FR2932192B1 - Procede de metallisation d'une calotte vibrante et capteur vibrant obtenu - Google Patents
Procede de metallisation d'une calotte vibrante et capteur vibrant obtenuInfo
- Publication number
- FR2932192B1 FR2932192B1 FR0803185A FR0803185A FR2932192B1 FR 2932192 B1 FR2932192 B1 FR 2932192B1 FR 0803185 A FR0803185 A FR 0803185A FR 0803185 A FR0803185 A FR 0803185A FR 2932192 B1 FR2932192 B1 FR 2932192B1
- Authority
- FR
- France
- Prior art keywords
- coating
- metallizing
- vibrating member
- vibrant
- vibrating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title abstract 2
- 239000011248 coating agent Substances 0.000 abstract 5
- 238000000576 coating method Methods 0.000 abstract 5
- 229910052710 silicon Inorganic materials 0.000 abstract 3
- 239000010703 silicon Substances 0.000 abstract 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 229910000510 noble metal Inorganic materials 0.000 abstract 1
- 230000001590 oxidative effect Effects 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
- C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5806—Thermal treatment
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
- G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
- G01C19/56—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
- G01C19/567—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using the phase shift of a vibration node or antinode
- G01C19/5691—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using the phase shift of a vibration node or antinode of essentially three-dimensional vibrators, e.g. wine glass-type vibrators
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Radar, Positioning & Navigation (AREA)
- Inorganic Chemistry (AREA)
- Remote Sensing (AREA)
- General Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Gyroscopes (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0803185A FR2932192B1 (fr) | 2008-06-09 | 2008-06-09 | Procede de metallisation d'une calotte vibrante et capteur vibrant obtenu |
PCT/FR2009/000681 WO2010000969A1 (fr) | 2008-06-09 | 2009-06-09 | Procede de metallisation d'une calotte vibrante et capteur vibrant obtenu |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0803185A FR2932192B1 (fr) | 2008-06-09 | 2008-06-09 | Procede de metallisation d'une calotte vibrante et capteur vibrant obtenu |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2932192A1 FR2932192A1 (fr) | 2009-12-11 |
FR2932192B1 true FR2932192B1 (fr) | 2011-01-21 |
Family
ID=40380248
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR0803185A Active FR2932192B1 (fr) | 2008-06-09 | 2008-06-09 | Procede de metallisation d'une calotte vibrante et capteur vibrant obtenu |
Country Status (2)
Country | Link |
---|---|
FR (1) | FR2932192B1 (fr) |
WO (1) | WO2010000969A1 (fr) |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR0174594B1 (ko) * | 1994-11-26 | 1999-04-01 | 이재복 | 실리콘 웨이퍼상에 백금 박막을 형성하는 방법, 그 방법에 의하여 제조된 실리콘 기판 및 그 기판을 이용한 반도체 소자 |
US6025205A (en) * | 1997-01-07 | 2000-02-15 | Tong Yang Cement Corporation | Apparatus and methods of forming preferred orientation-controlled platinum films using nitrogen |
US6291345B1 (en) * | 1998-07-27 | 2001-09-18 | Honeywell International Inc. | Controlled-stress stable metallization for electronic and electromechanical devices |
US6647785B2 (en) * | 2001-07-27 | 2003-11-18 | Litton Systems, Inc. | Nuclear radiation hard high accuracy rotation sensor system |
US7168318B2 (en) * | 2002-08-12 | 2007-01-30 | California Institute Of Technology | Isolated planar mesogyroscope |
FR2851041B1 (fr) * | 2003-02-06 | 2005-03-18 | Sagem | Procede de mise en oeuvre d'un resonateur sous l'effet de forces electrostatiques |
JP4058018B2 (ja) * | 2003-12-16 | 2008-03-05 | 松下電器産業株式会社 | 圧電素子及びその製造方法、並びにその圧電素子を備えたインクジェットヘッド、インクジェット式記録装置及び角速度センサ |
