FR3092436B1 - VCSEL side oxidation furnace with local modification of the oxidation rate - Google Patents
VCSEL side oxidation furnace with local modification of the oxidation rate Download PDFInfo
- Publication number
- FR3092436B1 FR3092436B1 FR1901040A FR1901040A FR3092436B1 FR 3092436 B1 FR3092436 B1 FR 3092436B1 FR 1901040 A FR1901040 A FR 1901040A FR 1901040 A FR1901040 A FR 1901040A FR 3092436 B1 FR3092436 B1 FR 3092436B1
- Authority
- FR
- France
- Prior art keywords
- oxidation
- furnace
- local modification
- oxidation chamber
- rate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000003647 oxidation Effects 0.000 title abstract 5
- 238000007254 oxidation reaction Methods 0.000 title abstract 5
- 230000004048 modification Effects 0.000 title 1
- 238000012986 modification Methods 0.000 title 1
- 238000010438 heat treatment Methods 0.000 abstract 2
- 238000002347 injection Methods 0.000 abstract 1
- 239000007924 injection Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67103—Apparatus for thermal treatment mainly by conduction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67248—Temperature monitoring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68785—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
- H01S5/18311—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement using selective oxidation
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Semiconductor Lasers (AREA)
- Formation Of Insulating Films (AREA)
Abstract
Ce four (1) comporte : - une chambre d’oxydation (2), comprenant une atmosphère (20) ; - des moyens d’injection, agencés pour injecter un flux gazeux humide dans la chambre d’oxydation (2) ; - un support chauffant (4), de type suscepteur, agencé dans la chambre d’oxydation (2), et comprenant une surface supérieure (40) destinée à supporter un substrat comprenant les diodes laser ; remarquable en ce que le four (1) comprend un ensemble d’éléments rayonnants (41) agencé de sorte que la surface supérieure (40) présente des zones de chauffage (ZC1, ZC2) possédant des températures différentes. Figure 1This furnace (1) comprises: - an oxidation chamber (2), comprising an atmosphere (20); - injection means, arranged to inject a wet gas stream into the oxidation chamber (2); - a heating support (4), of the susceptor type, arranged in the oxidation chamber (2), and comprising an upper surface (40) intended to support a substrate comprising the laser diodes; remarkable in that the furnace (1) comprises a set of radiating elements (41) arranged so that the upper surface (40) has heating zones (ZC1, ZC2) having different temperatures. Figure 1
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1901040A FR3092436B1 (en) | 2019-02-04 | 2019-02-04 | VCSEL side oxidation furnace with local modification of the oxidation rate |
PCT/EP2020/052642 WO2020161085A1 (en) | 2019-02-04 | 2020-02-03 | Vcsel lateral oxidation furnace with local modification of oxidation rate |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1901040A FR3092436B1 (en) | 2019-02-04 | 2019-02-04 | VCSEL side oxidation furnace with local modification of the oxidation rate |
FR1901040 | 2019-02-04 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR3092436A1 FR3092436A1 (en) | 2020-08-07 |
FR3092436B1 true FR3092436B1 (en) | 2021-02-12 |
Family
ID=67107717
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR1901040A Expired - Fee Related FR3092436B1 (en) | 2019-02-04 | 2019-02-04 | VCSEL side oxidation furnace with local modification of the oxidation rate |
Country Status (2)
Country | Link |
---|---|
FR (1) | FR3092436B1 (en) |
WO (1) | WO2020161085A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112003124B (en) * | 2020-09-02 | 2021-07-02 | 北京金太光芯科技有限公司 | Vertical cavity surface emitting laser with non-cylindrical platform and preparation method thereof |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4485972B2 (en) * | 2005-02-15 | 2010-06-23 | 株式会社リコー | Semiconductor oxidation apparatus and semiconductor element manufacturing method |
US11158526B2 (en) * | 2014-02-07 | 2021-10-26 | Applied Materials, Inc. | Temperature controlled substrate support assembly |
US9558932B2 (en) | 2014-06-17 | 2017-01-31 | California Scientific, Inc. | Lateral wafer oxidation system with in-situ visual monitoring and method therefor |
US10903065B2 (en) * | 2017-05-12 | 2021-01-26 | Lam Research Corporation | Halogen removal module and associated systems and methods |
-
2019
- 2019-02-04 FR FR1901040A patent/FR3092436B1/en not_active Expired - Fee Related
-
2020
- 2020-02-03 WO PCT/EP2020/052642 patent/WO2020161085A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
FR3092436A1 (en) | 2020-08-07 |
WO2020161085A1 (en) | 2020-08-13 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PLFP | Fee payment |
Year of fee payment: 2 |
|
PLSC | Publication of the preliminary search report |
Effective date: 20200807 |
|
PLFP | Fee payment |
Year of fee payment: 3 |
|
PLFP | Fee payment |
Year of fee payment: 4 |
|
ST | Notification of lapse |
Effective date: 20231005 |