FR2866439B1 - Objectif optique pour microlithographie - Google Patents

Objectif optique pour microlithographie

Info

Publication number
FR2866439B1
FR2866439B1 FR0401481A FR0401481A FR2866439B1 FR 2866439 B1 FR2866439 B1 FR 2866439B1 FR 0401481 A FR0401481 A FR 0401481A FR 0401481 A FR0401481 A FR 0401481A FR 2866439 B1 FR2866439 B1 FR 2866439B1
Authority
FR
France
Prior art keywords
microlithography
optical objective
objective
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0401481A
Other languages
English (en)
Other versions
FR2866439A1 (fr
Inventor
Jean Francois Tanne
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sagem SA
Original Assignee
Sagem SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sagem SA filed Critical Sagem SA
Priority to FR0401481A priority Critical patent/FR2866439B1/fr
Publication of FR2866439A1 publication Critical patent/FR2866439A1/fr
Application granted granted Critical
Publication of FR2866439B1 publication Critical patent/FR2866439B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Lenses (AREA)
FR0401481A 2004-02-13 2004-02-13 Objectif optique pour microlithographie Expired - Fee Related FR2866439B1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR0401481A FR2866439B1 (fr) 2004-02-13 2004-02-13 Objectif optique pour microlithographie

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0401481A FR2866439B1 (fr) 2004-02-13 2004-02-13 Objectif optique pour microlithographie

Publications (2)

Publication Number Publication Date
FR2866439A1 FR2866439A1 (fr) 2005-08-19
FR2866439B1 true FR2866439B1 (fr) 2006-06-02

Family

ID=34803365

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0401481A Expired - Fee Related FR2866439B1 (fr) 2004-02-13 2004-02-13 Objectif optique pour microlithographie

Country Status (1)

Country Link
FR (1) FR2866439B1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI305107B (en) 2005-09-29 2009-01-01 Young Optics Inc Optical projection apparatus

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3353902B2 (ja) * 1990-12-12 2002-12-09 オリンパス光学工業株式会社 投影レンズ系
US6710930B2 (en) * 1999-12-01 2004-03-23 Nikon Corporation Illumination optical system and method of making exposure apparatus

Also Published As

Publication number Publication date
FR2866439A1 (fr) 2005-08-19

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Legal Events

Date Code Title Description
TP Transmission of property
ST Notification of lapse

Effective date: 20141031