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ZEESE WILKINSON Co
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ZEESE WILKINSON Co
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Application filed by ZEESE WILKINSON CofiledCriticalZEESE WILKINSON Co
Application grantedgrantedCritical
Publication of FR458172ApublicationCriticalpatent/FR458172A/fr
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
Landscapes
Physics & Mathematics
(AREA)
General Physics & Mathematics
(AREA)
Manufacture Or Reproduction Of Printing Formes
(AREA)
Printing Methods
(AREA)
FR458172A1912-05-311913-05-10Procédé pour l'obtention de clichés phototypographiques à demi-teintes
ExpiredFR458172A
(fr)