WO2005086248A1 (fr) * | 2004-03-05 | 2005-09-15 | Matsushita Electric Industrial Co., Ltd. | Élément piézoélectrique, tête d’impression jet d’encre, capteur de vitesse angulaire, procédés de fabrication de ceux-ci et dispositif d’enregistrement a jet d’encre |
JP2007043054A (ja) * | 2005-03-04 | 2007-02-15 | Sony Corp | 圧電素子及びその製造方法 |
-
2008
- 2008-06-09 FR FR0803185A patent/FR2932192B1/fr active Active
-
2009
- 2009-06-09 WO PCT/FR2009/000681 patent/WO2010000969A1/fr active Application Filing
Also Published As
Publication number | Publication date |
---|---|
FR2932192A1 (fr) | 2009-12-11 |
WO2010000969A1 (fr) | 2010-01-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2009069670A1 (fr) | Dispositif d'inspection de microstructure et procédé d'inspection de microstructure | |
MY147005A (en) | Method for bonding a semiconductor substrate to a metal subtrate | |
TW200703461A (en) | Glass-based semiconductor on insulator structures and methods of making same | |
TW200610205A (en) | Organic semiconductor device and manufacturing method thereof | |
GB2462845B (en) | Organic electronic devices and methods of making the same using solution processing techniques | |
TW200515472A (en) | Microelectromechanical system and method for fabricating the same | |
EP1837087A3 (fr) | Transducteur ultrasonique, sonde ultrasonique et leur procédé de fabrication | |
TW200618285A (en) | Methods for forming semiconductor wires and resulting devices | |
ATE444578T1 (de) | Elektrische kontaktverbindung und verfahren zum ausbilden einer solchen kontaktverbindung | |
TW200707538A (en) | Semiconductor device and method of manufacturing the same | |
TW200501340A (en) | Conductor substrate, semiconductor device and production method thereof | |
EP1826174A3 (fr) | Procédé de formation d'une structure de film à couche mince à faible contrainte de tension | |
EP2560194A4 (fr) | Dispositif semi-conducteur en carbure de silicium et son procédé de fabrication | |
ITTO20080540A1 (it) | Metodo per la fabbricazione di lingotto di polisilicio di grado solare con relativo apparato ad induzione | |
SG159517A1 (en) | Integrated circuit system employing gate shield and/or ground shield | |
TW200609549A (en) | Optical waveguide mounting member, substrate, semiconductor device, method of manufacturing optical waveguide mounting member, and method of manufacturing substrate | |
EA201290548A1 (ru) | Оконное стекло с элементом электрического соединения | |
GB2507896A (en) | Electronic device | |
TW200629378A (en) | Semiconductor wafer having a silicon-germanium layer, and a method for its production | |
FR2932192B1 (fr) | Procede de metallisation d'une calotte vibrante et capteur vibrant obtenu | |
MD3579C2 (ro) | Procedeu de obţinere a microfirelor semimetalice de bismut în izolaţie de sticlă de molibden | |
TW200618083A (en) | Deposition of hard-mask with minimized hillocks and bubbles | |
GB2489830A (en) | Layer transfer using boron-doped sige layer | |
EA201170857A1 (ru) | Способ и устройство для покрытия стекла | |
WO2010011487A3 (fr) | Transistor à effet de champ à jonctions utilisant une architecture silicium sur isolant |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PLFP | Fee payment |
Year of fee payment: 9 |
|
CD | Change of name or company name |
Owner name: SAFRAN ELECTRONICS & DEFENSE, FR Effective date: 20170111 |
|
PLFP | Fee payment |
Year of fee payment: 10 |
|
PLFP | Fee payment |
Year of fee payment: 11 |
|
PLFP | Fee payment |
Year of fee payment: 13 |
|
PLFP | Fee payment |
Year of fee payment: 14 |
|
PLFP | Fee payment |
Year of fee payment: 15 |
|
PLFP | Fee payment |
Year of fee payment: 16 |
|
PLFP | Fee payment |
Year of fee payment: 17 |