GB0723380D0 - Particle beam apparatus - Google Patents

Particle beam apparatus

Info

Publication number
GB0723380D0
GB0723380D0 GBGB0723380.2A GB0723380A GB0723380D0 GB 0723380 D0 GB0723380 D0 GB 0723380D0 GB 0723380 A GB0723380 A GB 0723380A GB 0723380 D0 GB0723380 D0 GB 0723380D0
Authority
GB
United Kingdom
Prior art keywords
particle beam
beam apparatus
particle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GBGB0723380.2A
Other versions
GB2455121A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sheffield Hallam University
Original Assignee
Sheffield Hallam University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sheffield Hallam University filed Critical Sheffield Hallam University
Priority to GB0723380A priority Critical patent/GB2455121A/en
Publication of GB0723380D0 publication Critical patent/GB0723380D0/en
Priority to PCT/GB2008/051101 priority patent/WO2009068904A1/en
Publication of GB2455121A publication Critical patent/GB2455121A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/301—Arrangements enabling beams to pass between regions of different pressure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching for microworking, e. g. etching of gratings or trimming of electrical components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/006—Details of gas supplies, e.g. in an ion source, to a beam line, to a specimen or to a workpiece
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/022—Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/182—Obtaining or maintaining desired pressure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
    • H01J2237/2608—Details operating at elevated pressures, e.g. atmosphere with environmental specimen chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31749—Focused ion beam

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
GB0723380A 2007-11-29 2007-11-29 Particle beam apparatus with means for reducing contamination in the particle beam column Withdrawn GB2455121A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
GB0723380A GB2455121A (en) 2007-11-29 2007-11-29 Particle beam apparatus with means for reducing contamination in the particle beam column
PCT/GB2008/051101 WO2009068904A1 (en) 2007-11-29 2008-11-24 Particle beam apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB0723380A GB2455121A (en) 2007-11-29 2007-11-29 Particle beam apparatus with means for reducing contamination in the particle beam column

Publications (2)

Publication Number Publication Date
GB0723380D0 true GB0723380D0 (en) 2008-01-09
GB2455121A GB2455121A (en) 2009-06-03

Family

ID=38962321

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0723380A Withdrawn GB2455121A (en) 2007-11-29 2007-11-29 Particle beam apparatus with means for reducing contamination in the particle beam column

Country Status (2)

Country Link
GB (1) GB2455121A (en)
WO (1) WO2009068904A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010153278A (en) * 2008-12-26 2010-07-08 Hitachi High-Technologies Corp Charged particle beam processing device
DE102010040324B3 (en) * 2010-09-07 2012-05-10 Asphericon Gmbh Ion beam device for processing a substrate
GB2484517B (en) 2010-10-14 2016-03-30 Carl Zeiss Nts Ltd Improvements in and relating to charged particle beam devices
DE102011111686B4 (en) * 2011-08-26 2017-04-13 Asphericon Gmbh Method for processing a substrate by means of an ion beam and ion beam device for processing a substrate
CN117898027A (en) * 2022-03-18 2024-04-16 株式会社爱发科 Vacuum processing apparatus, fine particle removing mechanism, and fine particle removing method

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE638949A (en) * 1962-11-05
US3393289A (en) * 1964-11-12 1968-07-16 United Aircraft Corp Self-cleaning electron beam exit orifice
DE3332248A1 (en) * 1983-09-07 1985-03-21 Lutz-Achim Dipl.-Ing. 7000 Stuttgart Gäng System for discharging charges on test specimens in scanning electron microscope investigations
US4823006A (en) * 1987-05-21 1989-04-18 Electroscan Corporation Integrated electron optical/differential pumping/imaging signal detection system for an environmental scanning electron microscope
US5838006A (en) * 1996-10-17 1998-11-17 Etec Systems, Inc. Conical baffle for reducing charging drift in a particle beam system
TW486716B (en) * 2000-05-12 2002-05-11 Ushio Electric Inc Electron beam processing device
JP2007088386A (en) * 2005-09-26 2007-04-05 Advantest Corp Electron beam exposure apparatus and method of cleaning it
TW200722732A (en) * 2005-12-09 2007-06-16 Li Bing Huan Semi-enclosed observation space for electron microscopy
US7692163B2 (en) * 2006-01-31 2010-04-06 Kabushiki Kaisha Toshiba Charged particle beam apparatus, defect correcting method, etching method, deposition method, and charge preventing method

Also Published As

Publication number Publication date
GB2455121A (en) 2009-06-03
WO2009068904A1 (en) 2009-06-04

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)