FR2969178A1 - Diamond coating of tungsten carbide tools by chemical vapor deposition without chemical preparation of carbide, comprises depositing intermediate layer of silicon carbide on tools, and microbead blasting tools with silicon carbide - Google Patents
Diamond coating of tungsten carbide tools by chemical vapor deposition without chemical preparation of carbide, comprises depositing intermediate layer of silicon carbide on tools, and microbead blasting tools with silicon carbide Download PDFInfo
- Publication number
- FR2969178A1 FR2969178A1 FR1004978A FR1004978A FR2969178A1 FR 2969178 A1 FR2969178 A1 FR 2969178A1 FR 1004978 A FR1004978 A FR 1004978A FR 1004978 A FR1004978 A FR 1004978A FR 2969178 A1 FR2969178 A1 FR 2969178A1
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- FR
- France
- Prior art keywords
- tools
- sic
- carbide
- layer
- silicon carbide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
- B23B27/148—Composition of the cutting inserts
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0254—Physical treatment to alter the texture of the surface, e.g. scratching or polishing
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45595—Atmospheric CVD gas inlets with no enclosed reaction chamber
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2224/00—Materials of tools or workpieces composed of a compound including a metal
- B23B2224/28—Titanium carbide
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2226/00—Materials of tools or workpieces not comprising a metal
- B23B2226/31—Diamond
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2226/00—Materials of tools or workpieces not comprising a metal
- B23B2226/72—Silicon carbide
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2228/00—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
- B23B2228/04—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner applied by chemical vapour deposition [CVD]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2228/00—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
- B23B2228/10—Coatings
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
Abstract
Description
1 La présente invention concerne un procédé pour la réalisation de couches (1) diamantées par procédé CVD sur une couche intermédiaire en SiC (4) déposée sur les outils carbure (2) par plasma basse température et à pression atmosphérique. Le revêtement diamant CVD traditionnel des outils en carbure de tungstène est réalisé généralement, après un traitement chimique qui diminue le % du liant cobalt en surface sur la partie à revêtir. Cette opération chimique affaiblit les caractéristiques mécaniques du carbure et arrondit les arrêtes de coupe des outils.(3) Le procédé suivant l'invention permet de remédier à ces inconvénients en supprimant le traitement chimique, en conservant après revêtement diamant CVD les caractéristiques mécaniques du carbure et l'acuité des arêtes de coupe (3) des outils. Selon des modes particuliers de réalisation, les outils sont fabriqués en carbure de tungstène WcCo avec un pourcentage de cobalt qui peut varier de 3 à 12 % La granulométrie des grains de tungstène se situe entre 0,5 à 5 microns. Les carbures ne doivent pas avoir de carbure mixte dans leur composition. La surface à revêtir est microbillée avec du SiC grains 800 ,pression d'air du microbillage 2 bars distance buse/ pièce 100 mm jet perpendiculaire aux surfaces à revêtir pour implantation de grains de SiC (5) entre les grains de carbure (7) de l'outil. Les outils sont ensuite revêtus d'une couche de SiC CVD (4) par procédé plasma à basse température et à pression atmosphérique. Plasma avec N2 + CH4 (14) Proportions N2 501/mn CH4 0,51/mn. Buse (10) à 40 mm de l'outil ;Vitesse de balayage 30 m/mn, 15 passages sur l'outil. A la base de la buse( 10 ) dans le plasma (11) introduction d'un précurseur (12) du type C6H18Si2. Le débit du précurseur (12) de l'ordre de 25 ml/mn et le débit du gaz porteur (13)de 201/mn. pour la création de la couche de SiC (4) sur le carbure de tungstène. Le jet plasma (1l) est perpendiculaire à la surface à traiter (8). Ces paramètres permettent de réaliser des couches de SiC (4) d'une épaisseur (9)de 0,5 à 1 micron. Cette épaisseur est suffisante pour créer une barrière efficace 30 contre les remontées de cobalt à travers la couche de SiC . Avant le revêtement diamant CVD, les outils sont plongés dans un bain ultrasonique avec grains de diamant en suspension pour créer des zones de germination par implantations de grains de diamant (6) dans la couche de SiC (4) Cette opération grave la surface de la couche de SiC (4) et favorise l'accroche du revêtement diamant.The present invention relates to a method for producing CVD diamond layers (1) on an SiC intermediate layer (4) deposited on the carbide tools (2) by low temperature plasma and at atmospheric pressure. The traditional CVD diamond coating of tungsten carbide tools is generally performed after a chemical treatment which decreases the% of the cobalt binder at the surface on the part to be coated. This chemical operation weakens the mechanical properties of the carbide and rounds the cutting edges of the tools. (3) The method according to the invention overcomes these disadvantages by eliminating the chemical treatment, retaining after CVD diamond coating the mechanical properties of the carbide and the sharpness of the cutting edges (3) of the tools. According to particular embodiments, the tools are made of WcCo tungsten carbide with a percentage of cobalt which can vary from 3 to 12% The particle size of the tungsten grains is between 0.5 to 5 microns. Carbides should not have mixed carbide in their composition. The surface to be coated is microbilled with SiC grains 800, air pressure of the microbrilling 2 bars distance nozzle / piece 100 mm perpendicular to the surfaces to be coated for implantation of SiC grains (5) between the carbide grains (7) of the tool. The tools are then coated with a CVD (4) SiC layer by a plasma process at low temperature and at atmospheric pressure. Plasma with N2 + CH4 (14) Proportions N2 501 / min CH4 0.51 / min. Nozzle (10) at 40 mm from the tool, sweeping speed 30 m / min, 15 passes on the tool. At the base of the nozzle (10) in the plasma (11) introduction of a precursor (12) of the C6H18Si2 type. The flow rate of the precursor (12) of the order of 25 ml / min and the flow rate of the carrier gas (13) of 201 / min. for the creation of the SiC layer (4) on tungsten carbide. The plasma jet (11) is perpendicular to the surface to be treated (8). These parameters make it possible to produce SiC layers (4) with a thickness (9) of 0.5 to 1 micron. This thickness is sufficient to create an effective barrier against cobalt rising through the SiC layer. Before the CVD diamond coating, the tools are immersed in an ultrasonic bath with diamond grains in suspension to create germination zones by implantation of diamond grains (6) in the SiC layer (4). This operation engraves the surface of the layer of SiC (4) and promotes the grip of the diamond coating.
