GB0612461D0 - Catadioptric optical system with diffractive optical element - Google Patents

Catadioptric optical system with diffractive optical element

Info

Publication number
GB0612461D0
GB0612461D0 GB0612461A GB0612461A GB0612461D0 GB 0612461 D0 GB0612461 D0 GB 0612461D0 GB 0612461 A GB0612461 A GB 0612461A GB 0612461 A GB0612461 A GB 0612461A GB 0612461 D0 GB0612461 D0 GB 0612461D0
Authority
GB
United Kingdom
Prior art keywords
catadioptric
optical system
optical element
diffractive
diffractive optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB0612461A
Other versions
GB2428491A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of GB0612461D0 publication Critical patent/GB0612461D0/en
Publication of GB2428491A publication Critical patent/GB2428491A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
    • G02B27/0043—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements in projection exposure systems, e.g. microlithographic systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4205—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant
    • G02B27/4211—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant correcting chromatic aberrations
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4205—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant
    • G02B27/4222—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant in projection exposure systems, e.g. photolithographic systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
GB0612461A 2005-07-18 2006-06-23 Catadioptric Optical System with Diffractive Optical Element Withdrawn GB2428491A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US69984305P 2005-07-18 2005-07-18

Publications (2)

Publication Number Publication Date
GB0612461D0 true GB0612461D0 (en) 2006-08-02
GB2428491A GB2428491A (en) 2007-01-31

Family

ID=36803764

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0612461A Withdrawn GB2428491A (en) 2005-07-18 2006-06-23 Catadioptric Optical System with Diffractive Optical Element

Country Status (1)

Country Link
GB (1) GB2428491A (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
EP1751601B1 (en) 2004-05-17 2007-12-05 Carl Zeiss SMT AG Catadioptric projection objective with intermediate images
DE102006022958A1 (en) 2006-05-11 2007-11-22 Carl Zeiss Smt Ag Projection exposure apparatus, projection exposure method and use of a projection lens
DE102007042672A1 (en) 2007-09-10 2009-03-26 Carl Zeiss Smt Ag Diffractive optical element for operating wavelength for microelectronics, comprises binary structuring in subarea, and binary structuring comprises different strip densities at two positions of former subarea smaller than certain amount
US8345350B2 (en) 2008-06-20 2013-01-01 Carl Zeiss Smt Gmbh Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same
DE102017208340A1 (en) 2017-05-17 2018-11-22 Carl Zeiss Smt Gmbh Projection exposure method and projection objective with adjustment of the pupil transmission
DE102019131327A1 (en) * 2019-11-20 2021-05-20 Carl Zeiss Smt Gmbh Device and method for measuring substrates for semiconductor lithography

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06331941A (en) * 1993-05-19 1994-12-02 Olympus Optical Co Ltd Projection lens system
WO1999052004A1 (en) * 1998-04-07 1999-10-14 Nikon Corporation Projection exposure apparatus and method, and reflection refraction optical system
JP4333078B2 (en) * 2002-04-26 2009-09-16 株式会社ニコン Projection optical system, exposure apparatus including the projection optical system, exposure method using the projection optical system, and device manufacturing method

Also Published As

Publication number Publication date
GB2428491A (en) 2007-01-31

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)