FR2868434A1 - Procedes de revetement d'un substrat et de formation d'un film colore et dispositif associe - Google Patents

Procedes de revetement d'un substrat et de formation d'un film colore et dispositif associe

Info

Publication number
FR2868434A1
FR2868434A1 FR0403592A FR0403592A FR2868434A1 FR 2868434 A1 FR2868434 A1 FR 2868434A1 FR 0403592 A FR0403592 A FR 0403592A FR 0403592 A FR0403592 A FR 0403592A FR 2868434 A1 FR2868434 A1 FR 2868434A1
Authority
FR
France
Prior art keywords
gas
substrate
coating
methods
color film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR0403592A
Other languages
English (en)
Other versions
FR2868434B1 (fr
Inventor
Jean Durand
Francois Lauvray
Isabelle Richardt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEYCO SA
Original Assignee
NEYCO SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR0403592A priority Critical patent/FR2868434B1/fr
Application filed by NEYCO SA filed Critical NEYCO SA
Priority to EP05749656A priority patent/EP1733070A1/fr
Priority to MXPA06011646A priority patent/MXPA06011646A/es
Priority to US10/599,691 priority patent/US20080038464A1/en
Priority to CA002562299A priority patent/CA2562299A1/fr
Priority to PCT/FR2005/000798 priority patent/WO2005100632A1/fr
Priority to CNA2005800185100A priority patent/CN1965102A/zh
Publication of FR2868434A1 publication Critical patent/FR2868434A1/fr
Application granted granted Critical
Publication of FR2868434B1 publication Critical patent/FR2868434B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/08—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal halides
    • C23C16/12—Deposition of aluminium only
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3649—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer made of metals other than silver
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3652—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the coating stack containing at least one sacrificial layer to protect the metal from oxidation
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3684—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating being used for decoration purposes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/006—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterized by the colour of the layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/72—Decorative coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd
    • C03C2218/153—Deposition methods from the vapour phase by cvd by plasma-enhanced cvd

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

Le procédé comprend les étapes suivantes : on place le substrat (12) dans une enceinte (14) sous vide, on forme un gaz par évaporation d'un composant qui est liquide à pression atmosphérique et à température ambiante et on introduit un gaz dans l'enceinte (14). On décompose le gaz et on introduit dans l'enceinte (14) un gaz de complément destiné à réagir avec le gaz décomposé, pour former au moins une couche mince sur le substrat (12). L'invention concerne également un procédé de formation d'un film coloré et un dispositif (10) associé pouvant mettre en oeuvre le procédé selon l'invention.
FR0403592A 2004-04-06 2004-04-06 Procedes de revetement d'un substrat et de formation d'un film colore et dispositif associe Expired - Fee Related FR2868434B1 (fr)

Priority Applications (7)

Application Number Priority Date Filing Date Title
FR0403592A FR2868434B1 (fr) 2004-04-06 2004-04-06 Procedes de revetement d'un substrat et de formation d'un film colore et dispositif associe
MXPA06011646A MXPA06011646A (es) 2004-04-06 2005-04-01 Procedimientos de revestimiento de un sustrato y de formacion de una pelicula coloreada, y dispositivo asociado.
US10/599,691 US20080038464A1 (en) 2004-04-06 2005-04-01 Methods for Coating a Substrate and Forming a Colored Film and Related Device
CA002562299A CA2562299A1 (fr) 2004-04-06 2005-04-01 Procedes de revetement d'un substrat et de formation d'un film colore et dispositif associe
EP05749656A EP1733070A1 (fr) 2004-04-06 2005-04-01 Procedes de revêtement d'un substrat et de formation d'un film colore et dispositif associe
PCT/FR2005/000798 WO2005100632A1 (fr) 2004-04-06 2005-04-01 Procedes de revêtement d'un substrat et de formation d'un film colore et dispositif associe
CNA2005800185100A CN1965102A (zh) 2004-04-06 2005-04-01 在一基体上涂涂层和形成彩色薄膜的方法及其装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0403592A FR2868434B1 (fr) 2004-04-06 2004-04-06 Procedes de revetement d'un substrat et de formation d'un film colore et dispositif associe

