GB0007494D0 - Low friction coatings - Google Patents

Low friction coatings

Info

Publication number
GB0007494D0
GB0007494D0 GB0007494A GB0007494A GB0007494D0 GB 0007494 D0 GB0007494 D0 GB 0007494D0 GB 0007494 A GB0007494 A GB 0007494A GB 0007494 A GB0007494 A GB 0007494A GB 0007494 D0 GB0007494 D0 GB 0007494D0
Authority
GB
United Kingdom
Prior art keywords
low friction
friction coatings
coatings
low
friction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB0007494A
Other versions
GB2360790A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Amaratunga Gehan A J
Original Assignee
Amaratunga Gehan A J
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Amaratunga Gehan A J filed Critical Amaratunga Gehan A J
Priority to GB0007494A priority Critical patent/GB2360790A/en
Publication of GB0007494D0 publication Critical patent/GB0007494D0/en
Priority to AU2001242603A priority patent/AU2001242603A1/en
Priority to PCT/GB2001/001362 priority patent/WO2001073152A1/en
Publication of GB2360790A publication Critical patent/GB2360790A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0623—Sulfides, selenides or tellurides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)
GB0007494A 2000-03-28 2000-03-28 Low friction coatings produced by cathodic arc evaporation Withdrawn GB2360790A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
GB0007494A GB2360790A (en) 2000-03-28 2000-03-28 Low friction coatings produced by cathodic arc evaporation
AU2001242603A AU2001242603A1 (en) 2000-03-28 2001-03-27 Low friction coatings
PCT/GB2001/001362 WO2001073152A1 (en) 2000-03-28 2001-03-27 Low friction coatings

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB0007494A GB2360790A (en) 2000-03-28 2000-03-28 Low friction coatings produced by cathodic arc evaporation

Publications (2)

Publication Number Publication Date
GB0007494D0 true GB0007494D0 (en) 2000-05-17
GB2360790A GB2360790A (en) 2001-10-03

Family

ID=9888572

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0007494A Withdrawn GB2360790A (en) 2000-03-28 2000-03-28 Low friction coatings produced by cathodic arc evaporation

Country Status (3)

Country Link
AU (1) AU2001242603A1 (en)
GB (1) GB2360790A (en)
WO (1) WO2001073152A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1486582A1 (en) * 2003-06-13 2004-12-15 Asulab S.A. Low friction Micromechanical device
EP1885249B1 (en) * 2005-05-17 2016-12-28 Yeda Research And Development Co., Ltd. Low friction coatings for use in dental and medical devices
CN100387750C (en) * 2005-09-30 2008-05-14 上海交通大学 Method of preparing antifriction I1F-WS2/IF-MoS2 composite film by magnetic controlled sputtering
US11446413B2 (en) 2014-01-06 2022-09-20 Yeda Research And Development Co. Ltd. Attenuation of encrustation of medical devices using coatings of inorganic fullerene-like nanoparticles

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55500784A (en) * 1978-10-09 1980-10-16
AU594979B2 (en) * 1985-09-30 1990-03-22 Union Carbide Corporation Arc vapor depositing a coating in an evacuated chamber
US5002798A (en) * 1989-04-10 1991-03-26 University Of Dayton Method for forming thin solid lubricious films and film articles made thereby
DE69325055T2 (en) * 1992-07-08 2000-03-09 Yeda Res & Dev Oriented polycrystalline thin films made of transition metal chalcogenides
US5494558A (en) * 1992-08-12 1996-02-27 The Regents Of The University Of California Production of fullerenes by sputtering
FR2697317B1 (en) * 1992-10-28 1995-01-27 Lyon Ecole Centrale Lubricated mechanical friction part and lubrication process enabling it to be obtained.
US5558903A (en) * 1993-06-10 1996-09-24 The Ohio State University Method for coating fullerene materials for tribology
US5332723A (en) * 1993-07-28 1994-07-26 The United States Of America As Represented By The Secretary Of The Navy Superconducting thin film with fullerenes and method of making
US5759634A (en) * 1994-03-11 1998-06-02 Jet Process Corporation Jet vapor deposition of nanocluster embedded thin films
CZ293994B6 (en) * 1994-04-25 2004-09-15 The Gillette Company Razor blade, process for its manufacture and shaving unit
US5601293A (en) * 1994-12-22 1997-02-11 Teikoku Piston Ring Co., Ltd. Sliding member with hard ternery film
DE19523550A1 (en) * 1995-06-28 1997-01-02 Hauzer Holding PVD hard coating
GB9514773D0 (en) * 1995-07-19 1995-09-20 Teer Coatings Ltd Methods for improving the sputter deposition of metal-sulphur coatings e.g.molybdenum disulphide(MoS2) coatings
JP2873930B2 (en) * 1996-02-13 1999-03-24 工業技術院長 Carbonaceous solid structure having carbon nanotubes, electron emitter for electron beam source element composed of carbonaceous solid structure, and method of manufacturing carbonaceous solid structure
DE19614557A1 (en) * 1996-04-12 1997-10-16 Hauzer Holding Component with wear protection layer and process for its production
US5738913A (en) * 1996-11-12 1998-04-14 Cleveland State University Method of providing ceramic article with wear resistant coating
US5876790A (en) * 1996-12-31 1999-03-02 Ormat Industries Ltd. Vacuum evaporation method for producing textured C60 films
KR100230279B1 (en) * 1997-03-31 1999-11-15 윤종용 Coating apparatus by using cathodic arc discharge
FR2769620B1 (en) * 1997-10-09 2000-01-14 Bernard Serole PROCESS FOR OBTAINING HIGH ELECTRICALLY CONDUCTIVITY MOLYBDENE BISULFIDE
JP2001521990A (en) * 1997-11-03 2001-11-13 シーメンス アクチエンゲゼルシヤフト Gas jet PVD method for producing MoSi2 containing layer

Also Published As

Publication number Publication date
AU2001242603A1 (en) 2001-10-08
WO2001073152A1 (en) 2001-10-04
GB2360790A (en) 2001-10-03

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)