FR2906646B1 - Procede de marquage individuel de circuits integres et circuit integre marque selon ce procede. - Google Patents

Procede de marquage individuel de circuits integres et circuit integre marque selon ce procede.

Info

Publication number
FR2906646B1
FR2906646B1 FR0654051A FR0654051A FR2906646B1 FR 2906646 B1 FR2906646 B1 FR 2906646B1 FR 0654051 A FR0654051 A FR 0654051A FR 0654051 A FR0654051 A FR 0654051A FR 2906646 B1 FR2906646 B1 FR 2906646B1
Authority
FR
France
Prior art keywords
marking process
integrated circuit
individual marking
integrated circuits
integrated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0654051A
Other languages
English (en)
Other versions
FR2906646A1 (fr
Inventor
Dominique Bocquene
Gerard Gadot
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Microcomposants de Haute Securite SAS MHS
Original Assignee
Microcomposants de Haute Securite SAS MHS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Microcomposants de Haute Securite SAS MHS filed Critical Microcomposants de Haute Securite SAS MHS
Priority to FR0654051A priority Critical patent/FR2906646B1/fr
Priority to PCT/FR2007/052049 priority patent/WO2008043934A2/fr
Publication of FR2906646A1 publication Critical patent/FR2906646A1/fr
Application granted granted Critical
Publication of FR2906646B1 publication Critical patent/FR2906646B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/544Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67276Production flow monitoring, e.g. for increasing throughput
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67282Marking devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67288Monitoring of warpage, curvature, damage, defects or the like
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67294Apparatus for monitoring, sorting or marking using identification means, e.g. labels on substrates or labels on containers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544Marks applied to semiconductor devices or parts
    • H01L2223/54406Marks applied to semiconductor devices or parts comprising alphanumeric information
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544Marks applied to semiconductor devices or parts
    • H01L2223/54413Marks applied to semiconductor devices or parts comprising digital information, e.g. bar codes, data matrix
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544Marks applied to semiconductor devices or parts
    • H01L2223/54433Marks applied to semiconductor devices or parts containing identification or tracking information
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544Marks applied to semiconductor devices or parts
    • H01L2223/54473Marks applied to semiconductor devices or parts for use after dicing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544Marks applied to semiconductor devices or parts
    • H01L2223/54473Marks applied to semiconductor devices or parts for use after dicing
    • H01L2223/5448Located on chip prior to dicing and remaining on chip after dicing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
FR0654051A 2006-10-03 2006-10-03 Procede de marquage individuel de circuits integres et circuit integre marque selon ce procede. Expired - Fee Related FR2906646B1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
FR0654051A FR2906646B1 (fr) 2006-10-03 2006-10-03 Procede de marquage individuel de circuits integres et circuit integre marque selon ce procede.
PCT/FR2007/052049 WO2008043934A2 (fr) 2006-10-03 2007-10-01 Procédé de marquage individuel de circuits intégrés et circuit intégré marqué selon ce procédé

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0654051A FR2906646B1 (fr) 2006-10-03 2006-10-03 Procede de marquage individuel de circuits integres et circuit integre marque selon ce procede.

Publications (2)

Publication Number Publication Date
FR2906646A1 FR2906646A1 (fr) 2008-04-04
FR2906646B1 true FR2906646B1 (fr) 2009-01-30

Family

ID=37734028

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0654051A Expired - Fee Related FR2906646B1 (fr) 2006-10-03 2006-10-03 Procede de marquage individuel de circuits integres et circuit integre marque selon ce procede.

Country Status (2)

Country Link
FR (1) FR2906646B1 (fr)
WO (1) WO2008043934A2 (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2906646B1 (fr) * 2006-10-03 2009-01-30 Microcomposants De Haute Secur Procede de marquage individuel de circuits integres et circuit integre marque selon ce procede.
US8342659B2 (en) 2009-08-25 2013-01-01 Canon Kabushiki Kaisha Liquid discharge head and method for manufacturing the same
US10522472B2 (en) 2016-09-08 2019-12-31 Asml Netherlands B.V. Secure chips with serial numbers
US10079206B2 (en) 2016-10-27 2018-09-18 Mapper Lithography Ip B.V. Fabricating unique chips using a charged particle multi-beamlet lithography system
JP2021150370A (ja) * 2020-03-17 2021-09-27 キオクシア株式会社 半導体記憶装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58178530A (ja) * 1982-04-13 1983-10-19 Nec Corp 半導体集積回路装置の製造方法
JPH0513529A (ja) * 1991-07-05 1993-01-22 Nec Kyushu Ltd 半導体集積回路
US5256578A (en) * 1991-12-23 1993-10-26 Motorola, Inc. Integral semiconductor wafer map recording
US6063685A (en) * 1998-08-07 2000-05-16 Advanced Micro Devices, Inc. Device level identification methodology
JP2001118757A (ja) * 1999-10-20 2001-04-27 Komatsu Ltd 微小ドットマークを有する半導体基材
US6830941B1 (en) * 2002-12-17 2004-12-14 Advanced Micro Devices, Inc. Method and apparatus for identifying individual die during failure analysis
US7202550B2 (en) * 2004-06-01 2007-04-10 Taiwan Semiconductor Manufacturing Company, Ltd. Integrated stress relief pattern and registration structure
US20060000814A1 (en) * 2004-06-30 2006-01-05 Bo Gu Laser-based method and system for processing targeted surface material and article produced thereby
FR2906646B1 (fr) * 2006-10-03 2009-01-30 Microcomposants De Haute Secur Procede de marquage individuel de circuits integres et circuit integre marque selon ce procede.

Also Published As

Publication number Publication date
FR2906646A1 (fr) 2008-04-04
WO2008043934A2 (fr) 2008-04-17
WO2008043934A3 (fr) 2008-06-26

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Legal Events

Date Code Title Description
ST Notification of lapse

Effective date: 20100630