FR3129030B1 - Dispositif et procédé de génération de masques photolithographiques - Google Patents

Dispositif et procédé de génération de masques photolithographiques Download PDF

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Publication number
FR3129030B1
FR3129030B1 FR2111964A FR2111964A FR3129030B1 FR 3129030 B1 FR3129030 B1 FR 3129030B1 FR 2111964 A FR2111964 A FR 2111964A FR 2111964 A FR2111964 A FR 2111964A FR 3129030 B1 FR3129030 B1 FR 3129030B1
Authority
FR
France
Prior art keywords
generating
representation
photolithographic masks
image
point elements
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR2111964A
Other languages
English (en)
Other versions
FR3129030A1 (fr
Inventor
Charlotte Beylier
Suarez Mauricio Garcia
Pascal Urard
Guillaume Landie
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STMicroelectronics SA
STMicroelectronics Crolles 2 SAS
Original Assignee
STMicroelectronics SA
STMicroelectronics Crolles 2 SAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by STMicroelectronics SA, STMicroelectronics Crolles 2 SAS filed Critical STMicroelectronics SA
Priority to FR2111964A priority Critical patent/FR3129030B1/fr
Priority to US17/983,972 priority patent/US20230141388A1/en
Priority to CN202211408639.4A priority patent/CN116107155A/zh
Publication of FR3129030A1 publication Critical patent/FR3129030A1/fr
Application granted granted Critical
Publication of FR3129030B1 publication Critical patent/FR3129030B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/70—Adapting basic layout or design of masks to lithographic process requirements, e.g., second iteration correction of mask patterns for imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T3/00—Geometric image transformation in the plane of the image
    • G06T3/40—Scaling the whole image or part thereof
    • G06T3/4046—Scaling the whole image or part thereof using neural networks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/76—Patterning of masks by imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06N—COMPUTING ARRANGEMENTS BASED ON SPECIFIC COMPUTATIONAL MODELS
    • G06N3/00—Computing arrangements based on biological models
    • G06N3/02—Neural networks
    • G06N3/04—Architecture, e.g. interconnection topology
    • G06N3/045—Combinations of networks
    • G06N3/0455—Auto-encoder networks; Encoder-decoder networks
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06N—COMPUTING ARRANGEMENTS BASED ON SPECIFIC COMPUTATIONAL MODELS
    • G06N3/00—Computing arrangements based on biological models
    • G06N3/02—Neural networks
    • G06N3/04—Architecture, e.g. interconnection topology
    • G06N3/0475—Generative networks
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06N—COMPUTING ARRANGEMENTS BASED ON SPECIFIC COMPUTATIONAL MODELS
    • G06N3/00—Computing arrangements based on biological models
    • G06N3/02—Neural networks
    • G06N3/08—Learning methods
    • G06N3/084—Backpropagation, e.g. using gradient descent
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06N—COMPUTING ARRANGEMENTS BASED ON SPECIFIC COMPUTATIONAL MODELS
    • G06N3/00—Computing arrangements based on biological models
    • G06N3/02—Neural networks
    • G06N3/08—Learning methods
    • G06N3/094—Adversarial learning
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T9/00—Image coding
    • G06T9/002—Image coding using neural networks

Abstract

Dispositif et procédé de génération de masques photolithographiques La présente description concerne un procédé comprenant :- la compression (800), par un processeur, d’une image (906) comprenant des premiers motifs, en faisant la transformation de l’image vers une première représentation composée d’éléments à deux points ;- l’exécution, par réseau de neurones (712), d’une opération d’inférence sur la première représentation afin de générer une deuxième représentation composée d’éléments à deux points ; et- la génération d’un masque lithographique (914) sur la base de la décompression (802) de la deuxième représentation. Figure pour l'abrégé : Fig. 8
FR2111964A 2021-11-10 2021-11-10 Dispositif et procédé de génération de masques photolithographiques Active FR3129030B1 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
FR2111964A FR3129030B1 (fr) 2021-11-10 2021-11-10 Dispositif et procédé de génération de masques photolithographiques
US17/983,972 US20230141388A1 (en) 2021-11-10 2022-11-09 Device and method for generating photomasks
CN202211408639.4A CN116107155A (zh) 2021-11-10 2022-11-10 生成光掩模的装置和方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR2111964 2021-11-10
FR2111964A FR3129030B1 (fr) 2021-11-10 2021-11-10 Dispositif et procédé de génération de masques photolithographiques

Publications (2)

Publication Number Publication Date
FR3129030A1 FR3129030A1 (fr) 2023-05-12
FR3129030B1 true FR3129030B1 (fr) 2024-03-01

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
FR2111964A Active FR3129030B1 (fr) 2021-11-10 2021-11-10 Dispositif et procédé de génération de masques photolithographiques

Country Status (3)

Country Link
US (1) US20230141388A1 (fr)
CN (1) CN116107155A (fr)
FR (1) FR3129030B1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117518747B (zh) * 2024-01-05 2024-04-05 华芯程(杭州)科技有限公司 一种光刻量测强度的生成方法、装置、设备及存储介质

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2903518B1 (fr) * 2006-07-05 2008-10-17 Newscape Technology Sarl Procede de traitement d'une image numerique vectorielle, programme d'ordinateur associe, procede de communication entre un serveur et un terminal de donnees d'image ainsi traitee, terminal associe
US20200380362A1 (en) * 2018-02-23 2020-12-03 Asml Netherlands B.V. Methods for training machine learning model for computation lithography
EP3789923A1 (fr) * 2019-09-06 2021-03-10 ASML Netherlands B.V. Procédé d'augmentation de la certitude dans des prédictions de modèles paramétrées
CN114402342A (zh) * 2019-09-16 2022-04-26 Asml荷兰有限公司 用于生成特性图案以及训练机器学习模型的方法
US11762283B2 (en) * 2019-12-13 2023-09-19 Synopsys, Inc. Inverse lithography and machine learning for mask synthesis

Also Published As

Publication number Publication date
US20230141388A1 (en) 2023-05-11
FR3129030A1 (fr) 2023-05-12
CN116107155A (zh) 2023-05-12

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