FR3061310B1 - Procede de formation de guide d'ondes optique, appareil de formation de guide d'ondes optique, accelerateur d'electrons, appareil d'irradiation laser a rayons x, generateur de rayons x diffuses - Google Patents

Procede de formation de guide d'ondes optique, appareil de formation de guide d'ondes optique, accelerateur d'electrons, appareil d'irradiation laser a rayons x, generateur de rayons x diffuses Download PDF

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Publication number
FR3061310B1
FR3061310B1 FR1763339A FR1763339A FR3061310B1 FR 3061310 B1 FR3061310 B1 FR 3061310B1 FR 1763339 A FR1763339 A FR 1763339A FR 1763339 A FR1763339 A FR 1763339A FR 3061310 B1 FR3061310 B1 FR 3061310B1
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France
Prior art keywords
wave guide
optical wave
guide formation
internal space
laser beam
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FR1763339A
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English (en)
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FR3061310A1 (fr
Inventor
Tomonao Hosokai
Alexey Zhidkov
Ryousuke Kodama
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Osaka University NUC
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Osaka University NUC
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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/04—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using magnetic fields substantially generated by the discharge in the plasma
    • H05H1/06—Longitudinal pinch devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S4/00—Devices using stimulated emission of electromagnetic radiation in wave ranges other than those covered by groups H01S1/00, H01S3/00 or H01S5/00, e.g. phonon masers, X-ray lasers or gamma-ray lasers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/0006—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature
    • H05H1/0012—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature using electromagnetic or particle radiation, e.g. interferometry
    • H05H1/0037—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature using electromagnetic or particle radiation, e.g. interferometry by spectrometry
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/04—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using magnetic fields substantially generated by the discharge in the plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H15/00—Methods or devices for acceleration of charged particles not otherwise provided for, e.g. wakefield accelerators

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lasers (AREA)
  • Particle Accelerators (AREA)
  • Plasma Technology (AREA)
  • X-Ray Techniques (AREA)

Abstract

Dans un procédé de formation de guide d'ondes optique, un guide d'ondes optique est formé en utilisant un récipient contenant un gaz qui comporte un espace interne dans lequel un gaz ionisable polyvalent est enfermé, un dispositif d'irradiation par faisceau laser qui irradie l'espace interne avec un faisceau laser pulsé, et un circuit de décharge qui amène un courant pulsé à circuler dans le récipient contenant un gaz. Le procédé de formation de guide d'ondes optique comprend : une première étape consistant à amener le courant pulsé à circuler dans le récipient contenant un gaz en utilisant le circuit de décharge de sorte que l'espace interne entre dans un état de plasma ; une deuxième étape consistant à former un canal d'ionisation polyvalent dans l'espace interne et à amener le canal d'ionisation polyvalent à se dilater par un effet de striction inverse en irradiant l'espace interne dans l'état de plasma avec le faisceau laser pulsé en tant que faisceau laser de déclenchement provenant du dispositif d'irradiation par faisceau laser ; et une troisième étape consistant à augmenter une valeur de courant du courant pulsé circulant dans le récipient contenant un gaz à partir d'un instant avant l'irradiation ou pendant l'irradiation avec le faisceau laser de déclenchement.
FR1763339A 2016-12-28 2017-12-28 Procede de formation de guide d'ondes optique, appareil de formation de guide d'ondes optique, accelerateur d'electrons, appareil d'irradiation laser a rayons x, generateur de rayons x diffuses Active FR3061310B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016255880A JP6319920B1 (ja) 2016-12-28 2016-12-28 光導波路形成方法、光導波路形成装置、電子加速器、ｘ線レーザ照射装置、及び散乱ｘ線発生装置
JP2016-255880 2016-12-28

Publications (2)

Publication Number Publication Date
FR3061310A1 FR3061310A1 (fr) 2018-06-29
FR3061310B1 true FR3061310B1 (fr) 2021-05-21

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FR1763339A Active FR3061310B1 (fr) 2016-12-28 2017-12-28 Procede de formation de guide d'ondes optique, appareil de formation de guide d'ondes optique, accelerateur d'electrons, appareil d'irradiation laser a rayons x, generateur de rayons x diffuses

Country Status (5)

Country Link
US (1) US10104753B2 (fr)
JP (1) JP6319920B1 (fr)
DE (1) DE102017131343A1 (fr)
FR (1) FR3061310B1 (fr)
GB (1) GB2559676B (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7219956B2 (ja) * 2018-11-13 2023-02-09 国立大学法人大阪大学 光導波路形成方法、及び光導波路形成装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001035691A (ja) * 1999-07-16 2001-02-09 Japan Atom Energy Res Inst Ｚピンチ放電によるレーザー光ガイド用プラズマチャンネルの形成法
US6972421B2 (en) * 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
JP5483175B2 (ja) * 2009-11-20 2014-05-07 独立行政法人日本原子力研究開発機構 荷電粒子加速方法及び荷電粒子加速装置、粒子線照射装置、医療用粒子線照射装置
US9370085B2 (en) * 2014-07-14 2016-06-14 The United States Of America, As Represented By The Secretary Of The Navy Compact, all-optical generation of coherent X-rays

Also Published As

Publication number Publication date
GB2559676A (en) 2018-08-15
JP6319920B1 (ja) 2018-05-09
FR3061310A1 (fr) 2018-06-29
GB2559676B (en) 2020-05-13
GB201721197D0 (en) 2018-01-31
US10104753B2 (en) 2018-10-16
DE102017131343A1 (de) 2018-06-28
JP2018107092A (ja) 2018-07-05
US20180184510A1 (en) 2018-06-28
GB2559676A8 (en) 2018-10-03

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