FR844390A - Dispositifs à conductibilité asymétrique et procédés de fabrication - Google Patents

Dispositifs à conductibilité asymétrique et procédés de fabrication

Info

Publication number
FR844390A
FR844390A FR844390DA FR844390A FR 844390 A FR844390 A FR 844390A FR 844390D A FR844390D A FR 844390DA FR 844390 A FR844390 A FR 844390A
Authority
FR
France
Prior art keywords
manufacturing processes
conductivity devices
asymmetric conductivity
asymmetric
devices
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Other languages
English (en)
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Le Materiel Telephonique Thomson CSF
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Le Materiel Telephonique Thomson CSF filed Critical Le Materiel Telephonique Thomson CSF
Application granted granted Critical
Publication of FR844390A publication Critical patent/FR844390A/fr
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C1/00Details
    • H01C1/14Terminals or tapping points or electrodes specially adapted for resistors; Arrangements of terminals or tapping points or electrodes on resistors
    • H01C1/142Terminals or tapping points or electrodes specially adapted for resistors; Arrangements of terminals or tapping points or electrodes on resistors the terminals or tapping points being coated on the resistive element
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/06Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising selenium or tellurium in uncombined form other than as impurities in semiconductor bodies of other materials
    • H01L21/12Application of an electrode to the exposed surface of the selenium or tellurium after the selenium or tellurium has been applied to the foundation plate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/16Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising cuprous oxide or cuprous iodide
    • H01L21/161Preparation of the foundation plate, preliminary treatment oxidation of the foundation plate, reduction treatment
    • H01L21/167Application of a non-genetic conductive layer
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24917Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biotechnology (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Thermistors And Varistors (AREA)
  • Rectifiers (AREA)
FR844390D 1937-10-07 1938-10-06 Dispositifs à conductibilité asymétrique et procédés de fabrication Expired FR844390A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US16771437 US2239770A (en) 1937-10-07 1937-10-07 Electrically conductive device and the manufacture thereof

Publications (1)

Publication Number Publication Date
FR844390A true FR844390A (fr) 1939-07-24

Family

ID=22608507

Family Applications (1)

Application Number Title Priority Date Filing Date
FR844390D Expired FR844390A (fr) 1937-10-07 1938-10-06 Dispositifs à conductibilité asymétrique et procédés de fabrication

Country Status (6)

Country Link
US (1) US2239770A (xx)
BE (1) BE430527A (xx)
CH (1) CH209023A (xx)
FR (1) FR844390A (xx)
GB (1) GB519987A (xx)
NL (1) NL67096C (xx)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2463906A (en) * 1944-04-20 1949-03-08 American Optical Corp Apparatus and method for making optical devices
US2453582A (en) * 1944-06-09 1948-11-09 Libbey Owens Ford Glass Co Apparatus for making pattern mirrors and other coatings
US2453801A (en) * 1944-07-27 1948-11-16 Honeywell Regulator Co Method and apparatus for coating by thermal evaporation
US2547951A (en) * 1945-02-08 1951-04-10 Levin Irvin Rectifier
US2496721A (en) * 1945-10-19 1950-02-07 Westinghouse Electric Corp Rectifier
US2545606A (en) * 1946-01-07 1951-03-20 Burris B Cunningham Method of coating with plutonium acetylacetonate and coated product
US2521687A (en) * 1947-07-23 1950-09-12 Standard Telephones Cables Ltd Electroforming apparatus
US2719097A (en) * 1949-05-07 1955-09-27 Alois Vogt Method for the production of thin continuous surface layers of precious metals
US2634322A (en) * 1949-07-16 1953-04-07 Rca Corp Contact for semiconductor devices
GB688866A (en) * 1950-10-19 1953-03-18 Gen Electric Co Ltd Improvements in or relating to crystal rectifiers
US2996410A (en) * 1957-11-25 1961-08-15 Nat Steel Corp Coating
US3000346A (en) * 1958-11-05 1961-09-19 Nat Steel Corp Vacuum coating apparatus
USB778836I5 (xx) * 1958-12-08
US3276423A (en) * 1963-10-04 1966-10-04 David P Triller Pattern mask for use in making thin film circuitry
US3516386A (en) * 1965-07-16 1970-06-23 Boeing Co Thin film deposition fixture
US3617348A (en) * 1969-10-15 1971-11-02 Motorola Inc Method and apparatus for the evaporation of chromium-silver
US3678892A (en) * 1970-05-19 1972-07-25 Western Electric Co Pallet and mask for substrates
US5306345A (en) * 1992-08-25 1994-04-26 Particle Solutions Deposition chamber for deposition of particles on semiconductor wafers

Also Published As

Publication number Publication date
US2239770A (en) 1941-04-29
CH209023A (de) 1940-03-15
GB519987A (en) 1940-04-11
NL67096C (xx)
BE430527A (xx)

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