and insulating layers, e.g. planar contacts
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/291—Oxides or nitrides or carbides, e.g. ceramics, glass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/484—Connecting portions
- H01L2224/48463—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/491—Disposition
- H01L2224/4918—Disposition being disposed on at least two different sides of the body, e.g. dual array
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Bipolar Transistors (AREA)
Abstract
1,011,504. Semi-conductor devices. INTERNATIONAL BUSINESS MACHINES CORPORATION. Aug. 26, 1964 [Aug. 27, 1963], No. 34993/64. Addition to 1,003,131. Heading H1K. In a method of making a semi-conductor device from a body of semi-conductor material comprising first and second layers of opposite conductivity type, the first layer including a main region 104 bordered by an inversion region 106 formed by undesired conversion of some of the second layer 101 to the opposite conductivity type, a conductivity-determining impurity is diffused into selected parts of the inversion region so that these parts 105 are converted to the same conductivity type as the second layer 101 and a unitary mass of the same conductivity type is formed, including the converted parts 105 and at least some of the material from the original second layer 101. The same impurity may be simultaneously diffused into a sub-region 102 of the main region 104 of the first layer, forming a transistor body. Diffusion takes place through apertures in an oxide film 107 which is finally re-grown and covered by a glass layer 108.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US30482963A | 1963-08-27 | 1963-08-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1011504A true GB1011504A (en) | 1965-12-01 |
Family
ID=23178196
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB3499364A Expired GB1011504A (en) | 1963-08-27 | 1964-08-26 | Fabrication of semiconductor devices |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB1011504A (en) |
-
1964
- 1964-08-26 GB GB3499364A patent/GB1011504A/en not_active Expired
Similar Documents
Publication | Publication Date | Title |
---|---|---|
GB1375355A (en) | ||
GB1026019A (en) | Improvements in or relating to semiconductor devices | |
GB1313829A (en) | Transistors and aproduction thereof | |
GB1012124A (en) | Improvements in or relating to semiconductor devices | |
GB1003131A (en) | Semiconductor devices and their fabrication | |
GB1148417A (en) | Integrated circuit structures including controlled rectifiers or their structural equivalents and method of making the same | |
GB1243355A (en) | Improvements in and relating to semiconductor devices | |
GB1109371A (en) | Metal-oxide-semiconductor field effect transistor | |
ES329618A1 (en) | A method of manufacturing a transistor. (Machine-translation by Google Translate, not legally binding) | |
GB1194113A (en) | A Method of Manufacturing Transistors | |
GB1452882A (en) | Zener diode for integrated circuits | |
ES402164A1 (en) | Monolithic semiconductor device | |
ES486588A1 (en) | Double diffused transistor structure and method of making same. | |
GB1011504A (en) | Fabrication of semiconductor devices | |
GB1106787A (en) | Improvements in semiconductor devices | |
GB1098760A (en) | Method of making semiconductor device | |
GB1086856A (en) | Improvements in or relating to methods of manufacturing semi-conductor devices | |
GB1287247A (en) | Improved semiconductor device with high junction breakdown voltage and method of manufacture | |
GB1228238A (en) | ||
US3919006A (en) | Method of manufacturing a lateral transistor | |
GB1127161A (en) | Improvements in or relating to diffused base transistors | |
GB1074816A (en) | Improvements relating to semi-conductor devices | |
GB1260567A (en) | Improvements in or relating to semiconductor devices | |
GB1099049A (en) | A method of manufacturing transistors | |
GB1078273A (en) | Semiconductor device |