GB0613788D0 - Gas supply apparatus - Google Patents

Gas supply apparatus

Info

Publication number
GB0613788D0
GB0613788D0 GBGB0613788.9A GB0613788A GB0613788D0 GB 0613788 D0 GB0613788 D0 GB 0613788D0 GB 0613788 A GB0613788 A GB 0613788A GB 0613788 D0 GB0613788 D0 GB 0613788D0
Authority
GB
United Kingdom
Prior art keywords
gas supply
supply apparatus
gas
supply
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GBGB0613788.9A
Other versions
GB2439948A (en
GB2439948B (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Edwards Ltd
Original Assignee
BOC Group Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BOC Group Ltd filed Critical BOC Group Ltd
Priority to GB0613788A priority Critical patent/GB2439948B/en
Publication of GB0613788D0 publication Critical patent/GB0613788D0/en
Publication of GB2439948A publication Critical patent/GB2439948A/en
Application granted granted Critical
Publication of GB2439948B publication Critical patent/GB2439948B/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4408—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber by purging residual gases from the reaction chamber or gas lines

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Magnetically Actuated Valves (AREA)
GB0613788A 2006-07-12 2006-07-12 Gas supply apparatus Expired - Fee Related GB2439948B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB0613788A GB2439948B (en) 2006-07-12 2006-07-12 Gas supply apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB0613788A GB2439948B (en) 2006-07-12 2006-07-12 Gas supply apparatus

Publications (3)

Publication Number Publication Date
GB0613788D0 true GB0613788D0 (en) 2006-08-23
GB2439948A GB2439948A (en) 2008-01-16
GB2439948B GB2439948B (en) 2010-11-24

Family

ID=36955467

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0613788A Expired - Fee Related GB2439948B (en) 2006-07-12 2006-07-12 Gas supply apparatus

Country Status (1)

Country Link
GB (1) GB2439948B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9600001B2 (en) 2012-01-13 2017-03-21 Perkinelmer Health Sciences, Inc. Devices, systems and methods for purging and loading sorbent tubes
GB2500610A (en) * 2012-03-26 2013-10-02 Edwards Ltd Apparatus to supply purge gas to a multistage vacuum pump
GB2513300B (en) 2013-04-04 2017-10-11 Edwards Ltd Vacuum pumping and abatement system
GB2535703B (en) * 2015-02-23 2019-09-18 Edwards Ltd Gas supply apparatus
FR3086705B1 (en) * 2018-09-27 2020-10-23 Pfeiffer Vacuum DRY TYPE PRIMARY VACUUM PUMP AND PROCESS FOR CONTROL OF THE INJECTION OF A PURGE GAS

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04161241A (en) * 1990-10-26 1992-06-04 Nec Kyushu Ltd Gas supply device
US5908504A (en) * 1995-09-20 1999-06-01 Memc Electronic Materials, Inc. Method for tuning barrel reactor purge system

Also Published As

Publication number Publication date
GB2439948A (en) 2008-01-16
GB2439948B (en) 2010-11-24

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Legal Events

Date Code Title Description
COOA Change in applicant's name or ownership of the application

Owner name: EDWARDS LIMITED

Free format text: FORMER APPLICANT(S): BOC GROUP, THE PLC

PCNP Patent ceased through non-payment of renewal fee

Effective date: 20110712