FR2880037B1 - METHOD OF DEPOSITING A METAL CARBONITRIDE LAYER FOR THE PRODUCTION OF ELECTRODES OR BARRIER LAYERS - Google Patents

METHOD OF DEPOSITING A METAL CARBONITRIDE LAYER FOR THE PRODUCTION OF ELECTRODES OR BARRIER LAYERS

Info

Publication number
FR2880037B1
FR2880037B1 FR0453172A FR0453172A FR2880037B1 FR 2880037 B1 FR2880037 B1 FR 2880037B1 FR 0453172 A FR0453172 A FR 0453172A FR 0453172 A FR0453172 A FR 0453172A FR 2880037 B1 FR2880037 B1 FR 2880037B1
Authority
FR
France
Prior art keywords
depositing
electrodes
production
barrier layers
carbonitride layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0453172A
Other languages
French (fr)
Other versions
FR2880037A1 (en
Inventor
Nicolas Blasco
Vincent Meric
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Air Liquide SA
LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
Original Assignee
Air Liquide SA
LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Liquide SA, LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude filed Critical Air Liquide SA
Priority to FR0453172A priority Critical patent/FR2880037B1/en
Priority to PCT/FR2005/051134 priority patent/WO2006070165A1/en
Publication of FR2880037A1 publication Critical patent/FR2880037A1/en
Application granted granted Critical
Publication of FR2880037B1 publication Critical patent/FR2880037B1/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/36—Carbonitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
FR0453172A 2004-12-23 2004-12-23 METHOD OF DEPOSITING A METAL CARBONITRIDE LAYER FOR THE PRODUCTION OF ELECTRODES OR BARRIER LAYERS Expired - Fee Related FR2880037B1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
FR0453172A FR2880037B1 (en) 2004-12-23 2004-12-23 METHOD OF DEPOSITING A METAL CARBONITRIDE LAYER FOR THE PRODUCTION OF ELECTRODES OR BARRIER LAYERS
PCT/FR2005/051134 WO2006070165A1 (en) 2004-12-23 2005-12-22 Method for deposing a metallic carbonitride layer for producing barrier electrodes or layers

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0453172A FR2880037B1 (en) 2004-12-23 2004-12-23 METHOD OF DEPOSITING A METAL CARBONITRIDE LAYER FOR THE PRODUCTION OF ELECTRODES OR BARRIER LAYERS

Publications (2)

Publication Number Publication Date
FR2880037A1 FR2880037A1 (en) 2006-06-30
FR2880037B1 true FR2880037B1 (en) 2007-03-30

Family

ID=34951861

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0453172A Expired - Fee Related FR2880037B1 (en) 2004-12-23 2004-12-23 METHOD OF DEPOSITING A METAL CARBONITRIDE LAYER FOR THE PRODUCTION OF ELECTRODES OR BARRIER LAYERS

Country Status (2)

Country Link
FR (1) FR2880037B1 (en)
WO (1) WO2006070165A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080026576A1 (en) * 2006-07-31 2008-01-31 Rohm And Haas Electronic Materials Llc Organometallic compounds

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7560581B2 (en) * 2002-07-12 2009-07-14 President And Fellows Of Harvard College Vapor deposition of tungsten nitride

Also Published As

Publication number Publication date
FR2880037A1 (en) 2006-06-30
WO2006070165A1 (en) 2006-07-06

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Legal Events

Date Code Title Description
ST Notification of lapse

Effective date: 20081020