GB0207456D0 - Machine or machine component with a hollow space,and a cleaning method for same - Google Patents
Machine or machine component with a hollow space,and a cleaning method for sameInfo
- Publication number
- GB0207456D0 GB0207456D0 GBGB0207456.5A GB0207456A GB0207456D0 GB 0207456 D0 GB0207456 D0 GB 0207456D0 GB 0207456 A GB0207456 A GB 0207456A GB 0207456 D0 GB0207456 D0 GB 0207456D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- machine
- same
- cleaning method
- hollow space
- component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4405—Cleaning of reactor or parts inside the reactor by using reactive gases
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
- F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
- F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D19/00—Axial-flow pumps
- F04D19/02—Multi-stage pumps
- F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D29/00—Details, component parts, or accessories
- F04D29/70—Suction grids; Strainers; Dust separation; Cleaning
- F04D29/701—Suction grids; Strainers; Dust separation; Cleaning especially adapted for elastic fluid pumps
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
- F05D—INDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
- F05D2260/00—Function
- F05D2260/60—Fluid transfer
- F05D2260/607—Preventing clogging or obstruction of flow paths by dirt, dust, or foreign particles
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- General Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Cleaning In General (AREA)
- Injection Moulding Of Plastics Or The Like (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10115394A DE10115394B4 (en) | 2001-03-29 | 2001-03-29 | Machine component and / or process plant with a cavity and cleaning method therefor |
Publications (4)
Publication Number | Publication Date |
---|---|
GB0207456D0 true GB0207456D0 (en) | 2002-05-08 |
GB2378037A GB2378037A (en) | 2003-01-29 |
GB2378037A9 GB2378037A9 (en) | 2005-02-07 |
GB2378037B GB2378037B (en) | 2005-06-29 |
Family
ID=7679456
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB0207456A Expired - Fee Related GB2378037B (en) | 2001-03-29 | 2002-03-28 | Machine or machine component with a hollow space,and a cleaning method for same |
Country Status (3)
Country | Link |
---|---|
DE (1) | DE10115394B4 (en) |
FR (1) | FR2822732B1 (en) |
GB (1) | GB2378037B (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102007034751B3 (en) * | 2007-07-25 | 2008-10-02 | Plasma Technology Gmbh | Plastic component plasma treatment in vacuum chamber involves holding back organic gas release resulted during plasma treatment as condensate by condensate trap, which is arranged in suction line |
DE102011003781B3 (en) * | 2011-02-08 | 2012-05-24 | Meiko Maschinenbau Gmbh & Co. Kg | Food waste disposal device used in kitchen of e.g. cafeteria, has plasma sources to clean portion of device casing, ignite plasma in gas and generate reactive gas so that reactive gas is brought into contact with portion of device casing |
JP7361640B2 (en) * | 2020-03-09 | 2023-10-16 | エドワーズ株式会社 | Vacuum pump |
CN114733857B (en) * | 2021-01-07 | 2023-09-15 | 中国科学院微电子研究所 | Vacuum pipeline cleaning system and method |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2965333D1 (en) * | 1978-12-29 | 1983-06-09 | Ncr Co | Process and apparatus for cleaning wall deposits from a film deposition furnace tube |
US4438188A (en) * | 1981-06-15 | 1984-03-20 | Fuji Electric Company, Ltd. | Method for producing photosensitive film for electrophotography |
US4657616A (en) * | 1985-05-17 | 1987-04-14 | Benzing Technologies, Inc. | In-situ CVD chamber cleaner |
US4902531A (en) * | 1986-10-30 | 1990-02-20 | Nihon Shinku Gijutsu Kabushiki Kaisha | Vacuum processing method and apparatus |
US4960488A (en) * | 1986-12-19 | 1990-10-02 | Applied Materials, Inc. | Reactor chamber self-cleaning process |
DE3725358A1 (en) * | 1987-07-30 | 1989-02-09 | Telog Systems Gmbh | DEVICE AND METHOD FOR SURFACE TREATMENT OF MATERIALS |
US5084125A (en) * | 1989-09-12 | 1992-01-28 | Matsushita Electric Industrial Co., Ltd. | Apparatus and method for producing semiconductor substrate |
DE69128050D1 (en) * | 1990-06-29 | 1997-12-04 | Applied Materials Inc | Two-stage self-cleaning process of a reaction chamber |
US5273558A (en) * | 1991-08-30 | 1993-12-28 | Minnesota Mining And Manufacturing Company | Abrasive composition and articles incorporating same |
US5273588A (en) * | 1992-06-15 | 1993-12-28 | Materials Research Corporation | Semiconductor wafer processing CVD reactor apparatus comprising contoured electrode gas directing means |
JPH06216175A (en) * | 1993-01-15 | 1994-08-05 | Toshiba Corp | Semiconductor manufacturing apparatus and manufacture of semiconductor device |
US6047713A (en) * | 1994-02-03 | 2000-04-11 | Applied Materials, Inc. | Method for cleaning a throttle valve |
JPH09123206A (en) * | 1995-10-30 | 1997-05-13 | Towa Kk | Resin sealing molding machine electronic component |
DE19609804C1 (en) * | 1996-03-13 | 1997-07-31 | Bosch Gmbh Robert | Device, its use and its operation for vacuum coating of bulk goods |
-
2001
- 2001-03-29 DE DE10115394A patent/DE10115394B4/en not_active Expired - Lifetime
-
2002
- 2002-03-28 GB GB0207456A patent/GB2378037B/en not_active Expired - Fee Related
- 2002-03-29 FR FR0203994A patent/FR2822732B1/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
FR2822732A1 (en) | 2002-10-04 |
DE10115394A1 (en) | 2002-10-10 |
GB2378037A (en) | 2003-01-29 |
GB2378037B (en) | 2005-06-29 |
GB2378037A9 (en) | 2005-02-07 |
DE10115394B4 (en) | 2005-03-24 |
FR2822732B1 (en) | 2006-05-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 20200328 |