Publications (2)

Publication Number Publication Date
FR2868434A1 true FR2868434A1 (fr) 2005-10-07
FR2868434B1 FR2868434B1 (fr) 2007-04-20

Family

ID=34944637

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0403592A Expired - Fee Related FR2868434B1 (fr) 2004-04-06 2004-04-06 Procedes de revetement d'un substrat et de formation d'un film colore et dispositif associe

Country Status (7)

Country Link
US (1) US20080038464A1 (fr)
EP (1) EP1733070A1 (fr)
CN (1) CN1965102A (fr)
CA (1) CA2562299A1 (fr)
FR (1) FR2868434B1 (fr)
MX (1) MXPA06011646A (fr)
WO (1) WO2005100632A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008135516A2 (fr) * 2007-05-02 2008-11-13 Stein, Ralf Système d'alimentation en gaz et procédé de mise à disposition d'un agent de dépôt gazeux

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106676499B (zh) * 2015-11-06 2020-07-03 中微半导体设备(上海)股份有限公司 一种mocvd气体喷淋头预处理方法
CN110983300B (zh) * 2019-12-04 2023-06-20 江苏菲沃泰纳米科技股份有限公司 镀膜设备及其应用

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4947789A (en) * 1988-09-30 1990-08-14 Leybold Aktiengesellschaft Apparatus for vaporizing monomers that flow at room temperature
US5562776A (en) * 1994-09-19 1996-10-08 Energy Conversion Devices, Inc. Apparatus for microwave plasma enhanced physical/chemical vapor deposition
US5970908A (en) * 1997-12-13 1999-10-26 Compuvac Systems, Inc. Apparatus and improved polymerization gun for coating objects by vacuum deposit
US20020076489A1 (en) * 1991-12-26 2002-06-20 Yukihiro Hayakawa Method for forming a thin film using a gas
US20030190422A1 (en) * 2002-04-09 2003-10-09 Yoo Woo Sik Source gas delivery

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5447568A (en) * 1991-12-26 1995-09-05 Canon Kabushiki Kaisha Chemical vapor deposition method and apparatus making use of liquid starting material

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4947789A (en) * 1988-09-30 1990-08-14 Leybold Aktiengesellschaft Apparatus for vaporizing monomers that flow at room temperature
US20020076489A1 (en) * 1991-12-26 2002-06-20 Yukihiro Hayakawa Method for forming a thin film using a gas
US5562776A (en) * 1994-09-19 1996-10-08 Energy Conversion Devices, Inc. Apparatus for microwave plasma enhanced physical/chemical vapor deposition
US5970908A (en) * 1997-12-13 1999-10-26 Compuvac Systems, Inc. Apparatus and improved polymerization gun for coating objects by vacuum deposit
US20030190422A1 (en) * 2002-04-09 2003-10-09 Yoo Woo Sik Source gas delivery

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008135516A2 (fr) * 2007-05-02 2008-11-13 Stein, Ralf Système d'alimentation en gaz et procédé de mise à disposition d'un agent de dépôt gazeux
WO2008135516A3 (fr) * 2007-05-02 2009-04-16 Stein Ralf Système d'alimentation en gaz et procédé de mise à disposition d'un agent de dépôt gazeux

Also Published As

Publication number Publication date
WO2005100632A1 (fr) 2005-10-27
CN1965102A (zh) 2007-05-16
MXPA06011646A (es) 2007-03-15
EP1733070A1 (fr) 2006-12-20
CA2562299A1 (fr) 2005-10-27
FR2868434B1 (fr) 2007-04-20
US20080038464A1 (en) 2008-02-14

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