FR2908875B1 - NON-CONTACT MEASURING DEVICE FOR DEFORMING A MEMBRANE, AND APPLICATIONS - Google Patents

NON-CONTACT MEASURING DEVICE FOR DEFORMING A MEMBRANE, AND APPLICATIONS

Info

Publication number
FR2908875B1
FR2908875B1 FR0655009A FR0655009A FR2908875B1 FR 2908875 B1 FR2908875 B1 FR 2908875B1 FR 0655009 A FR0655009 A FR 0655009A FR 0655009 A FR0655009 A FR 0655009A FR 2908875 B1 FR2908875 B1 FR 2908875B1
Authority
FR
France
Prior art keywords
membrane
light beam
deforming
applications
measuring device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0655009A
Other languages
French (fr)
Other versions
FR2908875A1 (en
Inventor
Arnaud Favre
Jean Marie Foray
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pfeiffer Vacuum SAS
Original Assignee
Alcatel SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alcatel SA filed Critical Alcatel SA
Priority to FR0655009A priority Critical patent/FR2908875B1/en
Priority to EP07121205A priority patent/EP1925909A1/en
Publication of FR2908875A1 publication Critical patent/FR2908875A1/en
Application granted granted Critical
Publication of FR2908875B1 publication Critical patent/FR2908875B1/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/16—Measuring arrangements characterised by the use of optical techniques for measuring the deformation in a solid, e.g. optical strain gauge
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

The device has a generating unit (3) with a laser source for generating an incident light beam (I) having a wavelength around 900 nanometer, and for obliquely directing the light beam towards a transparent flexible membrane (1). An isolation unit (5) receives and isolates the reflected light beam (4') to measure displacement of the membrane, where the light beam is reflected by the membrane. The incident light beam makes an incidence angle with a surface of the membrane, and interacts with a central zone of the membrane.
FR0655009A 2006-11-21 2006-11-21 NON-CONTACT MEASURING DEVICE FOR DEFORMING A MEMBRANE, AND APPLICATIONS Expired - Fee Related FR2908875B1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
FR0655009A FR2908875B1 (en) 2006-11-21 2006-11-21 NON-CONTACT MEASURING DEVICE FOR DEFORMING A MEMBRANE, AND APPLICATIONS
EP07121205A EP1925909A1 (en) 2006-11-21 2007-11-21 Device for cleaning and decontaminating an object with a non-airtight confined environment limited by a flexible membrane wall

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0655009A FR2908875B1 (en) 2006-11-21 2006-11-21 NON-CONTACT MEASURING DEVICE FOR DEFORMING A MEMBRANE, AND APPLICATIONS

Publications (2)

Publication Number Publication Date
FR2908875A1 FR2908875A1 (en) 2008-05-23
FR2908875B1 true FR2908875B1 (en) 2009-06-12

Family

ID=38190632

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0655009A Expired - Fee Related FR2908875B1 (en) 2006-11-21 2006-11-21 NON-CONTACT MEASURING DEVICE FOR DEFORMING A MEMBRANE, AND APPLICATIONS

Country Status (1)

Country Link
FR (1) FR2908875B1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA3232248A1 (en) * 2015-02-03 2016-08-11 Asml Netherlands B.V. Mask assembly and associated methods
CN108180859A (en) * 2018-03-02 2018-06-19 天津商业大学 One kind is based on binocular stereo vision composite and flexible film deformation of surface detection device and method

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6791661B2 (en) * 1999-12-09 2004-09-14 Nikon Corporation Gas replacement method and apparatus, and exposure method and apparatus
US6346986B1 (en) * 2000-03-14 2002-02-12 Wafertech, Inc. Non-intrusive pellicle height measurement system
JP2002372777A (en) * 2001-06-18 2002-12-26 Canon Inc Gas replacement method and exposure device
US6731378B2 (en) * 2002-02-11 2004-05-04 International Business Machines Corporation Pellicle distortion reduction
JP2005093697A (en) * 2003-09-17 2005-04-07 Canon Inc Face position detecting device and method therefor, aligner and aberration correcting method

Also Published As

Publication number Publication date
FR2908875A1 (en) 2008-05-23

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Legal Events

Date Code Title Description
TP Transmission of property

Owner name: ADIXEN VACUUM PRODUCTS, FR

Effective date: 20111124

ST Notification of lapse

Effective date: 20120731