FR2948491B1 - Simulation de l'image projetee par un masque - Google Patents

Simulation de l'image projetee par un masque

Info

Publication number
FR2948491B1
FR2948491B1 FR0955082A FR0955082A FR2948491B1 FR 2948491 B1 FR2948491 B1 FR 2948491B1 FR 0955082 A FR0955082 A FR 0955082A FR 0955082 A FR0955082 A FR 0955082A FR 2948491 B1 FR2948491 B1 FR 2948491B1
Authority
FR
France
Prior art keywords
simulation
mask
image projected
projected
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0955082A
Other languages
English (en)
Other versions
FR2948491A1 (fr
Inventor
Mazen Saied
Emek Yesilada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STMicroelectronics Crolles 2 SAS
Original Assignee
STMicroelectronics Crolles 2 SAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by STMicroelectronics Crolles 2 SAS filed Critical STMicroelectronics Crolles 2 SAS
Priority to FR0955082A priority Critical patent/FR2948491B1/fr
Priority to US12/839,817 priority patent/US8423927B2/en
Publication of FR2948491A1 publication Critical patent/FR2948491A1/fr
Application granted granted Critical
Publication of FR2948491B1 publication Critical patent/FR2948491B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
FR0955082A 2009-07-21 2009-07-21 Simulation de l'image projetee par un masque Expired - Fee Related FR2948491B1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
FR0955082A FR2948491B1 (fr) 2009-07-21 2009-07-21 Simulation de l'image projetee par un masque
US12/839,817 US8423927B2 (en) 2009-07-21 2010-07-20 Simulation of the image projected by a mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0955082A FR2948491B1 (fr) 2009-07-21 2009-07-21 Simulation de l'image projetee par un masque

Publications (2)

Publication Number Publication Date
FR2948491A1 FR2948491A1 (fr) 2011-01-28
FR2948491B1 true FR2948491B1 (fr) 2011-09-09

Family

ID=41683087

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0955082A Expired - Fee Related FR2948491B1 (fr) 2009-07-21 2009-07-21 Simulation de l'image projetee par un masque

Country Status (2)

Country Link
US (1) US8423927B2 (fr)
FR (1) FR2948491B1 (fr)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9547892B2 (en) * 2014-05-06 2017-01-17 Kla-Tencor Corporation Apparatus and methods for predicting wafer-level defect printability
US10395361B2 (en) 2015-08-10 2019-08-27 Kla-Tencor Corporation Apparatus and methods for inspecting reticles
JP6840129B2 (ja) * 2015-08-10 2021-03-10 ケーエルエー コーポレイション ウエハレベル欠陥の転写性を予測する装置および方法
US10671786B2 (en) * 2016-11-29 2020-06-02 Taiwan Semiconductor Manufacturing Co., Ltd. Method of modeling a mask by taking into account of mask pattern edge interaction
US10678986B1 (en) * 2018-10-19 2020-06-09 Cadence Design Systems, Inc. Methods for performing Boolean operations on planar region boundaries defined by parametric curves
US10860756B1 (en) 2018-10-19 2020-12-08 Cadence Design Systems, Inc. Finding intersections of planar parametric curves based on error-controlled discretization
US10627713B1 (en) 2018-10-19 2020-04-21 Cadence Design Systems, Inc. Checking minimum width, minimum distance and maximum curvature of planar region boundaries defined by arbitrary parametric curves
US10620531B1 (en) * 2018-10-19 2020-04-14 Cadence Design Systems, Inc. Error-controlled discretization of parametric curves for integrated circuit design and manufacture
US10853551B1 (en) * 2018-10-19 2020-12-01 Cadence Design Systems, Inc. System and method for offsetting and smoothing of planar region boundaries defined by arbitrary parametric curves

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6781701B1 (en) * 2001-04-10 2004-08-24 Intel Corporation Method and apparatus for measuring optical phase and amplitude
US7266480B2 (en) * 2002-10-01 2007-09-04 The Regents Of The University Of California Rapid scattering simulation of objects in imaging using edge domain decomposition
US7294437B2 (en) * 2004-02-27 2007-11-13 Intel Corporation Quick and accurate modeling of transmitted field
JP4538021B2 (ja) * 2007-05-31 2010-09-08 株式会社東芝 光近接効果の補正方法

Also Published As

Publication number Publication date
US20110022219A1 (en) 2011-01-27
FR2948491A1 (fr) 2011-01-28
US8423927B2 (en) 2013-04-16

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Legal Events

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Effective date: 20140331