35 Le bain ultra-sons 40HZ contient un mélange de 1L d'eau DI avec 2 carats de poudre de diamant de 0,5 micron .Le temps de traitement est de 10 minutes environ. Les outils sont ensuite revêtus dans un four CVD diamant à environ 800° C. Après traitement, l'épaisseur du revêtement est typiquement de 6 microns. Le procédé suivant l'invention est destiné à revêtir les outils en carbure de tungstène avec un 40 revêtement diamant par procédé CVD .en supprimant leur préparation chimique . The 40HZ ultrasonic bath contains a mixture of 1L DI water with 2 carats of 0.5 micron diamond powder. The treatment time is about 10 minutes. The tools are then coated in a diamond CVD oven at about 800 ° C. After treatment, the coating thickness is typically 6 microns. The process according to the invention is intended to coat the tungsten carbide tools with a CVD diamond coating by removing their chemical preparation.
Claims (6)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1004978A FR2969178A1 (en) | 2010-12-20 | 2010-12-20 | Diamond coating of tungsten carbide tools by chemical vapor deposition without chemical preparation of carbide, comprises depositing intermediate layer of silicon carbide on tools, and microbead blasting tools with silicon carbide |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1004978A FR2969178A1 (en) | 2010-12-20 | 2010-12-20 | Diamond coating of tungsten carbide tools by chemical vapor deposition without chemical preparation of carbide, comprises depositing intermediate layer of silicon carbide on tools, and microbead blasting tools with silicon carbide |
Publications (1)
Publication Number | Publication Date |
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FR2969178A1 true FR2969178A1 (en) | 2012-06-22 |
Family
ID=44654151
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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FR1004978A Pending FR2969178A1 (en) | 2010-12-20 | 2010-12-20 | Diamond coating of tungsten carbide tools by chemical vapor deposition without chemical preparation of carbide, comprises depositing intermediate layer of silicon carbide on tools, and microbead blasting tools with silicon carbide |
Country Status (1)
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FR (1) | FR2969178A1 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10475619B2 (en) | 2016-06-30 | 2019-11-12 | General Electric Company | Multilayer X-ray source target |
US10692685B2 (en) | 2016-06-30 | 2020-06-23 | General Electric Company | Multi-layer X-ray source target |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19521007A1 (en) * | 1994-06-14 | 1995-12-21 | Valenite Inc | Deposition of diamond coatings on hard substrates |
-
2010
- 2010-12-20 FR FR1004978A patent/FR2969178A1/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19521007A1 (en) * | 1994-06-14 | 1995-12-21 | Valenite Inc | Deposition of diamond coatings on hard substrates |
Non-Patent Citations (2)
Title |
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CABRAL G ET AL: "A study of diamond film deposition on WC-Co inserts for graphite machining: Effectiveness of SiC interlayers prepared by HFCVD", DIAMOND AND RELATED MATERIALS, ELSEVIER SCIENCE PUBLISHERS, AMSTERDAM, NL, vol. 17, no. 6, 1 June 2008 (2008-06-01), pages 1008 - 1014, XP022638724, ISSN: 0925-9635, [retrieved on 20080328], DOI: 10.1016/J.DIAMOND.2008.03.017 * |
DEUERLER F ET AL: "Production, characterization, and wear behaviour of plasma jet CVD diamond films on hard metal cutting tools", PHYSICA STATUS SOLIDI A AKADEMIE VERLAG GERMANY, vol. 154, no. 1, 16 March 1996 (1996-03-16) - 16 March 1996 (1996-03-16), pages 403 - 422, XP002663617, ISSN: 0031-8965, DOI: DOI:10.1002/PSSA.2211540129 * |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10475619B2 (en) | 2016-06-30 | 2019-11-12 | General Electric Company | Multilayer X-ray source target |
US10692685B2 (en) | 2016-06-30 | 2020-06-23 | General Electric Company | Multi-layer X-ray source target |
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