FR3047572B1 - REVERSIBLE WRITING METHOD OF A PATTERN ON A CELLULOSIC ELEMENT AND ASSOCIATED CELLULOSIC PRODUCT - Google Patents

REVERSIBLE WRITING METHOD OF A PATTERN ON A CELLULOSIC ELEMENT AND ASSOCIATED CELLULOSIC PRODUCT Download PDF

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Publication number
FR3047572B1
FR3047572B1 FR1600227A FR1600227A FR3047572B1 FR 3047572 B1 FR3047572 B1 FR 3047572B1 FR 1600227 A FR1600227 A FR 1600227A FR 1600227 A FR1600227 A FR 1600227A FR 3047572 B1 FR3047572 B1 FR 3047572B1
Authority
FR
France
Prior art keywords
cellulosic
pattern
pap
writing method
product
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR1600227A
Other languages
French (fr)
Other versions
FR3047572A1 (en
Inventor
Francois Xavier Felpin
Martin D'halluin
Jordi Rull - Barrull
Erwan Le Grognec
Denis Jacquemin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre National de la Recherche Scientifique CNRS
Universite de Nantes
Original Assignee
Centre National de la Recherche Scientifique CNRS
Universite de Nantes
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre National de la Recherche Scientifique CNRS, Universite de Nantes filed Critical Centre National de la Recherche Scientifique CNRS
Priority to FR1600227A priority Critical patent/FR3047572B1/en
Publication of FR3047572A1 publication Critical patent/FR3047572A1/en
Application granted granted Critical
Publication of FR3047572B1 publication Critical patent/FR3047572B1/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Printing Methods (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

Abstract

La présente invention concerne une méthode d'écriture réversible d'un motif (PAT) sur un élément cellulosique (PAP) comprenant un greffage covalent (S1) de coumarines, d'anthracényles, ou de cinnamyles sur un élément cellulosique (PAP), un positionnement (S2) sur l'élément cellulosique (PAP) d'un masque d'écriture (WMA) représentatif du motif (PAT), puis une exposition (S3) de élément cellulosique (PAP) à un rayonnement ultra-violet (UVE) de longueur d'onde (L1) prédéterminée à travers le masque d'écriture (WMA) pendant une durée prédéterminée (T1).The present invention relates to a method for reversibly writing a pattern (PAT) on a cellulosic element (PAP) comprising covalent grafting (S1) of coumarins, anthracenyls, or cinnamyls on a cellulosic element (PAP), a positioning (S2) on the cellulosic element (PAP) of a writing mask (WMA) representative of the pattern (PAT), then exposure (S3) of cellulosic element (PAP) to ultraviolet radiation (UVE) predetermined wavelength (L1) through the write mask (WMA) for a predetermined time (T1).

FR1600227A 2016-02-10 2016-02-10 REVERSIBLE WRITING METHOD OF A PATTERN ON A CELLULOSIC ELEMENT AND ASSOCIATED CELLULOSIC PRODUCT Expired - Fee Related FR3047572B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR1600227A FR3047572B1 (en) 2016-02-10 2016-02-10 REVERSIBLE WRITING METHOD OF A PATTERN ON A CELLULOSIC ELEMENT AND ASSOCIATED CELLULOSIC PRODUCT

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1600227 2016-02-10
FR1600227A FR3047572B1 (en) 2016-02-10 2016-02-10 REVERSIBLE WRITING METHOD OF A PATTERN ON A CELLULOSIC ELEMENT AND ASSOCIATED CELLULOSIC PRODUCT

Publications (2)

Publication Number Publication Date
FR3047572A1 FR3047572A1 (en) 2017-08-11
FR3047572B1 true FR3047572B1 (en) 2019-05-10

Family

ID=56137388

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1600227A Expired - Fee Related FR3047572B1 (en) 2016-02-10 2016-02-10 REVERSIBLE WRITING METHOD OF A PATTERN ON A CELLULOSIC ELEMENT AND ASSOCIATED CELLULOSIC PRODUCT

Country Status (1)

Country Link
FR (1) FR3047572B1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3091598A1 (en) * 2019-01-04 2020-07-10 Universite De Nantes Process for the covalent printing of photochromes on a cellulosic support

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9505495D0 (en) * 1995-03-18 1995-05-03 Smith & Nephew Adhesives
CN102037346B (en) * 2008-04-16 2013-04-10 明智全像公司 Photopolymerizable compositions
US8124299B2 (en) * 2009-08-31 2012-02-28 General Electric Company Methods for using optical data storage media

Also Published As

Publication number Publication date
FR3047572A1 (en) 2017-08-11

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