GB1011504A - Fabrication of semiconductor devices - Google Patents

Fabrication of semiconductor devices

Info

Publication number
GB1011504A
GB1011504A GB3499364A GB3499364A GB1011504A GB 1011504 A GB1011504 A GB 1011504A GB 3499364 A GB3499364 A GB 3499364A GB 3499364 A GB3499364 A GB 3499364A GB 1011504 A GB1011504 A GB 1011504A
Authority
GB
United Kingdom
Prior art keywords
layer
conductivity type
region
semi
parts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3499364A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1011504A publication Critical patent/GB1011504A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/482Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body
    • H01L23/485Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body consisting of layered constructions comprising conductive layers and insulating layers, e.g. planar contacts
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/291Oxides or nitrides or carbides, e.g. ceramics, glass
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/48463Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4918Disposition being disposed on at least two different sides of the body, e.g. dual array

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Bipolar Transistors (AREA)

Abstract

1,011,504. Semi-conductor devices. INTERNATIONAL BUSINESS MACHINES CORPORATION. Aug. 26, 1964 [Aug. 27, 1963], No. 34993/64. Addition to 1,003,131. Heading H1K. In a method of making a semi-conductor device from a body of semi-conductor material comprising first and second layers of opposite conductivity type, the first layer including a main region 104 bordered by an inversion region 106 formed by undesired conversion of some of the second layer 101 to the opposite conductivity type, a conductivity-determining impurity is diffused into selected parts of the inversion region so that these parts 105 are converted to the same conductivity type as the second layer 101 and a unitary mass of the same conductivity type is formed, including the converted parts 105 and at least some of the material from the original second layer 101. The same impurity may be simultaneously diffused into a sub-region 102 of the main region 104 of the first layer, forming a transistor body. Diffusion takes place through apertures in an oxide film 107 which is finally re-grown and covered by a glass layer 108.
GB3499364A 1963-08-27 1964-08-26 Fabrication of semiconductor devices Expired GB1011504A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US30482963A 1963-08-27 1963-08-27

Publications (1)

Publication Number Publication Date
GB1011504A true GB1011504A (en) 1965-12-01

Family

ID=23178196

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3499364A Expired GB1011504A (en) 1963-08-27 1964-08-26 Fabrication of semiconductor devices

Country Status (1)

Country Link
GB (1) GB1011504A (en)

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