CH209023A - Verfahren zur Herstellung eines Kontaktes an Gleichrichterplatten und nach dem Verfahren hergestellter Anschlusskontakt. - Google Patents

Verfahren zur Herstellung eines Kontaktes an Gleichrichterplatten und nach dem Verfahren hergestellter Anschlusskontakt.

Info

Publication number
CH209023A
CH209023A CH209023DA CH209023A CH 209023 A CH209023 A CH 209023A CH 209023D A CH209023D A CH 209023DA CH 209023 A CH209023 A CH 209023A
Authority
CH
Switzerland
Prior art keywords
contact
producing
produced according
rectifier plates
connection contact
Prior art date
Application number
Other languages
English (en)
Inventor
Bell Telephone Manufac Anonyme
Original Assignee
Bell Telephone Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bell Telephone Mfg filed Critical Bell Telephone Mfg
Publication of CH209023A publication Critical patent/CH209023A/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C1/00—Details
    • H01C1/14—Terminals or tapping points or electrodes specially adapted for resistors; Arrangements of terminals or tapping points or electrodes on resistors
    • H01C1/142—Terminals or tapping points or electrodes specially adapted for resistors; Arrangements of terminals or tapping points or electrodes on resistors the terminals or tapping points being coated on the resistive element
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/06—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising selenium or tellurium in uncombined form other than as impurities in semiconductor bodies of other materials
    • H01L21/12—Application of an electrode to the exposed surface of the selenium or tellurium after the selenium or tellurium has been applied to the foundation plate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/16—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising cuprous oxide or cuprous iodide
    • H01L21/161—Preparation of the foundation plate, preliminary treatment oxidation of the foundation plate, reduction treatment
    • H01L21/167—Application of a non-genetic conductive layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biotechnology (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Thermistors And Varistors (AREA)
  • Rectifiers (AREA)
CH209023D 1937-10-07 1938-10-07 Verfahren zur Herstellung eines Kontaktes an Gleichrichterplatten und nach dem Verfahren hergestellter Anschlusskontakt. CH209023A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US16771437 US2239770A (en) 1937-10-07 1937-10-07 Electrically conductive device and the manufacture thereof

Publications (1)

Publication Number Publication Date
CH209023A true CH209023A (de) 1940-03-15

Family

ID=22608507

Family Applications (1)

Application Number Title Priority Date Filing Date
CH209023D CH209023A (de) 1937-10-07 1938-10-07 Verfahren zur Herstellung eines Kontaktes an Gleichrichterplatten und nach dem Verfahren hergestellter Anschlusskontakt.

Country Status (6)

Country Link
US (1) US2239770A (de)
BE (1) BE430527A (de)
CH (1) CH209023A (de)
FR (1) FR844390A (de)
GB (1) GB519987A (de)
NL (1) NL67096C (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2463906A (en) * 1944-04-20 1949-03-08 American Optical Corp Apparatus and method for making optical devices
US2453582A (en) * 1944-06-09 1948-11-09 Libbey Owens Ford Glass Co Apparatus for making pattern mirrors and other coatings
US2453801A (en) * 1944-07-27 1948-11-16 Honeywell Regulator Co Method and apparatus for coating by thermal evaporation
US2547951A (en) * 1945-02-08 1951-04-10 Levin Irvin Rectifier
US2496721A (en) * 1945-10-19 1950-02-07 Westinghouse Electric Corp Rectifier
US2545606A (en) * 1946-01-07 1951-03-20 Burris B Cunningham Method of coating with plutonium acetylacetonate and coated product
US2521687A (en) * 1947-07-23 1950-09-12 Standard Telephones Cables Ltd Electroforming apparatus
US2719097A (en) * 1949-05-07 1955-09-27 Alois Vogt Method for the production of thin continuous surface layers of precious metals
US2634322A (en) * 1949-07-16 1953-04-07 Rca Corp Contact for semiconductor devices
GB688866A (en) * 1950-10-19 1953-03-18 Gen Electric Co Ltd Improvements in or relating to crystal rectifiers
US2996410A (en) * 1957-11-25 1961-08-15 Nat Steel Corp Coating
US3000346A (en) * 1958-11-05 1961-09-19 Nat Steel Corp Vacuum coating apparatus
USB778836I5 (de) * 1958-12-08
US3276423A (en) * 1963-10-04 1966-10-04 David P Triller Pattern mask for use in making thin film circuitry
US3516386A (en) * 1965-07-16 1970-06-23 Boeing Co Thin film deposition fixture
US3617348A (en) * 1969-10-15 1971-11-02 Motorola Inc Method and apparatus for the evaporation of chromium-silver
US3678892A (en) * 1970-05-19 1972-07-25 Western Electric Co Pallet and mask for substrates
US5306345A (en) * 1992-08-25 1994-04-26 Particle Solutions Deposition chamber for deposition of particles on semiconductor wafers

Also Published As

Publication number Publication date
US2239770A (en) 1941-04-29
BE430527A (de)
GB519987A (en) 1940-04-11
FR844390A (fr) 1939-07-24
NL67096C (de)

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